206391 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Ion sources Multiple sources
Sub-classes:ADJUSTABLE MULTIPLE FILAMENT ION BEAM DEPOSITION SYSTEM
#2System and methods for automated processing of multiple samples in a BIB system
#3Ion milling device
#4Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#5Ionization for tandem ion mobility spectrometry
#6Scanned angled etching apparatus and techniques providing separate co-linear radicals and ions
#7Method for operating a plurality of FIB-SEM systems
#8Ion beam apparatus
#9Innovative source assembly for ion beam production
#10Boron implanting using a co-gas
#11Boron implanting using a co-gas
#12Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam
#13Boron implanting using a co-gas
#14Boron implanting using a co-gas
#15Ion beam sample preparation and coating apparatus and methods
#16Apparatus for generating a hollow cathode arc discharge plasma
#17PRE-ALIGNED MULTI-BEAM NOZZLE/SKIMMER MODULE
#18Ion implanting system
#19Multiple nozzle gas cluster ion beam processing system and method of operating
#20Substrate processing apparatus and cleaning method of the same
#21Substrate processing apparatus, and magnetic recording medium manufacturing method
#22Focused ion beam field source
#23Ribbon beam ion implanter cluster tool
#24Technique for improving ion implanter productivity
#25Device and method for milling of material using ions
#26Device and method for milling of material using ions