Multi-beam writing using inclined exposure stripes

Method and system for forming a pattern on a reticle using charged particle beam lithography

Self-aligned dynamic pattern generator device and method of fabrication

Apparatus and methods for aberration correction in electron beam based system

Method of generating write data, multi charged particle beam writing apparatus, and pattern inspection apparatus

Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity

LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING AN ARTICLE

Method for charged-particle multi-beam exposure

Multi charged particle beam writing method, and multi charged particle beam writing apparatus