ClassID:

206602

H01J2237/3142 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a macro-scale Ion plating

Sub-classes:
Recent Application in this class:
#1
20170178870
2017-06-22

Method of extracting and accelerating ions

#2
20170178859
2017-06-22

Systems for controlling a high power ion beam

#3
20150307986
2015-10-29

Wafer stage for symmetric wafer processing

#4
20130266490
2013-10-10

High-density ion transport measurement biochip devices and methods

#5
20130206585
2013-08-15

Compact, filtered ion source

#6
20110272593
2011-11-10

Gas cluster ion beam system with cleaning apparatus

#7
20110147200
2011-06-23

Ion beam generator, and substrate processing apparatus and production method of electronic device using the ion beam generator

#8
20100319545
2010-12-23

CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDMENT APPARATUS

#9
20100059369
2010-03-11

PLASMA GENERATING APPARATUS RENDERED ELECTRICALLY NEUTRAL ON THE PERIPHERY OF PLASMA GUN

#10
20100044579
2010-02-25

APPARATUS

#11
20090314963
2009-12-24

METHOD FOR FORMING TRENCH ISOLATION

#12
20090209029
2009-08-20

HIGH-DENSITY ION TRANSPORT MEASUREMENT BIOCHIP DEVICES AND METHODS

#13
20090203226
2009-08-13

Neutral beam-assisted atomic layer chemical vapor deposition apparatus and method of processing substrate using the same

#14
20080290298
2008-11-27

Method and system for treating an interior surface of a workpiece using a charged particle beam

#15
20080142735
2008-06-19

Charged particle-beam processing using a cluster source

#16
20080121791
2008-05-29

Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the same

#17
20080048127
2008-02-28

Ion source including magnet and magnet yoke assembly

#18
20070144901
2007-06-28

Pulsed cathodic arc plasma

#19
20060029955
2006-02-09

High-density ion transport measurement biochip devices and methods

#20
20050126903
2005-06-16

Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source

#21
20050067934
2005-03-31

Discharge apparatus, plasma processing method and solar cell