206611 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Ion implantation Impurity or contaminant control
ANGLED ION IMPLANT TO ENABLE VOID-FREE FILLING OF HIGH ASPECT RATIO TRENCH
#2BEAM CONDITIONING FOR DEFECT CONTROL IN BEAMLINE ION IMPLANTER
#3ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN THE PRODUCTION OF WAFERS
#4ION BEAM IRRADIATION METHOD AND ION BEAM IRRADIATION APPARATUS
#5A Method for the Simulation of an Energy-Filtered Ion Implantation (EFII)
#6A Method for the Simulation of an Energy-Filtered Ion Implantation (EFII)
#7Energy filter element for ion implantation systems for the use in the production of wafers
#8HIGH INCIDENCE ANGLE GRAPHITE FOR PARTICLE CONTROL WITH DEDICATED LOW SPUTTER YIELD ION BEAM
#9Energy filter element for ion implantation systems for the use in the production of wafers
#10Apparatus and method for metal contamination control in an ion implantation system using charge stripping mechanism
#11Energy filter element for ion implantation systems for the use in the production of wafers
#12POROUS CARBONACEOUS VACUUM CHAMBER LINERS
#13Multiple arc chamber source
#14LOW EMISSION CLADDING AND ION IMPLANTER
#15Low emission cladding and ion implanter
#16Electostatic filter and method for controlling ion beam properties using electrostatic filter
#17Ion injecting device using vacant baffle and faraday cups, and ion injecting method thereof, for detecting content of suspending particles
#18Method and device for implanting ions in wafers
#19Conductive beam optic containing internal heating element
#20Energy filter element for ion implantation systems for the use in the production of wafers
#21Hydrogen co-gas when using aluminum iodide as an ion source material
#22GALLIUM IMPLANTATION CLEANING METHOD
#23GALLIUM IMPLANTATION CLEANING METHOD
#24In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source
#25Implantation using solid aluminum iodide (ALI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
#26Implantation using solid aluminum iodide (AlI3) for producing atomic aluminum ions and in situ cleaning of aluminum iodide and associated by-products
#27ULTRA-THIN CORROSION RESISTANT HARD OVERCOAT FOR HARD DISK MEDIA
#28Ion source liner having a lip for ion implantation systems
#29IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS HAVING VARIED GEOMETRIES
#30Light bath for particle suppression
#31Combined electrostatic lens system for ion implantation
#32Reduced trace metals contamination ion source for an ion implantation system
#33System and method for controlling ion implanter
#34METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLASMA DOPING APPARATUS
#35Ion generator and ion generating method
#36Ion implantation with charge and direction control
#37Ion source and a method for in-situ cleaning thereof
#38ION IMPLANTATION TUNING TO ACHIEVE SIMULTANEOUS MULTIPLE IMPLANT ENERGIES
#39In-vacuum high speed pre-chill and post-heat stations
#40Beam line design to reduce energy contamination
#41Ion implantation with charge and direction control
#42Beam line system of ion implanter
#43Adjustable louvered plasma electron flood enclosure
#44Ion implantation ion source, system and method
#45Mass analysis magnet for a ribbon beam
#46Fastening apparatus
#47Ion source and a method for in-situ cleaning thereof
#48ENERGY CONTAMINATION MONITOR WITH NEUTRAL CURRENT DETECTION
#49Post-decel magnetic energy filter for ion implantation systems
#50ACCELERATOR PARTICLE BEAM APPARATUS AND METHOD FOR LOW CONTAMINATE PROCESSING
#51Graphite member for beam-line internal member of ion implantation apparatus
#52IN-VACUUM PROTECTIVE LINERS
#53Ion implanters
#54METHODS FOR MONITORING IMPLANTER PERFORMANCE
#55Ion beam guide tube
#56Profile adjustment in plasma ion implanter
#57Contamination reduction during ion implantation
#58METHOD AND APPARATUS FOR EXTENDING EQUIPMENT UPTIME IN ION IMPLANTATION
#59Ion implanters
#60System and method for two-dimensional beam scan across a workpiece of an ion implanter
#61Techniques for reducing contamination during ion implantation
#62TECHNIQUES FOR REMOVING MOLECULAR FRAGMENTS FROM AN ION IMPLANTER
#63Sensor for ion implanter
#64Ion beam guide tube
#65ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD
#66Electrostatic chuck to limit particle deposits thereon
#67Ion implantation ion source, system and method
#68Ion beam contamination determination
#69Determining ion beam parallelism using refraction method
#70Electromagnet with active field containment
#71ELECTROSTATIC PARTICLE GETTERING IN AN ION IMPLANTER
#72Ion implantation system and control method
#73Ion implantation system and control method
#74Fluorine based cleaning of an ion source
#75Techniques for reducing effects of photoresist outgassing
#76Techniques for preventing parasitic beamlets from affecting ion implantation
#77Dual mode ion source for ion implantation
#78Ion implanter with contaminant collecting surface
#79Systems and methods that mitigate contamination and modify surface characteristics during ion implantation processes through the introduction of gases
#80Method and apparatus for the production of purified liquids and vapors
#81Technique for improving ion implanter productivity
#82Resonance method for production of intense low-impurity ion beams of atoms and molecules
#83Analyzing chamber including a leakage ion beam detector and mass analyzer including the same
#84Profile adjustment in plasma ion implanter
#85Charged beam dump and particle attractor
#86Particulate prevention in ion implantation
#87Beam stop and beam tuning methods
#88Ion implantation system and control method
#89Ion beam measurement apparatus and method
#90Ion implantation method and method for manufacturing semiconductor device
#91Removing byproducts of physical and chemical reactions in an ion implanter
#92Irradiation system ion beam and method to enhance accuracy of irradiation
#93Irradiation system with ion beam
#94Method to increase low-energy beam current in irradiation system with ion beam
#95Ion implantation ion source, system and method
#96Ion implantation apparatus and partical collection structure thereof
#97Method of controlling implant dosage and pressure compensation factor in-situ
#98Utilization of an ion gauge in the process chamber of a semiconductor ion implanter
#99Ion implantation method and method for manufacturing semiconductor device
#100Ion implantation ion source, system and method
#101System and method for hi-precision ion implantation