SUBSTRATE PROPERTY CONTROL USING DOSE-DEPENDENT RESPONSE

SCANNED BEAM DOSE RATE MEASUREMENT FOR ION BEAM OPTIMIZATION

BEAM TUNING FOR NON-UNIFORM ION IMPLANTATION

ION IMPLANT DOSE MONITORING BY THERMAL WAVE MEASUREMENT

SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE IMPLANTATION

ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM

ION BEAM IMPLANTATION METHOD AND SEMICONDUCTOR DEVICE

GA IMPLANT PROCESS CONTROL FOR ENHANCED PARTICLE PERFORMANCE

Ion implanter and model generation method

Ion implanter and model generation method

Ion beam implantation method and semiconductor device

Techniques for determining and correcting for expected dose variation during implantation of photoresist-coated substrates

Ion implanter and ion implantation method

APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM

Ion implantation amount adjustment device and method, ion implantation apparatus and determination method

Apparatus and techniques for beam mapping in ion beam system

Ion implanter, ion beam irradiated target, and ion implantation method

In situ beam current monitoring and control in scanned ion implantation systems

Method for implantation of semiconductor wafers having high bulk resistivity

Apparatus and method for ion implantation

Ion implantation apparatus and semiconductor manufacturing method

Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method

Magnetic field fluctuation for beam smoothing

Monitoring device, ion implantation device, and monitoring method

Beam profiling speed enhancement for scanned beam implanters

Ion irradiation apparatus and ion irradiation method

Ion implanter, beam energy measuring device, and method of measuring beam energy

Method for monitoring ion implantation

Magnetic field fluctuation for beam smoothing

Implant-induced damage control in ion implantation

Apparatus for monitoring ion implantation

Solar cell, solar cell manufacturing device, and method for manufacturing the same

Dose measurement device for plasma-immersion ion implantation

System and method for ion implantation with improved productivity and uniformity

Ion implantation apparatus and ion implantation method

Apparatus for monitoring ion implantation

System and method of dosage profile control

Ion implanter

Method for checking ion implantation condition and method for manufacturing semiconductor wafer

Beam line system of ion implanter

DETERMINING RELATIVE SCAN VELOCITY TO CONTROL ION IMPLANTATION OF WORK PIECE

Dose Measurement Method using Calorimeter

Using beam blockers to perform a patterned implant of a workpiece

Versatile beam glitch detection system

System and method of dosage profile control

Handling beam glitches during ion implantation of workpieces

Ion beam irradiation system and ion beam irradiation method

Throughput Enhancement for Scanned Beam Ion Implanters

Ion implanting apparatus

Transmission energy contamination detector

Method for improving implant uniformity during photoresist outgassing

Ion beam apparatus and method employing magnetic scanning

Ion beam monitoring arrangement

Ion implantation ion source, system and method

METHOD OF DETERMINING ANGLE MISALIGNMENT IN BEAM LINE ION IMPLANTERS

REDUCED IMPLANT VOLTAGE DURING ION IMPLANTATION

Method and apparatus for controlling beam current uniformity in an ion implanter

Implant uniformity control

ION IMPLANTING DEVICE AND METHOD

Elemental analysis method and semiconductor device manufacturing method

System and method of controlling broad beam uniformity

Ion implanter having combined hybrid and double mechanical scan architecture

System and method of performing uniform dose implantation under adverse conditions

Ion beam apparatus and method employing magnetic scanning

Techniques for improved uniformity tuning in an ion implanter system

Extraction electrode system for high current ion implanter

Ion implantation method

Ion source and ion implantation apparatus

Ion beam apparatus and method for ion implantation

Ion implantation method and apparatus

Ion implantation method and apparatus

METHODS FOR MONITORING IMPLANTER PERFORMANCE

TECHNIQUES FOR MEASURING AND CONTROLLING ION BEAM ANGLE AND DENSITY UNIFORMITY

Manufacturing system for semiconductor device capable of controlling variation in electrical property of element in wafer surface and method for manufacturing the semiconductor device

Measuring energy contamination using time-of-flight techniques

Implant beam utilization in an ion implanter

SINGLE WAFER IMPLANTER FOR SILICON-ON-INSULATOR WAFER FABRICATION

Ion implanting apparatus

Ion implanter having combined hybrid and double mechanical scan architecture

Dosage accuracy monitoring systems of implanters

Ion implantation apparatus

Ion implantation apparatus and ion implantation method

Ion implanting apparatus and method for implanting ions

Methods for monitoring ion implant process in bond and cleave, silicon-on-insulator (SOI) wafer manufacturing

Ion implantation device and method for implanting ions

Magnetic monitoring of a Faraday cup for an ion implanter

Partial ion implantation apparatus and method using bundled beam

Ion implantation apparatus and method for obtaining non-uniform ion implantation energy

Determining dopant information

Method of determining angle misalignment in beam line ion implanters

Sensor for ion implanter

Beam line architecture for ion implanter

Technique for improving ion implantation throughput and dose uniformity

Technique for improving ion implantation based on ion beam angle-related information

Ion beam current uniformity monitor, ion implanter and related method

Ion beam irradiating apparatus and method of adjusting uniformity of a beam

Ion beam measuring method and ion implanting apparatus

Methods and apparatus for beam density measurement in two dimensions

Ion beam scanning control methods and systems for ion implantation uniformity

Dose uniformity correction technique

Non-uniform ion implantation

System and method of ion beam control in response to a beam glitch

Beam measuring equipment and beam measuring method using the same

Closed loop dose control for ion implantation

ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD

Ion implantation ion source, system and method

Method of implanting a substrate and an ion implanter for performing the method

Preventing dosage drift with duplicate dose integrators

Ion beam current monitoring

METHOD OF CHARACTERIZING AN ION BEAM

Apparatus and method for partial ion implantation

Wafer charge monitoring

Controlling the characteristics of implanter ion-beams

Ion implantation system and control method

Ion implantation system and control method

Ion implantation system having variable screen aperture and ion implantation method using the same

Ion implantation apparatus and ion implanting method

Ion beam angle measurement systems and methods for ion implantation systems

Beam current stabilization utilizing gas feed control loop

Ion implanation method and device using thereof

Means to establish orientation of ion beam to wafer and correct angle errors

Ion implanter and ion implantation control method thereof

Dual mode ion source for ion implantation

Method of implanting a substrate and an ion implanter for performing the method

Faraday system integrity determination

Method, system, and apparatus for improving doping uniformity in high-tilt ion implantation

Ion beam profiler

Controlling the characteristics of implanter ion-beams

Systems and methods for implant dosage control

Ion beam measuring method and ion implanting apparatus

Methods and apparatus for ion beam angle measurement in two dimensions

Technique for uniformity tuning in an ion implanter system

Technique for uniformity tuning in an ion implanter system

Matching dose and energy of multiple ion implanters

Technique for tuning an ion implanter system

Ion implantation system and control method

Method of measuring ion beam position

Technique for ion beam angle spread control for advanced applications

Technique for ion beam angle process control

Technique for ion beam angle spread control

Method of implanting a substrate and an ion implanter for performing the method

Ion beam measurement apparatus and method

Controlling the characteristics of implanter ion-beams

Ion implant ion beam parallelism and direction integrity determination and adjusting

Ion beam scanning control methods and systems for ion implantation uniformity

Ion-implanting apparatus, ion-implanting method, and device manufactured thereby

Method and apparatus for ion beam profiling

Ion beam implant current, spot width and position tuning

Ion implanters having an arc chamber that affects ion current density

Scanning systems and methods for providing ions from an ion beam to a workpiece

Ion beam measurement systems and methods for ion implant dose and uniformity control

Ion implantation monitor system and method thereof

Ion implanter and method of manufacturing semiconductor device

Device and method for measurement of beam angle and divergence

Method of implanting a substrate and an ion implanter for performing the method

Ion implantation ion source, system and method

Uniformity control multiple tilt axes, rotating wafer and variable scan velocity

Uniformity control using multiple fixed wafer orientations and variable scan velocity

Controlling the characteristics of implanter ion-beams

Method for reciprocating a workpiece through an ion beam

Reciprocating drive for scanning a workpiece

Reciprocating drive for scanning a workpiece through an ion beam

Ion implantation apparatus and ion implanting method

Ion beam monitoring arrangement

Modulating ion beam current

Matching dose and energy of multiple ion implanters

Ion implantation apparatus and partical collection structure thereof

Method and system for in-situ calibration of a dose controller for ion implantation

Beam current measuring device and apparatus using the same

Method of controlling implant dosage and pressure compensation factor in-situ

Utilization of an ion gauge in the process chamber of a semiconductor ion implanter

Ion implantation ion source, system and method

Technique for adjusting a penetration depth during the implantation of ions into a semiconductor region

Electromagnetic regulator assembly for adjusting and controlling the current uniformity of continuous ion beams

Selective area implant of a workpiece