206609 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale Ion implantation
Sub-classes:MOBILE RADIATION DETECTOR SYSTEM FOR ION IMPLANTERS
#2ION IMPLANTATION APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
#3ION IMPLANTATION DEVICE WITH ENERGY FILTER HAVING ADDITIONAL THERMAL ENERGY DISSIPATION SURFACE AREA
#4ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE
#5ION IMPLANTER
#6ION IMPLANTATION SYSTEM AND METHOD OF OPERATION
#7Automatic Beam Uniformity Correction Through Generative AI Modeling
#8ADJUSTABLE EXIT ANGLE SOURCE FOR IONS AND NEUTRAL PARTICLES
#9IN-SITU ION BEAM ANGLE MEASUREMENT
#10ION IMPLANTER AND ION IMPLANTATION METHOD
#11Actively Cooled Gas Line For Ion Source
#12ADJUSTABLE SUPPORT FOR ARC CHAMBER OF ION SOURCE
#13METHOD AND SYSTEMS USEFUL FOR PRODUCING ALUMINUM IONS
#14HELICAL VOLTAGE STANDOFF
#15Active Cooling Of Quartz Enveloped Heaters In Vacuum
#16CHARGE FILTER MAGNET WITH VARIABLE ACHROMATICITY
#17Linear accelerator coil including multiple fluid channels
#18Adjustable support for arc chamber of ion source
#19Ion source repeller
#20Load lock device having optical measuring device for acquiring distance
#21FRACTIONING DEVICE
#22Etching aluminum nitride or aluminum oxide to generate an aluminum ion beam
#23Ion implanter, ion implantation method, and semiconductor device manufacturing method
#24Method and systems useful for producing aluminum ions
#25Ion source with single-slot tubular cathode
#26REFLECTANCE REDUCTION OF SUBSTRATE FOR TRANSMITTING INFRARED LIGHT
#27Semiconductor wafer with modified surface and fabrication method thereof
#28Dual cathode ion source
#29Method of mixing upstream and downstream current measurements for inference of the beam current at the bend of an optical element for realtime dose control
#30Scan and corrector magnet designs for high throughput scanned beam ion implanter
#31Cylindrical shaped arc chamber for indirectly heated cathode ion source
#32Ion source with tailored extraction shape
#33Two die sides with PTI. PTO. TDI, TCK, TMS, TDO, PTIO contact points method
#34Methods and systems for plasma deposition and treatment
#35CARBON MATERIALS FOR CARBON IMPLANTATION
#36METHODS FOR INCREASING BEAM CURRENT IN ION IMPLANTATION
#37Dual cathode ion source
#38Compact high energy ion implantation system
#39Ion source and ion implantation apparatus
#40In-situ wafer temperature measurement and control
#41Ion implantation apparatus and measurement device
#42Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby
#43Method and device for implanting ions in wafers
#44Ion implantation apparatus and measurement device
#45Energy filter for processing a power semiconductor device
#46Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation
#47Ion implantation amount adjustment device and method, ion implantation apparatus and determination method
#48Semiconductor wafer with modified surface and fabrication method thereof
#49System and method for in-situ beamline film stabilization or removal in the AEF region
#50Device for modulating the intensity of a particle beam from a charged particle source
#51Tattletale ion-implanted nanoparticles
#52Ionization vacuum measuring cell
#53Low profile extraction electrode assembly
#54METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SAME
#55Wafer cooling system and method
#56Dual cathode ion source
#57Ion implantation method and ion implantation apparatus
#58Phosphine co-gas for carbon implants
#59Ion beam irradiation apparatus and substrate processing apparatus
#60Ion implantation apparatus and ion implantation method
#61Superjunction structure in a power semiconductor device
#62Energy filter for processing a power semiconductor device
#63Ion implanter comprising integrated ventilation system
#64Negative ribbon ion beams from pulsed plasmas
#65Apparatus for exhaust cooling
#66DOPANT COMPOSITIONS FOR ION IMPLANTATION
#67Ion source repeller shield comprising a labyrinth seal
#68High-throughput system and method for post-implantation single wafer warm-up
#69METHODS FOR ATOM INCORPORATION INTO MATERIALS USING A PLASMA AFTERGLOW
#70Ion beam generator, ion implantation apparatus including an ion beam generator and method of using an ion beam generator
#71Ion implanter
#72Ion implantation system and process
#73Grid, method of manufacturing the same, and ion beam processing apparatus
#74Techniques and apparatus for manipulating an ion beam
#75Carbon materials for carbon implantation
#76Light bath for particle suppression
#77Apparatus and method for generating high current negative hydrogen ion beam
#78Method of manufacturing optical member
#79Ion implantation apparatus and method for processing plurality of wafers using the same
#80STORAGE AND SUB-ATMOSPHERIC DELIVERY OF DOPANT COMPOSITIONS FOR CARBON ION IMPLANTATION
#81Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation
#82METHODS, SYSTEMS AND APPARATUS FOR ACCELERATING LARGE PARTICLE BEAM CURRENTS
#83Resonant enhancement of photoionization of gaseous atoms
#84Apparatus and method for controlling implant process
#85Bipolar wafer charge monitor system and ion implantation system comprising same
#86Adjustable mass resolving aperture
#87Adjustable mass resolving aperture
#88Magnetic field fluctuation for beam smoothing
#89Marking plastic-based products
#90METHOD AND ION IMPLANTER FOR LOW TEMPERATURE IMPLANTATION
#91SYSTEMS AND METHODS FOR BEAM ANGLE ADJUSTMENT IN ION IMPLANTERS WITH BEAM DECELARATION
#92Laser-Induced Borane Production for Ion Implantation
#93Method and apparatus for neutral beam processing based on gas cluster ion beam technology and articles produced thereby
#94Apparatus and method to control an ion beam
#95Boron implanting using a co-gas
#96Microbolometer devices in CMOS and BiCMOS technologies
#97High energy ion implanter, beam current adjuster, and beam current adjustment method
#98Mass analyzing electromagnet and ion beam irradiation apparatus
#99Ion beam treatment method for producing superhydrophilic glass materials
#100Implant masking and alignment system with rollers
#101Annular cooling fluid passage for magnets
#102Isotopically-enriched boron-containing compounds, and methods of making and using same
#103STRUCTURES INCLUDING ION BEAM-MIXED LITHIUM ION BATTERY ELECTRODES, METHODS OF MAKING, AND METHODS OF USE THEREOF
#104Ion implantation apparatus and control method for ion implantation apparatus
#105Beam irradiation apparatus and beam irradiation method
#106Ion implantation apparatus
#107Ion implantation apparatus
#108Ion implanter provided with a plurality of plasma source bodies
#109Angular scanning using angular energy filter
#110Ion implanter and ion implantation method
#111Method and apparatus for neutral beam processing based on gas cluster ion beam technology
#112Technique for temperature measurement and calibration of semiconductor workpieces using infrared
#113MAGNETIC SCANNING SYSTEM FOR ION IMPLANTERS
#114Boron-containing dopant compositions, systems and methods of use thereof for improving ion beam current and performance during boron ion implantation
#115Platen support structure
#116High-energy ion implanter, beam collimator, and beam collimation method
#117METHOD AND APPARATUS FOR THREE DIMENSIONAL ION IMPLANTATION
#118Ion implantation apparatus and method of controlling ion implantation apparatus
#119Ion sources, systems and methods
#120Using wafer geometry to improve scanner correction effectiveness for overlay control
#121Ion implantation device
#122Deceleration apparatus for ribbon and spot beams
#123Particle beam transport apparatus
#124Insulation structure and insulation method
#125Insulation structure of high voltage electrodes for ion implantation apparatus
#126High-throughput system and method for post-implantation single wafer warm-up
#127Sapphire property modification through ion implantation
#128Method for manufacturing semiconductor device
#129Ion generation method and ion source
#130Three dimensional metal deposition technique
#131Inert atmospheric pressure pre-chill and post-heat
#132System and method of ion beam source for semiconductor ion implantation
#133Double ended electrode manipulator
#134Ion beam bending magnet for a ribbon-shaped ion beam
#135Ion implantation apparatus and ion implantation method
#136Methods and systems for determining a critical dimension and overlay of a specimen
#137PLATEN CLEANING METHOD
#138Method of Anion Production from Atoms and Molecules
#139Ion implantation method and ion implantation apparatus
#140HEAT LIP SEAL FOR CRYOGENIC PROCESSING
#141Semiconductor structure made using improved multiple ion implantation process
#142Method and apparatus for forming the doped cryo-biology specimen of electron microscope
#143Method of ionization
#144Ion sources, systems and methods
#145Coating and ion beam mixing apparatus and method to enhance the corrosion resistance of the materials at the elevated temperature using the same
#146Semiconductor structure made using improved multiple ion implantation process
#147Isotopically-enriched boron-containing compounds, and methods of making and using same
#148Ion implantation system and ion implantation method using the same
#149Deceleration apparatus for ribbon and spot beams
#150ION BEAM DISTRIBUTION
#151Apparatus and method of temperature control during cleaving processes of thick materials
#152Ion source
#153Effective algorithm for warming a twist axis for cold ion implantations
#154Electrostatic chuck cleaning during semiconductor substrate processing
#155Method for modifying a material layer using gas cluster ion beam processing
#156Method for low temperature ion implantation
#157RF-driven ion source with a back-streaming electron dump
#158Particle beam transport apparatus and method of transporting a particle beam with small beam spot size
#159Magnet for ion beam irradiation apparatus equipped with protective member that covers plurality of magnetic field concentrating members
#160Method for modifying an etch rate of a material layer using energetic charged particles
#161Isotopically-enriched boron-containing compounds, and methods of making and using same
#162Ion beam processing apparatus
#163Isotopically-enriched boron-containing compounds, and methods of making and using same
#164Method for treating non-planar structures using gas cluster ion beam processing
#165Method and apparatus for uniformly implanting a wafer with an ion beam
#166PLATEN TO CONTROL CHARGE ACCUMULATION
#167COLD IMPLANT FOR OPTIMIZED SILICIDE FORMATION
#168CARBON MATERIALS FOR CARBON IMPLANTATION
#169External cathode ion source
#170Off-axis ion milling device for manufacture of magnetic recording media and method for using the same
#171CHARGED PARTICLE SEPARATION APPARATUS AND CHARGED PARTICLE BOMBARDMENT APPARATUS
#172Ion implanter
#173Methods and systems for determining a critical dimension and overlay of a specimen
#174Method for modifying a material layer using gas cluster ion beam processing
#175Ion implantation systems
#176Vapor compression refrigeration chuck for ion implanters
#177Ion implantation ion source, system and method
#178Cathode having electron production and focusing grooves, ion source and related method
#179Ion implantation apparatus, substrate clamping mechanism, and ion implantation method
#180Method and apparatus for extracting ions from an ion source for use in ion implantation
#181REDUCED IMPLANT VOLTAGE DURING ION IMPLANTATION
#182Method and apparatus for controlling beam current uniformity in an ion implanter
#183Implant uniformity control
#184Platen cleaning method
#185Extraction electrode manipulator
#186Hydrogen ion implanter using a broad beam source
#187Electrospray deposition: devices and methods thereof
#188COATING AND ION BEAM MIXING APPARATUS AND METHOD TO ENHANCE THE CORROSION RESISTANCE OF THE MATERIALS AT THE ELEVATED TEMPERATURE USING THE SAME
#189Ion implantation with heavy halogenide compounds
#190Maskless Doping Technique for Solar Cells
#191Methods for implanting B22Hx and its ionized lower mass byproducts
#192Ion source for generating negatively charged ions
#193Ion implanting apparatus
#194Cooled cleaving implant
#195VAPOR DELIVERY SYSTEM USEFUL WITH ION SOURCES AND VAPORIZERS FOR USE IN SUCH SYSTEM
#196Ion beam irradiating apparatus, and method of producing semiconductor device
#197TECHNIQUES FOR COLD IMPLANTATION OF CARBON-CONTAINING SPECIES
#198Methods for in situ surface treatment in an ion implantation system
#199Apparatus and methods for ion beam implantation using ribbon and spot beams
#200Ion sources, systems and methods
#201Vapor delivery to devices under vacuum
#202Ion implanters
#203RF electron source for ionizing gas clusters
#204TECHNIQUES FOR SHAPING AN ION BEAM
#205Double plasma ion source
#206NOVEL METHODS FOR CLEANING ION IMPLANTER COMPONENTS
#207UNIFORMITY CONTROL FOR ION BEAM ASSISTED ETCHING
#208Sealing between vacuum chambers
#209Ion implanting apparatus for forming ion beam shape
#210Positioning device for positioning an aperture plate in an ion beam
#211Scanning electron microscope
#212Elevated temperature RF ion source
#213Ion implantation method and semiconductor device manufacturing method
#214Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device
#215External cathode ion source
#216Ion source and method for operating same
#217Cathode having electron production and focusing grooves, ion source and related method
#218Broad energy-range ribbon ion beam collimation using a variable-gradient dipole
#219Electrostatic chuck with separated electrodes
#220Charged particle beam apparatus
#221Divergent charged particle implantation for improved transistor symmetry
#222Shielding assembly for semiconductor manufacturing apparatus and method of using the same
#223APPARATUS AND METHOD OF TEMPERATURE CONROL DURING CLEAVING PROCESSES OF THICK FILM MATERIALS
#224Gas Bearing Spindles
#225Generation, acceleration, focusing and collection of a high-brightness, space-charge-dominated circular charged-particle beam
#226Method to measure ion beam angle
#227Divergent Charged Particle Implantation for Improved Transistor Symmetry
#228Techniques for confining electrons in an ion implanter
#229Ion implantation apparatus
#230Delivery of a Charged Particle Beam
#231Method and device for ion beam processing of surfaces
#232Techniques for forming shallow junctions
#233Ion implanter with function of compensating wafer cut angle and ion implantation method using the same
#234Multivalent ion generating source and charged particle beam apparatus using such ion generating source
#235Dual mode ion source for ion implantation
#236Methods for beam current modulation by ion source parameter modulation
#237Beam tuning with automatic magnet pole rotation for ion implanters
#238Ion source
#239Analyzing electromagnet
#240Electrostatic chuck cleaning during semiconductor substrate processing
#241Techniques for temperature-controlled ion implantation
#242Dual mode ion source for ion implantation
#243Techniques for temperature-controlled ion implantation
#244Apparatus and method for ion beam implantation using ribbon and spot beams
#245Beam processing system and beam processing method
#246Use of scanning theme implanters and annealers for selective implantation and annealing
#247ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD
#248Method and apparatus for scanning a workpiece through an ion beam
#249Ion implantation ion source, system and method
#250Electromagnet with active field containment
#251Apparatus and method for controlling ion beam
#252Method for preparing a source material for ion implantation
#253Dual mode ion source for ion implantation
#254Technique for improving uniformity of a ribbon beam
#255Filament member, ion source, and ion implantation apparatus
#256Filament member, ion source, and ion implantation apparatus
#257Method and apparatus for extracting ions from an ion source for use in ion implantation
#258Dual mode ion source for ion implantation
#259Ion implantation ion source, system and method
#260Method of manufacturing CMOS devices by the implantation of N- and P-type cluster ions
#261Faraday cup assembly and method of controlling the same
#262Ion source element, ion implanter having the same and method of modifying the same
#263Deflecting electromagnet and ion beam irradiating apparatus
#264ION IMPLANTING APPARATUS AND METHOD
#265Ion beam irradiation apparatus
#266Methods and apparatus for ion beam angle measurement in two dimensions
#267Method and apparatus for extracting ions from an ion source for use in ion implantation
#268Method and apparatus for extracting ions from an ion source for use in ion implantation
#269Methods and apparatus for enabling multiple process steps on a single substrate
#270Method of measuring ion beam position
#271Methods and apparatus for ion beam angle measurement in two dimensions
#272Broad energy-range ribbon ion beam collimation using a variable-gradient dipole
#273Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms
#274Ion implantation cooling system
#275Ion doping system, ion doping method and semiconductor device
#276Method for controlling a vaporizer of ion implantation equipment during indium implantation process
#277Divergent charged particle implantation for improved transistor symmetry
#278Reduced particle generation from wafer contacting surfaces on wafer paddle and handling facilities
#279Dual mode ion source for ion implantation
#280Methods for cleaning ion implanter components
#281Method for implanting dopants within a substrate by tilting the substrate relative to the implant source
#282Methods and systems for determining a presence of macro and micro defects on a specimen
#283Scanning electron microscope
#284Moving vacuum chamber stage with air bearing and differentially pumped grooves
#285Apparatus for ion implantation
#286Workpiece support structure for an ion beam implanter featuring spherical sliding seal vacuum feedthrough
#287Doping method, doping apparatus, and control system for doping apparatus
#288Ion implantation apparatus for use in manufacturing of semiconductor device
#289Scanning mechanism of an ion implanter
#290Ion beam system
#291Monatomic boron ion source and method
#292Monatomic dopant ion source and method
#293Ion implantation ion source, system and method
#294Wafer scanning system with reciprocating rotary motion utilizing springs and counterweights
#295Mounting mechanism for plasma extraction aperture
#296Ion sources
#297monitoring on an ion implanter
#298Method and apparatus for improved beam stability in high current gas-cluster ion beam processing system
#299Ion implantation simulation apparatus, method, and program
#300Apparatus, method and program for ion implantation simulation, and computer readable storage medium having stored therein the program