ClassID:

206617

H01J2237/31715 - CPC Classification

Classification description:

Sub-classes:
Recent Application in this class:
#1
20160343535
2016-11-24

Charged particle beam drawing apparatus and charged particle beam drawing method

#2
20160172144
2016-06-16

Activation chamber, kit used in treatment device and treatment device, for lowering electron affinity

#3
20160155609
2016-06-02

Method for generating writing data

#4
20160155600
2016-06-02

Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams

#5
20160133438
2016-05-12

Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same

#6
20160107471
2016-04-21

Nanostructure array diffractive optics for RGB and CMYK color displays

#7
20160086764
2016-03-24

Method of measuring beam position of multi charged particle beam, and multi charged particle beam writing apparatus

#8
20160071696
2016-03-10

Beam grid layout

#9
20160064179
2016-03-03

Blanking device for multi-beam of charged particle writing apparatus using multi-beam of charged particle and defective beam blocking method for multi-beam of charged particle

#10
20150380213
2015-12-31

Apparatus and method for calculating drawing speeds of a charged particle beam

#11
20150348741
2015-12-03

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

#12
20150340196
2015-11-26

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

#13
20150311032
2015-10-29

Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same

#14
20150303025
2015-10-22

LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE

#15
20150294836
2015-10-15

Shot data generation method and multi charged particle beam writing method

#16
20150248993
2015-09-03

Compensation of defective beamlets in a charged-particle multi-beam exposure tool

#17
20150243481
2015-08-27

Proximity effect correction in a charged particle lithography system

#18
20150213997
2015-07-30

Ion sources, systems and methods

#19
20150179403
2015-06-25

Method and apparatus for transferring pixel data for electron beam lithography

#20
20150034842
2015-02-05

DRIVING APPARATUS, CHARGED PARTICLE BEAM IRRADIATION APPARATUS, METHOD OF MANUFACTURING DEVICE