206393 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Sources; Ion sources; Multiple sources for producing different ions sequentially
ION IMPLANTATION METHOD AND ION IMPLANTER
#2Ion beam apparatus
#3Innovative source assembly for ion beam production
#4Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
#5Negative ribbon ion beams from pulsed plasmas
#6Multi species ion source
#7Plasma ion source for use with a focused ion beam column with selectable ions
#8Multi-source plasma focused ion beam system
#9Methods, apparatuses, systems and software for treatment of a specimen by ion-milling
#10Multi-source plasma focused ion beam system
#11Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
#12Ion implantation based emitter profile engineering via process modifications
#13Ion source, nanofabrication apparatus comprising such source, and a method for emitting ions
#14Multi species ion source
#15Switchable gas cluster and atomic ion gun, and method of surface processing using the gun
#16Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
#17Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
#18Semiconductor structure made using improved multiple ion implantation process
#19Method of ionization
#20Semiconductor structure made using improved multiple ion implantation process
#21Multi-source plasma focused ion beam system
#22SPUTTER TARGET FEED SYSTEM
#23Methods for improving the bioactivity characteristics of a surface and objects with surfaces improved thereby
#24Gas cluster ion beam system with cleaning apparatus
#25Focused ion beam apparatus
#26Method for modifying the wettability and/or other biocompatibility characteristics of a surface of a biological material by the application of gas cluster ion beam technology and biological materials made thereby
#27Use of chained implants in solar cell
#28Method of irradiating substrate with gas cluster ion beam formed from multiple gas nozzles
#29Multiple nozzle gas cluster ion beam system
#30Multiple nozzle gas cluster ion beam processing system and method of operating
#31METHOD OF FORMING ULTRA-SHALLOW JUNCTIONS FOR SEMICONDUCTOR DEVICES
#32Dual mode gas field ion source
#33Techniques for providing a multimode ion source
#34Multi-source plasma focused ion beam system
#35Multi mode ion source
#36Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample
#37Use of chained implants in solar cells
#38Dual mode gas field ion source
#39ION SOURCE GAS REACTOR
#40Hybrid ion source/multimode ion source
#41Focused negative ion beam field source
#42METHOD AND APPARATUS FOR EXTENDING EQUIPMENT UPTIME IN ION IMPLANTATION
#43Gas field ION source for multiple applications
#44Dual mode ion source for ion implantation
#45Dual mode ion source for ion implantation
#46Dual mode ion source for ion implantation
#47Technique for improving ion implanter productivity
#48Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms
#49Dual mode ion source for ion implantation