206382 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources Ion sources
Sub-classes:METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS
#2SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRIC OR ASYMMETRIC APPLICATION OF FORCE
#3Hybrid ion source for aluminum ion generation using a target holder and a solid target
#4HYBRID ION SOURCE FOR ALUMINUM ION GENERATION USING A TARGET HOLDER AND ORGANOALUMINIUM COMPOUNDS
#5DEPOSITION TOOL AND METHOD FOR FILLING DEEP TRENCHES
#6Gratings with variable depths formed using planarization for waveguide displays
#7Etching aluminum nitride or aluminum oxide to generate an aluminum ion beam
#8Method for structuring a decorative of technical pattern in an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material
#9Method and device for the surface treatment of substrates
#10Ion generator and ion implanter
#11Particle-optical apparatus and particle beam system
#12Gratings with variable depths formed using planarization for waveguide displays
#13Repeller, cathode, chamber wall and slit member for ion implanter and ion generating devices including the same
#14CARBON MATERIALS FOR CARBON IMPLANTATION
#15Method for structuring a decorative of technical pattern in an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material
#16Endpointing for focused ion beam processing
#17SYSTEMS AND METHODS FOR PROVIDING AN ION BEAM
#18Planarization, densification, and exfoliation of porous materials by high-energy ion beams
#19Method for the in situ preparation of microscopic specimens
#20Hydrogen co-gas when using aluminum iodide as an ion source material
#21Gun lens design in a charged particle microscope
#22Particle-optical apparatus and particle beam system
#23Repeller, cathode, chamber wall and slit member for ion implanter and ion generating devices including the same
#24Method and device for the surface treatment of substrates
#25Tomography sample preparation systems and methods with improved speed, automation, and reliability
#26Ion source
#27Ion Implanter
#28Ion milling apparatus and ion milling method
#29In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source
#30Composite charged particle beam device
#31Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
#32Implantation using solid aluminum iodide (AlI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
#33Method for producing patterns by ion implantation
#34Plasma source enhanced with booster chamber and low cost plasma strength sensor
#35Sample holder and focused ion beam apparatus
#36Ion milling device and ion milling method
#37Charged particle beam-induced etching
#38Ion implantation apparatus
#39Ion beam etching method and ion beam etching apparatus
#40METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING THE SAME
#41Carbon materials for carbon implantation
#42Method and device for the surface treatment of substrates
#43Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation
#44METHODS, SYSTEMS AND APPARATUS FOR ACCELERATING LARGE PARTICLE BEAM CURRENTS
#45Plasma source enhanced with booster chamber and low cost plasma strength sensor
#46Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#47Silicon implantation in substrates and provision of silicon precursor compositions therefor
#48Differential imaging with pattern recognition for process automation of cross sectioning applications
#49Laser-Induced Borane Production for Ion Implantation
#50REMOTE DELIVERY OF CHEMICAL REAGENTS
#51Apparatus and method to control an ion beam
#52Boron implanting using a co-gas
#53Ion milling device and processing method using the ion milling device
#54High energy ion implanter, beam current adjuster, and beam current adjustment method
#55Endpointing for focused ion beam processing
#56Ion milling device
#57Plasma ion source for use with a focused ion beam column with selectable ions
#58Gas cooled plasma spraying device
#59Isotopically-enriched boron-containing compounds, and methods of making and using same
#60Ion implantation compositions, systems, and methods
#61Imaging and processing for plasma ion source
#62Angular scanning using angular energy filter
#63High capacity TEM grid
#64Raman microscope and electron microscope analytical system
#65Ion beam uniformity control using ion beam blockers
#66Plasma etching of diamond surfaces
#67MAGNETIC SCANNING SYSTEM FOR ION IMPLANTERS
#68Charged particle beam device and sample preparation method
#69Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation
#70Bulk deposition for tilted mill protection
#71Apparatus and methods for implementing predicted systematic error correction in location specific processing
#72Alignment marking for rock sample analysis
#73Charged particle beam apparatus having improved needle movement control
#74Ion implantation apparatus and method of controlling ion implantation apparatus
#75Ion sources, systems and methods
#76Charged particle beam apparatus and processing method
#77Mass spectrometer and mass image analyzing system
#78Focused ion beam system and method of making focal adjustment of ion beam
#79Differential imaging with pattern recognition for process automation of cross sectioning applications
#80Arc chamber with multiple cathodes for an ion source
#81Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
#82Techniques for processing a substrate
#83Charged particle beam apparatus
#84Workpiece carrier
#85Insulation structure and insulation method
#86Supply source and method for enriched selenium ion implantation
#87Extended lifetime ion source
#88Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
#89Source bushing shielding
#90Insulation structure of high voltage electrodes for ion implantation apparatus
#91Ion beam generator and ion beam plasma processing apparatus
#92Isotopically-enriched boron-containing compounds, and methods of making and using same
#93Method and system for ion-assisted processing
#94Bonding-substrate fabrication method, bonding substrate, substrate bonding method, bonding-substrate fabrication apparatus, and substrate assembly
#95Three dimensional metal deposition technique
#96Cluster ion implantation of arsenic and phosphorus
#97Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
#98Target for generating carbon ions and treatment apparatus using the same
#99Titanium diboride coating for plasma processing apparatus
#100Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
#101Electronic field effect devices and methods for their manufacture
#102Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#103Method of ionization
#104Ion sources, systems and methods
#105Variable energy charged particle systems
#106Sub-Nanosecond Beam Pulse Radio Frequency Quadrupole (RFQ) Linear Accelerator System
#107Hydrogen COGas for carbon implant
#108Isotopically-enriched boron-containing compounds, and methods of making and using same
#109Fault tolerant ion source power system
#110VAPORIZER
#111Surface analyzer of object to be measured and analyzing method
#112Hall-current ion source with improved ion beam energy distribution
#113Charged particle source with integrated energy filter
#114Isotopically-enriched boron-containing compounds, and methods of making and using same
#115Ion beam source
#116Isotopically-enriched boron-containing compounds, and methods of making and using same
#117Techniques for processing a substrate
#118Manufacturing method of semiconductor device
#119ELECTRIC FIELD MODIFICATION ABOUT A CONDUCTIVE STRUCTURE
#120CARBON MATERIALS FOR CARBON IMPLANTATION
#121METHOD AND APPARATUS FOR ETCHING A STRUCTURE IN A PLASMA CHAMBER
#122High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter
#123Apparatus
#124IONIC EMISSION MICRONIC SOURCE
#125Dual beam apparatus with tilting sample stage
#126DIAMOND ELECTRONIC DEVICES INCLUDING A SURFACE AND METHODS FOR THEIR MANUFACTURE
#127Electronic field effect devices
#128Extraction electrode manipulator
#129Plasma etching of diamond surfaces
#130APPARATUS
#131DIAMOND ELECTRONIC DEVICES AND METHODS FOR THEIR MANUFACTURE
#132Vapor delivery system useful with ion sources and vaporizer for use in such system
#133High uniformity boron doped diamond material
#134Method and apparatus for controlling beam current uniformity in an ion implanter
#135Electron spectroscopy
#136Ion implanting apparatus and method of correcting beam orbit
#137Charged particle source with integrated energy filter
#138Ion implanting apparatus
#139Ion source and plasma processing apparatus
#140VAPOR DELIVERY SYSTEM USEFUL WITH ION SOURCES AND VAPORIZERS FOR USE IN SUCH SYSTEM
#141Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same
#142Method and device of ion source generation
#143Ion sources, systems and methods
#144Vapor delivery to devices under vacuum
#145High resolution gas field ion column with reduced sample load
#146Focused ion beam field source
#147Atomically sharp iridium tip
#148Terminal structures of an ion implanter having insulated conductors with dielectric fins
#149DETACHABLE INNER SHIELD
#150Focused negative ion beam field source
#151Arrangement and method for compensating emitter tip vibrations
#152ION IMPLANTATION DEVICE AND A METHOD OF SEMICONDUCTOR MANUFACTURING BY THE IMPLANTATION OF IONS DERIVED FROM CARBORANE MOLECULAR SPECIES
#153Symmetrical shaper for an ion beam deposition and etching apparatus
#154Method of reducing particle contamination for ion implanters
#155Ion beam processing apparatus
#156Terminal structure of an ion implanter
#157Charged particle generator and accelerator
#158Film Forming Apparatus and Film Forming Method
#159Thermal control plate for ion source
#160Method and apparatus for etching a structure in a plasma chamber
#161Hall-current ion source for ion beams of low and high energy for technological applications
#162Guard ring applied to ion implantation equipment
#163Thermal transfer sheet for ion source
#164Manufacturing method of semiconductor device
#165Scanning transmission ion microscope
#166Transmission ion microscope
#167Ion-implanting apparatus, ion-implanting method, and device manufactured thereby
#168Fluid-cooled ion source
#169Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source
#170Source of liquid metal ions and a method for controlling the source
#171Modular uniform gas distribution system in an ion source
#172Sputtered contamination shielding for an ion source
#173High output ion source, ion implanter, and method of operation
#174System, apparatus and method for variable length electrode in linear accelerator
#175Tetrode extraction apparatus for ion source
#176Extraction electrode arms