ClassID:

206382

H01J2237/08 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources Ion sources

Sub-classes:
Recent Application in this class:
#1
20240420919
2024-12-19

METHOD OF ASSEMBLING DRIFT TUBE ASSEMBLIES IN ION IMPLANTORS

#2
20240371608
2024-11-07

SYSTEM AND METHOD FOR ION SOURCE TEMPERATURE CONTROL USING SYMMETRIC OR ASYMMETRIC APPLICATION OF FORCE

#3
20230369008
2023-11-16

Hybrid ion source for aluminum ion generation using a target holder and a solid target

#4
20230369006
2023-11-16

HYBRID ION SOURCE FOR ALUMINUM ION GENERATION USING A TARGET HOLDER AND ORGANOALUMINIUM COMPOUNDS

#5
20230360970
2023-11-09

DEPOSITION TOOL AND METHOD FOR FILLING DEEP TRENCHES

#6
20220326436
2022-10-13

Gratings with variable depths formed using planarization for waveguide displays

#7
20220139662
2022-05-05

Etching aluminum nitride or aluminum oxide to generate an aluminum ion beam

#8
20210351002
2021-11-11

Method for structuring a decorative of technical pattern in an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material

#9
20210125821
2021-04-29

Method and device for the surface treatment of substrates

#10
20210020403
2021-01-21

Ion generator and ion implanter

#11
20200381206
2020-12-03

Particle-optical apparatus and particle beam system

#12
20200333531
2020-10-22

Gratings with variable depths formed using planarization for waveguide displays

#13
20200083018
2020-03-12

Repeller, cathode, chamber wall and slit member for ion implanter and ion generating devices including the same

#14
20200051819
2020-02-13

CARBON MATERIALS FOR CARBON IMPLANTATION

#15
20190326088
2019-10-24

Method for structuring a decorative of technical pattern in an object made of an at least partially transparent amorphous, semi-crystalline or crystalline material

#16
20190172680
2019-06-06

Endpointing for focused ion beam processing

#17
20190105511
2019-04-11

SYSTEMS AND METHODS FOR PROVIDING AN ION BEAM

#18
20190035602
2019-01-31

Planarization, densification, and exfoliation of porous materials by high-energy ion beams

#19
20190019650
2019-01-17

Method for the in situ preparation of microscopic specimens

#20
20180346342
2018-12-06

Hydrogen co-gas when using aluminum iodide as an ion source material

#21
20180323036
2018-11-08

Gun lens design in a charged particle microscope

#22
20180286625
2018-10-04

Particle-optical apparatus and particle beam system

#23
20180226218
2018-08-09

Repeller, cathode, chamber wall and slit member for ion implanter and ion generating devices including the same

#24
20180204717
2018-07-19

Method and device for the surface treatment of substrates

#25
20180143110
2018-05-24

Tomography sample preparation systems and methods with improved speed, automation, and reliability

#26
20180138008
2018-05-17

Ion source

#27
20180138007
2018-05-17

Ion Implanter

#28
20180130630
2018-05-10

Ion milling apparatus and ion milling method

#29
20180096828
2018-04-05

In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source

#30
20180025885
2018-01-25

Composite charged particle beam device

#31
20170362700
2017-12-21

Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products

#32
20170362699
2017-12-21

Implantation using solid aluminum iodide (AlI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products

#33
20170352522
2017-12-07

Method for producing patterns by ion implantation

#34
20170294290
2017-10-12

Plasma source enhanced with booster chamber and low cost plasma strength sensor

#35
20170278667
2017-09-28

Sample holder and focused ion beam apparatus

#36
20170221677
2017-08-03

Ion milling device and ion milling method

#37
20170200589
2017-07-13

Charged particle beam-induced etching

#38
20170133201
2017-05-11

Ion implantation apparatus

#39
20170098458
2017-04-06

Ion beam etching method and ion beam etching apparatus

#40
20170069836
2017-03-09

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING THE SAME

#41
20170069499
2017-03-09

Carbon materials for carbon implantation

#42
20170069483
2017-03-09

Method and device for the surface treatment of substrates

#43
20170032941
2017-02-02

Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation

#44
20170032930
2017-02-02

METHODS, SYSTEMS AND APPARATUS FOR ACCELERATING LARGE PARTICLE BEAM CURRENTS

#45
20160300696
2016-10-13

Plasma source enhanced with booster chamber and low cost plasma strength sensor

#46
20160233053
2016-08-11

Method for rapid switching between a high current mode and a low current mode in a charged particle beam system

#47
20160211137
2016-07-21

Silicon implantation in substrates and provision of silicon precursor compositions therefor

#48
20160211113
2016-07-21

Differential imaging with pattern recognition for process automation of cross sectioning applications

#49
20160175804
2016-06-23

Laser-Induced Borane Production for Ion Implantation

#50
20160172164
2016-06-16

REMOTE DELIVERY OF CHEMICAL REAGENTS

#51
20160172159
2016-06-16

Apparatus and method to control an ion beam

#52
20160163509
2016-06-09

Boron implanting using a co-gas

#53
20160155602
2016-06-02

Ion milling device and processing method using the ion milling device

#54
20160133439
2016-05-12

High energy ion implanter, beam current adjuster, and beam current adjustment method

#55
20160126060
2016-05-05

Endpointing for focused ion beam processing

#56
20160126057
2016-05-05

Ion milling device

#57
20160027607
2016-01-28

Plasma ion source for use with a focused ion beam column with selectable ions

#58
20160013021
2016-01-14

Gas cooled plasma spraying device

#59
20160013018
2016-01-14

Isotopically-enriched boron-containing compounds, and methods of making and using same

#60
20150380212
2015-12-31

Ion implantation compositions, systems, and methods

#61
20150380204
2015-12-31

Imaging and processing for plasma ion source

#62
20150318142
2015-11-05

Angular scanning using angular energy filter

#63
20150294834
2015-10-15

High capacity TEM grid

#64
20150279616
2015-10-01

Raman microscope and electron microscope analytical system

#65
20150270099
2015-09-24

Ion beam uniformity control using ion beam blockers

#66
20150266741
2015-09-24

Plasma etching of diamond surfaces

#67
20150262863
2015-09-17

MAGNETIC SCANNING SYSTEM FOR ION IMPLANTERS

#68
20150255250
2015-09-10

Charged particle beam device and sample preparation method

#69
20150248992
2015-09-03

Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation

#70
20150243477
2015-08-27

Bulk deposition for tilted mill protection

#71
20150243476
2015-08-27

Apparatus and methods for implementing predicted systematic error correction in location specific processing

#72
20150243471
2015-08-27

Alignment marking for rock sample analysis

#73
20150228451
2015-08-13

Charged particle beam apparatus having improved needle movement control

#74
20150214007
2015-07-30

Ion implantation apparatus and method of controlling ion implantation apparatus

#75
20150213997
2015-07-30

Ion sources, systems and methods

#76
20150206708
2015-07-23

Charged particle beam apparatus and processing method

#77
20150155132
2015-06-04

Mass spectrometer and mass image analyzing system

#78
20150136978
2015-05-21

Focused ion beam system and method of making focal adjustment of ion beam

#79
20150136977
2015-05-21

Differential imaging with pattern recognition for process automation of cross sectioning applications

#80
20150130353
2015-05-14

Arc chamber with multiple cathodes for an ion source

#81
20150129759
2015-05-14

Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions

#82
20150102237
2015-04-16

Techniques for processing a substrate

#83
20150060668
2015-03-05

Charged particle beam apparatus

#84
20140361197
2014-12-11

Workpiece carrier

#85
20140353518
2014-12-04

Insulation structure and insulation method

#86
20140329377
2014-11-06

Supply source and method for enriched selenium ion implantation

#87
20140326594
2014-11-06

Extended lifetime ion source

#88
20140306607
2014-10-16

Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source

#89
20140291554
2014-10-02

Source bushing shielding

#90
20140291543
2014-10-02

Insulation structure of high voltage electrodes for ion implantation apparatus

#91
20140124363
2014-05-08

Ion beam generator and ion beam plasma processing apparatus

#92
20140090598
2014-04-03

Isotopically-enriched boron-containing compounds, and methods of making and using same

#93
20140038393
2014-02-06

Method and system for ion-assisted processing

#94
20140037945
2014-02-06

Bonding-substrate fabrication method, bonding substrate, substrate bonding method, bonding-substrate fabrication apparatus, and substrate assembly

#95
20140027274
2014-01-30

Three dimensional metal deposition technique

#96
20140011346
2014-01-09

Cluster ion implantation of arsenic and phosphorus

#97
20130140450
2013-06-06

Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions

#98
20130138184
2013-05-30

Target for generating carbon ions and treatment apparatus using the same

#99
20130075253
2013-03-28

Titanium diboride coating for plasma processing apparatus

#100
20130015765
2013-01-17

Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source

#101
20120241763
2012-09-27

Electronic field effect devices and methods for their manufacture

#102
20120217152
2012-08-30

Method for rapid switching between a high current mode and a low current mode in a charged particle beam system

#103
20120145918
2012-06-14

Method of ionization

#104
20120141693
2012-06-07

Ion sources, systems and methods

#105
20120138815
2012-06-07

Variable energy charged particle systems

#106
20120126727
2012-05-24

Sub-Nanosecond Beam Pulse Radio Frequency Quadrupole (RFQ) Linear Accelerator System

#107
20120118232
2012-05-17

Hydrogen COGas for carbon implant

#108
20120108044
2012-05-03

Isotopically-enriched boron-containing compounds, and methods of making and using same

#109
20120091914
2012-04-19

Fault tolerant ion source power system

#110
20120064705
2012-03-15

VAPORIZER

#111
20120061564
2012-03-15

Surface analyzer of object to be measured and analyzing method

#112
20120025710
2012-02-02

Hall-current ion source with improved ion beam energy distribution

#113
20110284763
2011-11-24

Charged particle source with integrated energy filter

#114
20110159671
2011-06-30

Isotopically-enriched boron-containing compounds, and methods of making and using same

#115
20110139605
2011-06-16

Ion beam source

#116
20110097882
2011-04-28

Isotopically-enriched boron-containing compounds, and methods of making and using same

#117
20110092059
2011-04-21

Techniques for processing a substrate

#118
20110070722
2011-03-24

Manufacturing method of semiconductor device

#119
20110056746
2011-03-10

ELECTRIC FIELD MODIFICATION ABOUT A CONDUCTIVE STRUCTURE

#120
20110021011
2011-01-27

CARBON MATERIALS FOR CARBON IMPLANTATION

#121
20100320170
2010-12-23

METHOD AND APPARATUS FOR ETCHING A STRUCTURE IN A PLASMA CHAMBER

#122
20100243879
2010-09-30

High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanter

#123
20100219740
2010-09-02

Apparatus

#124
20100181493
2010-07-22

IONIC EMISSION MICRONIC SOURCE

#125
20100176297
2010-07-15

Dual beam apparatus with tilting sample stage

#126
20100078652
2010-04-01

DIAMOND ELECTRONIC DEVICES INCLUDING A SURFACE AND METHODS FOR THEIR MANUFACTURE

#127
20100078651
2010-04-01

Electronic field effect devices

#128
20100072402
2010-03-25

Extraction electrode manipulator

#129
20100047519
2010-02-25

Plasma etching of diamond surfaces

#130
20100044579
2010-02-25

APPARATUS

#131
20100038653
2010-02-18

DIAMOND ELECTRONIC DEVICES AND METHODS FOR THEIR MANUFACTURE

#132
20100025576
2010-02-04

Vapor delivery system useful with ion sources and vaporizer for use in such system

#133
20100012491
2010-01-21

High uniformity boron doped diamond material

#134
20090314962
2009-12-24

Method and apparatus for controlling beam current uniformity in an ion implanter

#135
20090309023
2009-12-17

Electron spectroscopy

#136
20090302214
2009-12-10

Ion implanting apparatus and method of correcting beam orbit

#137
20090289195
2009-11-26

Charged particle source with integrated energy filter

#138
20090256082
2009-10-15

Ion implanting apparatus

#139
20090250340
2009-10-08

Ion source and plasma processing apparatus

#140
20090206281
2009-08-20

VAPOR DELIVERY SYSTEM USEFUL WITH ION SOURCES AND VAPORIZERS FOR USE IN SUCH SYSTEM

#141
20090203226
2009-08-13

Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same

#142
20090194704
2009-08-06

Method and device of ion source generation

#143
20090179161
2009-07-16

Ion sources, systems and methods

#144
20090179157
2009-07-16

Vapor delivery to devices under vacuum

#145
20090146074
2009-06-11

High resolution gas field ion column with reduced sample load

#146
20090114838
2009-05-07

Focused ion beam field source

#147
20090110951
2009-04-30

Atomically sharp iridium tip

#148
20090057572
2009-03-05

Terminal structures of an ion implanter having insulated conductors with dielectric fins

#149
20090039295
2009-02-12

DETACHABLE INNER SHIELD

#150
20090032724
2009-02-05

Focused negative ion beam field source

#151
20090001266
2009-01-01

Arrangement and method for compensating emitter tip vibrations

#152
20080305598
2008-12-11

ION IMPLANTATION DEVICE AND A METHOD OF SEMICONDUCTOR MANUFACTURING BY THE IMPLANTATION OF IONS DERIVED FROM CARBORANE MOLECULAR SPECIES

#153
20080179535
2008-07-31

Symmetrical shaper for an ion beam deposition and etching apparatus

#154
20080157681
2008-07-03

Method of reducing particle contamination for ion implanters

#155
20080073582
2008-03-27

Ion beam processing apparatus

#156
20080073578
2008-03-27

Terminal structure of an ion implanter

#157
20080067410
2008-03-20

Charged particle generator and accelerator

#158
20080026548
2008-01-31

Film Forming Apparatus and Film Forming Method

#159
20070273288
2007-11-29

Thermal control plate for ion source

#160
20070272358
2007-11-29

Method and apparatus for etching a structure in a plasma chamber

#161
20070241290
2007-10-18

Hall-current ion source for ion beams of low and high energy for technological applications

#162
20070210331
2007-09-13

Guard ring applied to ion implantation equipment

#163
20070125966
2007-06-07

Thermal transfer sheet for ion source

#164
20070023700
2007-02-01

Manufacturing method of semiconductor device

#165
20060284092
2006-12-21

Scanning transmission ion microscope

#166
20060284091
2006-12-21

Transmission ion microscope

#167
20060138353
2006-06-29

Ion-implanting apparatus, ion-implanting method, and device manufactured thereby

#168
20050248284
2005-11-10

Fluid-cooled ion source

#169
20050126903
2005-06-16

Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source

#170
20050062480
2005-03-24

Source of liquid metal ions and a method for controlling the source

#171
20050045035
2005-03-03

Modular uniform gas distribution system in an ion source

#172
20050040031
2005-02-24

Sputtered contamination shielding for an ion source

#173
17338050
2022-10-25

High output ion source, ion implanter, and method of operation

#174
17091504
2021-11-30

System, apparatus and method for variable length electrode in linear accelerator

#175
16227296
2020-02-25

Tetrode extraction apparatus for ion source

#176
15849437
2019-05-07

Extraction electrode arms