Patents-Review.com
ClassID:

206576 ⎘

H01J2237/30405 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Controlling tubes Details

Sub-classes:
Recent Application in this class:
#1
20260135060
2026-05-14

BROAD ION BEAM DELAYERING APPARATUS WITH INTEGRATED IMAGING

 #2
20240281952
2024-08-22

3D VOLUME INSPECTION METHOD AND METHOD OF CONFIGURING OF A 3D VOLUME INSPECTION METHOD

 #3
20230197403
2023-06-22

Microscopy feedback for improved milling accuracy

 #4
20220392744
2022-12-08

Specimen machining device and information provision method

 #5
20220301814
2022-09-22

Multibeam scanning apparatus and multibeam scanning method

 #6
20220084785
2022-03-17

Charged particle beam apparatus and control method thereof

 #7
20220020569
2022-01-20

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

 #8
20200312617
2020-10-01

Charged particle beam apparatus and control method thereof

 #9
20170207063
2017-07-20

Method for implantation of semiconductor wafers having high bulk resistivity

 #10
20150371821
2015-12-24

Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity

 #11
20150160568
2015-06-11

Mirror array in digital pattern generator (DPG)

 #12
20150130353
2015-05-14

Arc chamber with multiple cathodes for an ion source

 #13
20150090877
2015-04-02

Enhanced defect detection in electron beam inspection and review

 #14
20090272918
2009-11-05

System and method of performing uniform dose implantation under adverse conditions

 #15
20060219955
2006-10-05

Method of measuring ion beam position

 #16
20060011866
2006-01-19

High-energy ion implanter and method of operation thereof

 #17
15699255
2018-09-11

Apparatus and method for improved ion beam current