ClassID:

206392

H01J2237/0825 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Ion sources; Multiple sources for producing different ions simultaneously

Recent Application in this class:
#1
20230377830
2023-11-23

Automated ion-beam alignment for dual-beam instrument

#2
20180361173
2018-12-20

Ion beam treatment apparatus

#3
20170207065
2017-07-20

Covering material stripping method and stripping device using ion irradiation

#4
20160030909
2016-02-04

Deposition tool for combinatorial thin film material libraries

#5
20150061490
2015-03-05

Gas coupled arc chamber cooling

#6
20130264491
2013-10-10

Method for dual energy implantation for ultra-shallow junction formation of MOS devices

#7
20130260544
2013-10-03

Technique for processing a substrate

#8
20130260543
2013-10-03

Technique for processing a substrate

#9
20120126147
2012-05-24

Semiconductor structure made using improved pseudo-simultaneous multiple ion implantation process

#10
20120056088
2012-03-08

Navigation and sample processing using an ion source containing both low-mass and high-mass species

#11
20110272593
2011-11-10

Gas cluster ion beam system with cleaning apparatus

#12
20110143512
2011-06-16

Method for dual energy implantation for ultra-shallow junction formation of MOS devices

#13
20100193708
2010-08-05

Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles

#14
20100193701
2010-08-05

Multiple nozzle gas cluster ion beam system

#15
20100193472
2010-08-05

Multiple nozzle gas cluster ion beam processing system and method of operating

#16
20100025363
2010-02-04

Substrate processing apparatus, and magnetic recording medium manufacturing method

#17
20090321634
2009-12-31

Multi-beam ion/electron spectra-microscope

#18
20090230299
2009-09-17

Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample

#19
20080230714
2008-09-25

Apparatus and methods of forming a gas cluster ion beam using a low-pressure source

#20
20060169915
2006-08-03

Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms