H01J2237/3137 - CPC Classification Index

ClassID:

206601 ⎘

H01J2237/3137 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a macro-scale; Evaporating Plasma-assisted co-operation

Recent Application in this class:

20230162996

2023-05-25

ETCHING APPARATUS

20210125821

2021-04-29

Method and device for the surface treatment of substrates

20190393053

2019-12-26

ETCHING APPARATUS

20180204717

2018-07-19

Method and device for the surface treatment of substrates

20170345627

2017-11-30

Charged-particle microscope with in situ deposition functionality

20170069483

2017-03-09

Method and device for the surface treatment of substrates

20120196051

2012-08-02

Deposition Apparatus and Methods

20100155224

2010-06-24

Multi-component deposition

20090288603

2009-11-26

PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD

#10

20090160307

2009-06-25

DIAMOND ELECTRON SOURCE AND METHOD FOR MANUFACTURING THE SAME

#11

20080038933

2008-02-14

Plasma and electron beam etching device and method

#12

20070215047

2007-09-20

Vacuum device where power supply mechanism is mounted and power supply method

#13

20050287296

2005-12-29

Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings

#14

20050205415

2005-09-22

Multi-component deposition

#15

20050067934

2005-03-31

Discharge apparatus, plasma processing method and solar cell

#16

20050029090

2005-02-10

Method and apparatus for ionization film formation