H01J2237/3173 - CPC Classification Index

ClassID:

206626 ⎘

H01J2237/3173 - CPC Classification

Classification description:

Recent Application in this class:

20160141144

2016-05-19

Method and apparatus for electron beam lithography

20160141142

2016-05-19

Blanking system for multi charged particle beams, and multi charged particle beam writing apparatus

20160086768

2016-03-24

Ozone supplying apparatus, ozone supplying method, and charged particle beam drawing system

20150371810

2015-12-24

Individually switched field emission arrays

20150332899

2015-11-19

Arrangement for transporting radicals

20150318145

2015-11-05

Lithography apparatus, and method of manufacturing an article

20150311036

2015-10-29

Charged particle beam drawing apparatus

20150255249

2015-09-10

Multi charged particle beam writing apparatus

20150228455

2015-08-13

Charged particle beam writing apparatus, and charged particle beam writing method

#10

20150187540

2015-07-02

DRAWING APPARATUS AND METHOD OF MANUFACTURING ARTICLE

#11

20150179392

2015-06-25

Method and apparatus for electron beam lithography

#12

20150162165

2015-06-11

Charged particle beam lithography system and target positioning device

#13

20150137010

2015-05-21

Multi-electrode stack arrangement

#14

20150137009

2015-05-21

Multi-electrode cooling arrangement

#15

20150028223

2015-01-29

Arrangement and method for transporting radicals