ClassID:

206388

H01J2237/0815 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Ion sources Methods of ionisation

Sub-classes:
Recent Application in this class:
#1
20260112567
2026-04-23

ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER

#2
20260051453
2026-02-19

SPLIT RING RESONATOR ION BEAM SOURCE

#3
20260011530
2026-01-08

Beam Plasma Source

#4
20250364767
2025-11-27

LASER SYSTEM AND METHOD FOR GENERATING SECONDARY RADIATION THROUGH INTERACTION OF A PRIMARY LASER BEAM WITH A TARGET MATERIAL

#5
20250232942
2025-07-17

ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM

#6
20250087451
2025-03-13

DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE

#7
20250014861
2025-01-09

ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY

#8
20240379320
2024-11-14

ION IMPLANTATION SYSTEM AND RELATED METHODS

#9
20240249906
2024-07-25

ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER

#10
20230352263
2023-11-02

Ion milling device

#11
20230326703
2023-10-12

Composite ion source based upon heterogeneous metal-metal fluoride system

#12
20230082224
2023-03-16

Device to control uniformity of extracted ion beam

#13
20220285170
2022-09-08

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING STACKED WIRING STRUCTURE, AND ION BEAM IRRADIATION APPARATUS

#14
20220262598
2022-08-18

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#15
20220013324
2022-01-13

Single beam plasma source

#16
20220013323
2022-01-13

HYDROGEN CO-GAS WHEN USING A CHLORINE-BASED ION SOURCE MATERIAL

#17
20210183616
2021-06-17

Ion beam lithography method based on ion beam lithography system

#18
20210104377
2021-04-08

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#19
20210005416
2021-01-07

GeH/Ar plasma chemistry for ion implant productivity enhancement

#20
20200343071
2020-10-29

Ion source with tubular cathode

#21
20200144018
2020-05-07

GeH/Ar plasma chemistry for ion implant productivity enhancement

#22
20200120785
2020-04-16

Uniaxial counter-propagating monolaser atom trap

#23
20190355542
2019-11-21

Device and method for generating organic molecular cluster ion beam

#24
20190318916
2019-10-17

Method for ion mass separation and ion energy control in process plasmas

#25
20190108973
2019-04-11

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#26
20180166250
2018-06-14

High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture

#27
20170309454
2017-10-26

Negative ribbon ion beams from pulsed plasmas

#28
20170062173
2017-03-02

Light bath for particle suppression

#29
20170032941
2017-02-02

Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation

#30
20160336139
2016-11-17

Resonant enhancement of photoionization of gaseous atoms

#31
20160133427
2016-05-12

Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation

#32
20160104598
2016-04-14

Charged particle beam system and method of operating a charged particle beam system

#33
20160056016
2016-02-25

Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly

#34
20150283405
2015-10-08

Rotatable targeting magnet apparatus and method of use thereof in conjunction with a charged particle cancer therapy system

#35
20150273240
2015-10-01

Fast magnet method and apparatus used in conjunction with a charged particle cancer therapy system

#36
20150265854
2015-09-24

Ion source method and apparatus used in conjunction with a charged particle cancer therapy system

#37
20150258350
2015-09-17

Cancer surface searing apparatus and method of use thereof

#38
20150130348
2015-05-14

Plasma source for a focused ion beam system

#39
20150056380
2015-02-26

Ion source of an ion implanter

#40
20140239191
2014-08-28

Method for Uninterrupted Production of a Polyatomic Boron Molecular Ion Beam with Self-Cleaning

#41
20140213014
2014-07-31

Ion implantation based emitter profile engineering via process modifications

#42
20140175301
2014-06-26

Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions

#43
20140097752
2014-04-10

Inductively Coupled Plasma ION Source Chamber with Dopant Material Shield

#44
20130313443
2013-11-28

Excited gas injection for ion implant control

#45
20130234036
2013-09-12

Ion source, heavy particle beam irradiation apparatus, ion source driving method, and heavy particle beam irradiation method

#46
20130221232
2013-08-29

Microplasma ion source for focused ion beam applications

#47
20120319000
2012-12-20

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#48
20120280139
2012-11-08

Method of Anion Production from Atoms and Molecules

#49
20120280136
2012-11-08

Plasma source for charged particle beam system

#50
20120145919
2012-06-14

Charged particle source from a photoionized cold atom beam

#51
20120145918
2012-06-14

Method of ionization

#52
20120132827
2012-05-31

ION ACCELERATION METHOD, ION ACCELERATION APPARATUS, ION BEAM IRRADIATION APPARATUS, AND ION BEAM IRRADIATION APPARATUS FOR MEDICAL USE

#53
20120091360
2012-04-19

Charged particle beam system having multiple user-selectable operating modes

#54
20120080148
2012-04-05

Compact RF antenna for an inductively coupled plasma ion source

#55
20120032092
2012-02-09

Plasma igniter for an inductively coupled plasma ion source

#56
20110259269
2011-10-27

Small form factor plasma source for high density wide ribbon ion beam generation

#57
20110248179
2011-10-13

Ion source with independent power supplies

#58
20110198511
2011-08-18

Plasma igniter for an inductively coupled plasma ion source

#59
20110101213
2011-05-05

Method and system for increasing beam current above a maximum energy for a charge state

#60
20110084207
2011-04-14

Charged particle beam system having multiple user-selectable operating modes

#61
20100294648
2010-11-25

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#62
20100264328
2010-10-21

Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control

#63
20100148089
2010-06-17

Ion implantation ion source, system and method

#64
20100140077
2010-06-10

Excited gas injection for ion implant control

#65
20100090579
2010-04-15

Device for the field emission of particles and production method

#66
20100068406
2010-03-18

Electrospray deposition: devices and methods thereof

#67
20100044564
2010-02-25

Spin polarized ion beam generation apparatus and scattering spectroscopy apparatus using the spin polarized ion beam and specimen processing apparatus

#68
20090309023
2009-12-17

Electron spectroscopy

#69
20090236217
2009-09-24

CAPILLARITRON ION BEAM SPUTTERING SYSTEM AND THIN FILM PRODUCTION METHOD

#70
20090200485
2009-08-13

Method and apparatus for generating ion beam

#71
20090162572
2009-06-25

Systems and methods for the production of highly tetrahedral amorphous carbon coatings

#72
20090114838
2009-05-07

Focused ion beam field source

#73
20090084988
2009-04-02

SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION

#74
20090032727
2009-02-05

Elevated temperature RF ion source

#75
20090032724
2009-02-05

Focused negative ion beam field source

#76
20090014725
2009-01-15

Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device

#77
20090001290
2009-01-01

Ion source and method for operating same

#78
20080305598
2008-12-11

ION IMPLANTATION DEVICE AND A METHOD OF SEMICONDUCTOR MANUFACTURING BY THE IMPLANTATION OF IONS DERIVED FROM CARBORANE MOLECULAR SPECIES

#79
20080296483
2008-12-04

Magneto-optical trap ion source

#80
20080142735
2008-06-19

Charged particle-beam processing using a cluster source

#81
20080087842
2008-04-17

Multivalent ion generating source and charged particle beam apparatus using such ion generating source

#82
20080087219
2008-04-17

Dual mode ion source for ion implantation

#83
20080067408
2008-03-20

Charged particle beam device with a gas field ion source and a gas supply system

#84
20080042580
2008-02-21

Dual mode ion source for ion implantation

#85
20080017319
2008-01-24

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#86
20070262262
2007-11-15

Ion implantation ion source, system and method

#87
20070170372
2007-07-26

Dual mode ion source for ion implantation

#88
20070158560
2007-07-12

Charged particle beam system, semiconductor inspection system, and method of machining sample

#89
20070108394
2007-05-17

Dual mode ion source for ion implantation

#90
20070098980
2007-05-03

Highly tetrahedral amorphous carbon coatings and systems and methods for their production

#91
20070098979
2007-05-03

Highly tetrahedral amorphous carbon coatings and systems and methods for their production

#92
20070018114
2007-01-25

Resonance method for production of intense low-impurity ion beams of atoms and molecules

#93
20060288938
2006-12-28

Systems and methods for the production of highly tetrahedral amorphous carbon coatings

#94
20060249697
2006-11-09

Method, apparatus and system for specimen fabrication by using an ion beam

#95
20060237662
2006-10-26

Ion generation by the temporal control of gaseous dielectric breakdown

#96
20060152162
2006-07-13

Beam plasma source

#97
20060097645
2006-05-11

Dual mode ion source for ion implantation

#98
20050269520
2005-12-08

Ion implantation ion source, system and method

#99
20050183667
2005-08-25

Magnetically enhanced, inductively coupled plasma source for a focused ion beam system

#100
20050098742
2005-05-12

System and method for performing SIMOX implants using an ion shower

#101
20050051096
2005-03-10

Ion implantation ion source, system and method

#102
16355997
2020-08-18

Ion source with tubular cathode