ClassID:

206603

H01J2237/3146 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a macro-scale; Ion plating Ion beam bombardment sputtering

Recent Application in this class:
#1
20250183003
2025-06-05

ION BEAM SPUTTERING APPARATUS AND METHOD

#2
20220013324
2022-01-13

Single beam plasma source

#3
20210104380
2021-04-08

Ion beam sputtering apparatus and method

#4
20200051783
2020-02-13

Metal plating of grids for ion beam sputtering

#5
20160148779
2016-05-26

Specimen preparation device

#6
20160024645
2016-01-28

Ion beam sample preparation and coating apparatus and methods

#7
20150262789
2015-09-17

Method for increased target utilization in ion beam deposition tools

#8
20150167150
2015-06-18

Formation of an alignment film for a liquid crystal on a substrate

#9
20120080308
2012-04-05

PLUME STEERING

#10
20120080307
2012-04-05

ION BEAM DISTRIBUTION

#11
20100207529
2010-08-19

Closed drift ion source

#12
20100084569
2010-04-08

Ion deposition apparatus having rotatable carousel for supporting a plurality of targets

#13
20100003423
2010-01-07

PLASMA GENERATING APPARATUS AND FILM FORMING APPARATUS USING PLASMA GENERATING APPARATUS

#14
20090255803
2009-10-15

PLASMA GENERATING APPARATUS, DEPOSITION APPARATUS, AND DEPOSITION METHOD

#15
20090246116
2009-10-01

Process for manufacturing single-wall carbon nanotubes

#16
20090160307
2009-06-25

DIAMOND ELECTRON SOURCE AND METHOD FOR MANUFACTURING THE SAME

#17
20090098306
2009-04-16

Method and apparatus for surface processing of a substrate using an energetic particle beam

#18
20090050469
2009-02-26

Alignment film forming apparatus and method

#19
20090037015
2009-02-05

Method and system for increasing throughput during location specific processing of a plurality of substrates

#20
20090020415
2009-01-22

"Iontron" ion beam deposition source and a method for sputter deposition of different layers using this source

#21
20080179186
2008-07-31

THIN FILM FORMING APPARATUS

#22
20070151842
2007-07-05

APPARATUS FOR REACTIVE SPUTTERING

#23
20070114123
2007-05-24

Deposition on charge sensitive materials with ion beam deposition

#24
20060008657
2006-01-12

Method of forming coated article using sputtering target(s) and ion source(s) and corresponding apparatus