ClassID:

206611

H01J2237/31705 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Ion implantation Impurity or contaminant control

Recent Application in this class:
#1
20260143980
2026-05-21

ANGLED ION IMPLANT TO ENABLE VOID-FREE FILLING OF HIGH ASPECT RATIO TRENCH

#2
20260135063
2026-05-14

BEAM CONDITIONING FOR DEFECT CONTROL IN BEAMLINE ION IMPLANTER

#3
20250014854
2025-01-09

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN THE PRODUCTION OF WAFERS

#4
20240331973
2024-10-03

ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS

#5
20240232470
2024-07-11

A Method for the Simulation of an Energy-Filtered Ion Implantation (EFII)

#6
20240135066
2024-04-25

A Method for the Simulation of an Energy-Filtered Ion Implantation (EFII)

#7
20240055217
2024-02-15

Energy filter element for ion implantation systems for the use in the production of wafers

#8
20230235449
2023-07-27

HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED LOW SPUTTER YIELD ION BEAM

#9
20220020556
2022-01-20

Energy filter element for ion implantation systems for the use in the production of wafers

#10
20210249222
2021-08-12

Apparatus and method for metal contamination control in an ion implantation system using charge stripping mechanism

#11
20210027975
2021-01-28

Energy filter element for ion implantation systems for the use in the production of wafers

#12
20210013000
2021-01-14

POROUS CARBONACEOUS VACUUM CHAMBER LINERS

#13
20200335302
2020-10-22

Multiple arc chamber source

#14
20200234917
2020-07-23

LOW EMISSION CLADDING AND ION IMPLANTER

#15
20200234910
2020-07-23

Low emission cladding and ion implanter

#16
20200161076
2020-05-21

Electostatic filter and method for controlling ion beam properties using electrostatic filter

#17
20190267241
2019-08-29

Ion injecting device using vacant baffle and faraday cups, and ion injecting method thereof, for detecting content of suspending particles

#18
20190267209
2019-08-29

Method and device for implanting ions in wafers

#19
20190259560
2019-08-22

Conductive beam optic containing internal heating element

#20
20190122850
2019-04-25

Energy filter element for ion implantation systems for the use in the production of wafers

#21
20180346342
2018-12-06

Hydrogen co-gas when using aluminum iodide as an ion source material

#22
20180247801
2018-08-30

GALLIUM IMPLANTATION CLEANING METHOD

#23
20180247800
2018-08-30

GALLIUM IMPLANTATION CLEANING METHOD

#24
20180096828
2018-04-05

In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source

#25
20170362700
2017-12-21

Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products

#26
20170362699
2017-12-21

Implantation using solid aluminum iodide (AlI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products

#27
20170243610
2017-08-24

ULTRA-THIN CORROSION RESISTANT HARD OVERCOAT FOR HARD DISK MEDIA

#28
20170133193
2017-05-11

Ion source liner having a lip for ion implantation systems

#29
20170092473
2017-03-30

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS HAVING VARIED GEOMETRIES

#30
20170062173
2017-03-02

Light bath for particle suppression

#31
20160189912
2016-06-30

Combined electrostatic lens system for ion implantation

#32
20150179393
2015-06-25

Reduced trace metals contamination ion source for an ion implantation system

#33
20150162166
2015-06-11

System and method for controlling ion implanter

#34
20150132929
2015-05-14

METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLASMA DOPING APPARATUS

#35
20150129775
2015-05-14

Ion generator and ion generating method

#36
20150069913
2015-03-12

Ion implantation with charge and direction control

#37
20140319369
2014-10-30

Ion source and a method for in-situ cleaning thereof

#38
20140106550
2014-04-17

ION IMPLANTATION TUNING TO ACHIEVE SIMULTANEOUS MULTIPLE IMPLANT ENERGIES

#39
20140034846
2014-02-06

In-vacuum high speed pre-chill and post-heat stations

#40
20130181139
2013-07-18

Beam line design to reduce energy contamination

#41
20130140987
2013-06-06

Ion implantation with charge and direction control

#42
20130009075
2013-01-10

Beam line system of ion implanter

#43
20110012033
2011-01-20

Adjustable louvered plasma electron flood enclosure

#44
20100148089
2010-06-17

Ion implantation ion source, system and method

#45
20100116983
2010-05-13

Mass analysis magnet for a ribbon beam

#46
20100025596
2010-02-04

Fastening apparatus

#47
20100024841
2010-02-04

Ion source and a method for in-situ cleaning thereof

#48
20100019141
2010-01-28

ENERGY CONTAMINATION MONITOR WITH NEUTRAL CURRENT DETECTION

#49
20090321630
2009-12-31

Post-decel magnetic energy filter for ion implantation systems

#50
20090206275
2009-08-20

ACCELERATOR PARTICLE BEAM APPARATUS AND METHOD FOR LOW CONTAMINATE PROCESSING

#51
20090181527
2009-07-16

Graphite member for beam-line internal member of ion implantation apparatus

#52
20090179158
2009-07-16

IN-VACUUM PROTECTIVE LINERS

#53
20090166565
2009-07-02

Ion implanters

#54
20090166564
2009-07-02

METHODS FOR MONITORING IMPLANTER PERFORMANCE

#55
20090095916
2009-04-16

Ion beam guide tube

#56
20090061605
2009-03-05

Profile adjustment in plasma ion implanter

#57
20080230724
2008-09-25

Contamination reduction during ion implantation

#58
20080223409
2008-09-18

METHOD AND APPARATUS FOR EXTENDING EQUIPMENT UPTIME IN ION IMPLANTATION

#59
20080164427
2008-07-10

Ion implanters

#60
20080149857
2008-06-26

System and method for two-dimensional beam scan across a workpiece of an ion implanter

#61
20080149856
2008-06-26

Techniques for reducing contamination during ion implantation

#62
20080105828
2008-05-08

TECHNIQUES FOR REMOVING MOLECULAR FRAGMENTS FROM AN ION IMPLANTER

#63
20080087846
2008-04-17

Sensor for ion implanter

#64
20080054193
2008-03-06

Ion beam guide tube

#65
20070278417
2007-12-06

ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD

#66
20070268650
2007-11-22

Electrostatic chuck to limit particle deposits thereon

#67
20070262262
2007-11-15

Ion implantation ion source, system and method

#68
20070241276
2007-10-18

Ion beam contamination determination

#69
20070221871
2007-09-27

Determining ion beam parallelism using refraction method

#70
20070187619
2007-08-16

Electromagnet with active field containment

#71
20070187618
2007-08-16

ELECTROSTATIC PARTICLE GETTERING IN AN ION IMPLANTER

#72
20070176115
2007-08-02

Ion implantation system and control method

#73
20070176114
2007-08-02

Ion implantation system and control method

#74
20070137671
2007-06-21

Fluorine based cleaning of an ion source

#75
20070125957
2007-06-07

Techniques for reducing effects of photoresist outgassing

#76
20070125955
2007-06-07

Techniques for preventing parasitic beamlets from affecting ion implantation

#77
20070108394
2007-05-17

Dual mode ion source for ion implantation

#78
20070102652
2007-05-10

Ion implanter with contaminant collecting surface

#79
20070075274
2007-04-05

Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases

#80
20070056316
2007-03-15

Method and apparatus for the production of purified liquids and vapors

#81
20070045570
2007-03-01

Technique for improving ion implanter productivity

#82
20070018114
2007-01-25

Resonance method for production of intense low-impurity ion beams of atoms and molecules

#83
20070018093
2007-01-25

Analyzing chamber including a leakage ion beam detector and mass analyzer including the same

#84
20060289799
2006-12-28

Profile adjustment in plasma ion implanter

#85
20060284117
2006-12-21

Charged beam dump and particle attractor

#86
20060284116
2006-12-21

Particulate prevention in ion implantation

#87
20060284071
2006-12-21

Beam stop and beam tuning methods

#88
20060238133
2006-10-26

Ion implantation system and control method

#89
20060192134
2006-08-31

Ion beam measurement apparatus and method

#90
20060163494
2006-07-27

Ion implantation method and method for manufacturing semiconductor device

#91
20060131514
2006-06-22

Removing byproducts of physical and chemical reactions in an ion implanter

#92
20060113493
2006-06-01

Irradiation system ion beam and method to enhance accuracy of irradiation

#93
20060113466
2006-06-01

Irradiation system with ion beam

#94
20060113465
2006-06-01

Method to increase low-energy beam current in irradiation system with ion beam

#95
20050269520
2005-12-08

Ion implantation ion source, system and method

#96
20050133736
2005-06-23

Ion implantation apparatus and partical collection structure thereof

#97
20050092940
2005-05-05

Method of controlling implant dosage and pressure compensation factor in-situ

#98
20050092938
2005-05-05

Utilization of an ion gauge in the process chamber of a semiconductor ion implanter

#99
20050079694
2005-04-14

Ion implantation method and method for manufacturing semiconductor device

#100
20050051096
2005-03-10

Ion implantation ion source, system and method

#101
17665970
2023-07-11

System and method for hi-precision ion implantation