H01J2237/30438 - CPC Classification Index

#1

20260088248

2026-03-26

METHOD AND SYSTEM FOR CALIBRATING A CHARGED-PARTICLE SPECTROMETER

#2

20250299912

2025-09-25

WAFER POSITIONING METHOD AND APPARATUS

#3

20240274478

2024-08-15

WAFER POSITIONING METHOD AND APPARATUS

#4

20240186109

2024-06-06

METHOD AND APPARATUS FOR REPAIRING A DEFECT OF A SAMPLE USING A FOCUSED PARTICLE BEAM

#5

20230078311

2023-03-16

Multi-charged-particle-beam writing method, multi-charged-particle-beam writing apparatus, and computer-readable recording medium

#6

20220415719

2022-12-29

Wafer positioning method and apparatus

#7

20220415606

2022-12-29

Wafer Positioning Method and Apparatus

#8

20210098228

2021-04-01

System and method of preparing integrated circuits for backside probing using charged particle beams

#9

20190155160

2019-05-23

Ebeam universal cutter

#10

20190121236

2019-04-25

Cross scan proximity correction with ebeam universal cutter

#11

20180253859

2018-09-06

Component handling assembly and method of adjusting a component handling assembly

#12

20180143526

2018-05-24

Ebeam three beam aperture array

#13

20170277043

2017-09-28

LITHOGRAPHY SYSTEM WITH DIFFERENTIAL INTERFEROMETER MODULE

#14

20170269481

2017-09-21

Cross scan proximity correction with ebeam universal cutter

#15

20170077029

2017-03-16

Unidirectional metal on layer with ebeam

#16

20170076905

2017-03-16

Ebeam three beam aperture array

#17

20160086764

2016-03-24

Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatus

#18

20150311036

2015-10-29

Charged particle beam drawing apparatus

#19

20150270096

2015-09-24

Charged particle beam apparatus

#20

20150268032

2015-09-24

Interferometer module

#21

20150221473

2015-08-06

Charged particle beam apparatus

#22

20150213997

2015-07-30

Ion sources, systems and methods

#23

20150109598

2015-04-23

Lithography system and method for processing a target, such as a wafer

#24

20150097126

2015-04-09

Alignment sensor and height sensor

#25

20140346349

2014-11-27

Drawing apparatus, and method of manufacturing article

#26

20140306121

2014-10-16

Ion sources, systems and methods

#27

20130325393

2013-12-05

Method for determining coordinates

#28

20130224662

2013-08-29

Charged particle beam apparatus, drawing apparatus, and method of manufacturing article

#29

20130037724

2013-02-14

Charged particle beam drawing apparatus and charged particle beam drawing method

#30

20130020502

2013-01-24

Charged particle beam drawing apparatus and method of manufacturing article

#31

20120273686

2012-11-01

Apparatus and methods for electron beam detection

#32

20120250030

2012-10-04

Alignment of an interferometer module for use in an exposure tool

#33

20120250026

2012-10-04

Interferometer module

#34

20120249984

2012-10-04

Lithography system with differential interferometer module

#35

20120214092

2012-08-23

Method of manufacturing a photomask

#36

20120141693

2012-06-07

Ion sources, systems and methods

#37

20100237256

2010-09-23

Charged particle beam writing method, method for detecting position of reference mark for charged particle beam writing, and charged particle beam writing apparatus

#38

20100209831

2010-08-19

Method for correcting a position error of lithography apparatus

#39

20100084582

2010-04-08

Method and apparatus for controlling beam current uniformity in an ion implanter

#40

20100072392

2010-03-25

Charged particle beam profile measurement

#41

20090179161

2009-07-16

Ion sources, systems and methods

#42

20090140175

2009-06-04

Method and system for fabricating a data storage medium

#43

20090039275

2009-02-12

Processing method, manufacturing method of semiconductor device, and processing apparatus

#44

20090039260

2009-02-12

Charged particle beam apparatus

#45

20080315112

2008-12-25

Charged particle beam deflection method with separate stage tracking and stage positional error signals

#46

20080174779

2008-07-24

Wafer alignment method for dual beam system

#47

20080050677

2008-02-28

Processing method, manufacturing method of semiconductor device, and processing apparatus

#48

20080035851

2008-02-14

Processing method, manufacturing method of semiconductor device, and processing apparatus

#49

20070257212

2007-11-08

Digital parallel electron beam lithography stamp

#50

20070241291

2007-10-18

Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system

#51

20070236690

2007-10-11

Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples

#52

20070228292

2007-10-04

Adjusting device of an apparatus for generating a beam of charged particles

#53

20070221843

2007-09-27

Ion sources, systems and methods

#54

20070216767

2007-09-20

Electron beam displacement measuring method, electron beam displacement measuring device, and electron beam recording apparatus

#55

20070210251

2007-09-13

Ion sources, systems and methods

#56

20070210250

2007-09-13

Ion sources, systems and methods

#57

20070205375

2007-09-06

Ion sources, systems and methods

#58

20070194251

2007-08-23

Ion sources, systems and methods

#59

20070194226

2007-08-23

Ion sources, systems and methods

#60

20070187621

2007-08-16

Ion sources, systems and methods

#61

20070158582

2007-07-12

Ion sources, systems and methods

#62

20070158581

2007-07-12

Ion sources, systems and methods

#63

20070158580

2007-07-12

Ion sources, systems and methods

#64

20070158558

2007-07-12

Ion sources, systems and methods

#65

20070158557

2007-07-12

Ion sources, systems and methods

#66

20070158556

2007-07-12

Ion sources, systems and methods

#67

20070158555

2007-07-12

Ion sources, systems and methods

#68

20070138388

2007-06-21

Ion sources, systems and methods

#69

20070085027

2007-04-19

Real-time compensation of mechanical position error in pattern generation or imaging applications

#70

20070069158

2007-03-29

Charged particle beam apparatus

#71

20060192120

2006-08-31

Charged-particle-beam mapping projection-optical systems and methods for adjusting same

#72

20060152723

2006-07-13

Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method

#73

20060098188

2006-05-11

Method of localizing fluorescent markers

#74

20060091321

2006-05-04

Wafer alignment method for dual beam system

#75

20060027765

2006-02-09

Device for controlling an apparatus generating a charged particle beam

#76

20050139320

2005-06-30

Thin-film magnetic recording head manufacture using selective imaging

#77

20050104017

2005-05-19

Method and apparatus for inspecting samples, and method for manufacturing devices using method and apparatus for inspecting samples

#78

20050077486

2005-04-14

Device and method of positionally accurate implantation of individual particles in a substrate surface

#79

20050030524

2005-02-10

System and method for integrated multi-use optical alignment