ClassID:

206578

H01J2237/30416 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Controlling tubes; Details Handling of data

Sub-classes:
Recent Application in this class:
#1
20250232950
2025-07-17

METHOD FOR GENERATING WRITING DATA, WRITING DATA GENERATION APPARATUS, METHOD OF CHARGED-PARTICLE BEAM WRITING, CHARGED-PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM

#2
20230274907
2023-08-31

CHARGED PARTICLE BEAM DEVICE

#3
20230038439
2023-02-09

Ion implanter and model generation method

#4
20220093360
2022-03-24

Data generation method and charged particle beam irradiation device

#5
20210280388
2021-09-09

Ion implanter and model generation method

#6
20210013003
2021-01-14

Multi-beam writing method and multi-beam writing apparatus

#7
20200185191
2020-06-11

Particle beam system and method for operating a particle beam system

#8
20190378688
2019-12-12

Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatus

#9
20190355628
2019-11-21

Process window analysis

#10
20180182596
2018-06-28

Charged particle beam apparatus and method for controlling charged beam apparatus

#11
20180151328
2018-05-31

Charged particle beam device and control method of charged particle beam device

#12
20170243714
2017-08-24

Diagnosis method, charged particle beam lithography apparatus, and recording medium

#13
20160211118
2016-07-21

Method of generating write data for energy beam writing apparatus, method of writing with energy beam, and energy beam writing apparatus

#14
20150041684
2015-02-12

Charged particle beam writing apparatus and method utilizing a sum of the weighted area density of each figure pattern

#15
20150014549
2015-01-15

Charged particle beam writing apparatus and charged particle beam writing method

#16
20140237196
2014-08-21

Charged particle beam writing apparatus, and buffer memory data storage method

#17
20110049382
2011-03-03

Pattern modification schemes for improved FIB patterning

#18
20100155624
2010-06-24

Focused ion beam apparatus, sample processing method using the same, and computer program for focused ion beam processing

#19
20100138028
2010-06-03

Graphical automated machine control and metrology

#20
20090058437
2009-03-05

Method and apparatus for reviewing defects by detecting images having voltage contrast

#21
20090037015
2009-02-05

Method and system for increasing throughput during location specific processing of a plurality of substrates

#22
20080097621
2008-04-24

Graphical automated machine control and metrology

#23
20080046787
2008-02-21

Writing error verification method of pattern writing apparatus and generation apparatus of writing error verification data for pattern writing apparatus

#24
20080006777
2008-01-10

LITHOGRAPHY SYSTEM AND ERROR DETECTION METHOD IN SAME

#25
20070222464
2007-09-27

Method and apparatus for reviewing defects by detecting images having voltage contrast

#26
20050188309
2005-08-25

Graphical automated machine control and metrology

#27
20050061975
2005-03-24

Electron microscope observation system and observation method

#28
14607821
2015-12-08

Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems

#29
14299891
2015-04-07

Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems