206609 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale Ion implantation
Method of manufacturing electronic device capable of controlling threshold voltage and ion implanter controller and system that perform the method
#302Method of correction for wafer crystal cut error in semiconductor processing
#303Ion implanting apparatus
#304Rubber plate used in an ion implanter and method of preparing the same
#305Ion implanter electrodes
#306Ion beam slit extraction with mass separation
#307Ion source, ion implanting device, and manufacturing method of semiconductor devices
#308Ion implantation ion source, system and method
#309Method for preparing a source material including forming a paste for ion implantation
#310Tetrode extraction apparatus for ion source
#311Scan and corrector magnet designs for high throughput scanned beam ion implanter
#312Wafer temperature control with consideration to beam power input
#313Apparatus and method for improved ion beam current
#314Dual cathode ion source
#315Two-axis variable width mass resolving aperture with fast acting shutter motion
#316Electrode, accelerator column and ion implantation apparatus including same
#317Pedestal alignment tool for an orienter pedestal of an ion implant device
#318Beam current density distribution adjustment device and ion implanter
#319Cam actuated filament clamp