206512 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Detection characterised by the variable being measured; Measurements of non-electric or non-magnetic variables Spatial variables, e.g. position, distance
Method and apparatus for measurement of beam angle in ion implantation
#302System and method of controlling broad beam uniformity
#303System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
#304Lithography apparatus and focusing method for charged particle beam
#305Charged particle beam apparatus and dimension measuring method
#306Electrostatic latent image evaluation device, electrostatic latent image evaluation method, electrophotographic photoreceptor, and image forming device
#307Ultra high precision measurement tool
#308Method of suppressing beam position drift, method of suppressing beam dimension drift, and charged particle beam lithography system
#309Scanning electron microscope
#310Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium
#311Electronic microscope apparatus
#312Electron beam measurement apparatus
#313Defect recognizing method, defect observing method, and charged particle beam apparatus
#314Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpieces
#315Method and its system for calibrating measured data between different measuring tools
#316Scanning electron microscope and three-dimensional shape measuring device that used it
#317Method and system for ion beam profiling
#318Charged particle system
#319Ion beam diagnostics
#320Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same
#321Charged particle beam apparatus and dimension measuring method
#322Method of determining angle misalignment in beam line ion implanters
#323Methods for rapidly switching off an ion beam
#324Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
#325Method and system for identifying events in FIB
#326Ion beam measuring method and ion implanting apparatus
#327Methods and apparatus for beam density measurement in two dimensions
#328Inspection system and inspection method
#329Standard component for calibration and calibration method using it and electro beam system
#330Electron-beam size measuring apparatus and size measuring method with electron beams
#331High-resolution optical channel for non-destructive navigation and processing of integrated circuits
#332Substrate cover, and charged particle beam writing apparatus and method
#333Line-width measurement adjusting method and scanning electron microscope
#334Method for measuring a pattern dimension using a scanning electron microscope
#335Ion beam angle measurement systems and methods for ion implantation systems
#336Method and apparatus of reviewing defects on a semiconductor device
#337Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
#338Method of measuring a critical dimension of a semiconductor device and a related apparatus
#339Ion implantation beam angle calibration
#340Means to establish orientation of ion beam to wafer and correct angle errors
#341Method and apparatus for evaluating pattern shape of a semiconductor device
#342STANDARD COMPONENT FOR LENGTH MEASUREMENT CALIBRATION, METHOD FOR MANUFACTURING THE SAME, AND CALIBRATION METHOD AND APPARATUS USING THE SAME
#343Pattern measuring method
#344System and method for determining a cross sectional feature of a structural element using a reference structural element
#345Methods and apparatus for ion beam angle measurement in two dimensions
#346Silicon substrate processing method for observing defects in semiconductor devices and defect-detecting method
#347Technique for CD measurement on the basis of area fraction determination
#348Dimension measuring SEM system, method of evaluating shape of circuit pattern and a system for carrying out the method
#349Charged particle beam apparatus and dimension measuring method
#350Charged particle beam column and method of its operation
#351Scanning electron microscope
#352Method and apparatus for inspecting semiconductor device
#353Ion implanter and method of manufacturing semiconductor device
#354Electron microscope, measuring method using the same, electron microscope system, and method for controlling the system
#355Electron beam apparatus and method with surface height calculator and a dual projection optical unit
#356Pattern measuring method
#357Method for measuring line and space pattern using scanning electron microscope
#358Systems and methods for characterizing a three-dimensional sample
#359Method of operating a particle beam system, particle beam system, non-transitory storage medium and program
#360Holes tilt angle measurement using FIB diagonal cut
#361Confocal chromatic sensor systems
#362Multi-beam scanning transmission charged particle microscope