206388 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Ion sources Methods of ionisation
Sub-classes:ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER
#2SPLIT RING RESONATOR ION BEAM SOURCE
#3Beam Plasma Source
#4LASER SYSTEM AND METHOD FOR GENERATING SECONDARY RADIATION THROUGH INTERACTION OF A PRIMARY LASER BEAM WITH A TARGET MATERIAL
#5ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM
#6DUAL CATHODE TEMPERATURE-CONTROLLED MULTI-CATHODE ION SOURCE
#7ION BEAM PROCESSING APPARATUS, ELECTRODE ASSEMBLY, AND METHOD OF CLEANING ELECTRODE ASSEMBLY
#8ION IMPLANTATION SYSTEM AND RELATED METHODS
#9ION SOURCE HEAD AND ION SOURCE HEAD CURVED LINER, DEFLECTOR, OR REPELLER
#10Ion milling device
#11Composite ion source based upon heterogeneous metal-metal fluoride system
#12Device to control uniformity of extracted ion beam
#13METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING STACKED WIRING STRUCTURE, AND ION BEAM IRRADIATION APPARATUS
#14Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#15Single beam plasma source
#16HYDROGEN CO-GAS WHEN USING A CHLORINE-BASED ION SOURCE MATERIAL
#17Ion beam lithography method based on ion beam lithography system
#18Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#19GeH/Ar plasma chemistry for ion implant productivity enhancement
#20Ion source with tubular cathode
#21GeH/Ar plasma chemistry for ion implant productivity enhancement
#22Uniaxial counter-propagating monolaser atom trap
#23Device and method for generating organic molecular cluster ion beam
#24Method for ion mass separation and ion energy control in process plasmas
#25Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#26High brightness ion beam extraction using bias electrodes and magnets proximate the extraction aperture
#27Negative ribbon ion beams from pulsed plasmas
#28Light bath for particle suppression
#29Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation
#30Resonant enhancement of photoionization of gaseous atoms
#31Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation
#32Charged particle beam system and method of operating a charged particle beam system
#33Ion beam processing apparatus, electrode assembly, and method of cleaning electrode assembly
#34Rotatable targeting magnet apparatus and method of use thereof in conjunction with a charged particle cancer therapy system
#35Fast magnet method and apparatus used in conjunction with a charged particle cancer therapy system
#36Ion source method and apparatus used in conjunction with a charged particle cancer therapy system
#37Cancer surface searing apparatus and method of use thereof
#38Plasma source for a focused ion beam system
#39Ion source of an ion implanter
#40Method for Uninterrupted Production of a Polyatomic Boron Molecular Ion Beam with Self-Cleaning
#41Ion implantation based emitter profile engineering via process modifications
#42Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions
#43Inductively Coupled Plasma ION Source Chamber with Dopant Material Shield
#44Excited gas injection for ion implant control
#45Ion source, heavy particle beam irradiation apparatus, ion source driving method, and heavy particle beam irradiation method
#46Microplasma ion source for focused ion beam applications
#47Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
#48Method of Anion Production from Atoms and Molecules
#49Plasma source for charged particle beam system
#50Charged particle source from a photoionized cold atom beam
#51Method of ionization
#52ION ACCELERATION METHOD, ION ACCELERATION APPARATUS, ION BEAM IRRADIATION APPARATUS, AND ION BEAM IRRADIATION APPARATUS FOR MEDICAL USE
#53Charged particle beam system having multiple user-selectable operating modes
#54Compact RF antenna for an inductively coupled plasma ion source
#55Plasma igniter for an inductively coupled plasma ion source
#56Small form factor plasma source for high density wide ribbon ion beam generation
#57Ion source with independent power supplies
#58Plasma igniter for an inductively coupled plasma ion source
#59Method and system for increasing beam current above a maximum energy for a charge state
#60Charged particle beam system having multiple user-selectable operating modes
#61Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
#62Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control
#63Ion implantation ion source, system and method
#64Excited gas injection for ion implant control
#65Device for the field emission of particles and production method
#66Electrospray deposition: devices and methods thereof
#67Spin polarized ion beam generation apparatus and scattering spectroscopy apparatus using the spin polarized ion beam and specimen processing apparatus
#68Electron spectroscopy
#69CAPILLARITRON ION BEAM SPUTTERING SYSTEM AND THIN FILM PRODUCTION METHOD
#70Method and apparatus for generating ion beam
#71Systems and methods for the production of highly tetrahedral amorphous carbon coatings
#72Focused ion beam field source
#73SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION
#74Elevated temperature RF ion source
#75Focused negative ion beam field source
#76Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device
#77Ion source and method for operating same
#78ION IMPLANTATION DEVICE AND A METHOD OF SEMICONDUCTOR MANUFACTURING BY THE IMPLANTATION OF IONS DERIVED FROM CARBORANE MOLECULAR SPECIES
#79Magneto-optical trap ion source
#80Charged particle-beam processing using a cluster source
#81Multivalent ion generating source and charged particle beam apparatus using such ion generating source
#82Dual mode ion source for ion implantation
#83Charged particle beam device with a gas field ion source and a gas supply system
#84Dual mode ion source for ion implantation
#85Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
#86Ion implantation ion source, system and method
#87Dual mode ion source for ion implantation
#88Charged particle beam system, semiconductor inspection system, and method of machining sample
#89Dual mode ion source for ion implantation
#90Highly tetrahedral amorphous carbon coatings and systems and methods for their production
#91Highly tetrahedral amorphous carbon coatings and systems and methods for their production
#92Resonance method for production of intense low-impurity ion beams of atoms and molecules
#93Systems and methods for the production of highly tetrahedral amorphous carbon coatings
#94Method, apparatus and system for specimen fabrication by using an ion beam
#95Ion generation by the temporal control of gaseous dielectric breakdown
#96Beam plasma source
#97Dual mode ion source for ion implantation
#98Ion implantation ion source, system and method
#99Magnetically enhanced, inductively coupled plasma source for a focused ion beam system
#100System and method for performing SIMOX implants using an ion shower
#101Ion implantation ion source, system and method
#102Ion source with tubular cathode