Patents-Review.com
ClassID:

206652 ⎘

H01J2237/31774 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography Multi-beam

Recent Application in this class:
#1
20260135058
2026-05-14

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

 #2
20250336643
2025-10-30

ELECTRON BEAM PROCESSING METHODS

 #3
20240419080
2024-12-19

APPARATUS AND METHODS FOR BEAM PROCESSING OF SUBSTRATES

 #4
20240242922
2024-07-18

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #5
20240186100
2024-06-06

BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #6
20230386784
2023-11-30

Method and system for determining a charged particle beam exposure for a local pattern density

 #7
20230360880
2023-11-09

Multi-Beam Pattern Definition Device

 #8
20230154725
2023-05-18

EMITTER FOR EMITTING CHARGED PARTICLES

 #9
20230125800
2023-04-27

CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD

 #10
20230124768
2023-04-20

METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY

 #11
20230056463
2023-02-23

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

 #12
20220285124
2022-09-08

ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM

 #13
20210313143
2021-10-07

Method and system for determining a charged particle beam exposure for a local pattern density

 #14
20210257184
2021-08-19

Multi-beam writing method and multi-beam writing apparatus

 #15
20210225611
2021-07-22

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

 #16
20210109450
2021-04-15

Apparatus and methods for beam processing of substrates

 #17
20200411280
2020-12-31

Multiple electron-beam image acquisition apparatus and multiple electron-beam image acquisition method using beam arrangement with omitted corners in a scan direction

 #18
20200373122
2020-11-26

Method and system for determining a charged particle beam exposure for a local pattern density

 #19
20200266033
2020-08-20

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #20
20200176151
2020-06-04

Feedthrough device and signal conductor path arrangement

 #21
20200135428
2020-04-30

Multi-charged particle beam writing apparatus, and multi-charged particle beam writing method

 #22
20200098554
2020-03-26

Method of sample preparation using dual ion beam trenching

 #23
20200083016
2020-03-12

Semiconductor apparatus and charged particle ray exposure apparatus

 #24
20200051782
2020-02-13

Writing data generation method, computer-readable recording medium on which program is recorded, and multi-charged particle beam writing apparatus

 #25
20200051780
2020-02-13

Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method

 #26
20190385812
2019-12-19

Multi-charged-particle-beam writing apparatus and beam evaluating method for the same

 #27
20190304749
2019-10-03

Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method

 #28
20190198293
2019-06-27

Charged particle beam lithography apparatus and charged particle beam pattern writing method

 #29
20190198290
2019-06-27

Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method

 #30
20190172678
2019-06-06

Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate

 #31
20190096632
2019-03-28

CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING ELECTRIFICATION OF SUBSTRATE

 #32
20190066976
2019-02-28

Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus

 #33
20190051494
2019-02-14

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #34
20190043693
2019-02-07

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #35
20190027340
2019-01-24

Charged particle beam writing apparatus and charged particle beam writing method

 #36
20180350552
2018-12-06

Multi charged particle beam drawing apparatus and multi charged particle beam drawing method

 #37
20180277334
2018-09-27

Aberration correction in charged particle system

 #38
20180261421
2018-09-13

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

 #39
20180144905
2018-05-24

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #40
20180138013
2018-05-17

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #41
20180138012
2018-05-17

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #42
20180114673
2018-04-26

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

 #43
20180108513
2018-04-19

Method and system for dimensional uniformity using charged particle beam lithography

 #44
20180090299
2018-03-29

Charged particle beam apparatus and positional displacement correcting method of charged particle beam

 #45
20180090298
2018-03-29

Electron beam apparatus and positional displacement correcting method of electron beam

 #46
20180040454
2018-02-08

Particle beam system and method for operating a particle optical unit

 #47
20180005799
2018-01-04

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #48
20170358426
2017-12-14

Exposure apparatus and exposure method

 #49
20170352520
2017-12-07

Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus

 #50
20170345612
2017-11-30

Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus

 #51
20170322485
2017-11-09

Method and system for forming a pattern on a reticle using charged particle beam lithography

 #52
20170287674
2017-10-05

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #53
20170243717
2017-08-24

Multi electron beam inspection apparatus

 #54
20170243714
2017-08-24

Diagnosis method, charged particle beam lithography apparatus, and recording medium

 #55
20170229280
2017-08-10

Multi charged particle beam writing apparatus and multi charged particle beam writing method

 #56
20170178862
2017-06-22

Multiple charged particle beam apparatus

 #57
20170124247
2017-05-04

Shaped beam lithography including temperature effects

 #58
20170103869
2017-04-13

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

 #59
20170098524
2017-04-06

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #60
20170076912
2017-03-16

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

 #61
20160365226
2016-12-15

Charged particle beam lithography method and charged particle beam lithography apparatus

 #62
20160314934
2016-10-27

Exposure apparatus and exposure method

 #63
20160284509
2016-09-29

Charged particle beam writing apparatus and method for calculating irradiation coefficient

 #64
20160260581
2016-09-08

Method and system for dimensional uniformity using charged particle beam lithography

 #65
20160259238
2016-09-08

Method and system for forming a pattern on a reticle using charged particle beam lithography

 #66
20160240344
2016-08-18

Charged particle inspection method and charged particle system

 #67
20160233054
2016-08-11

Self-aligned dynamic pattern generator device and method of fabrication

 #68
20160181050
2016-06-23

Integrated photoemission sources and scalable photoemission structures

 #69
20160172151
2016-06-16

Apparatus and methods for aberration correction in electron beam based system

 #70
20160155609
2016-06-02

Method for generating writing data

 #71
20160118221
2016-04-28

Lithography system and method of manufacturing articles

 #72
20160111251
2016-04-21

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #73
20160099129
2016-04-07

Blanking aperture array and charged particle beam writing apparatus

 #74
20160071696
2016-03-10

Beam grid layout

 #75
20160042908
2016-02-11

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #76
20150357157
2015-12-10

Particle beam system and method for operating a particle optical unit

 #77
20150303029
2015-10-22

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

 #78
20150179403
2015-06-25

Method and apparatus for transferring pixel data for electron beam lithography

 #79
20150179392
2015-06-25

Method and apparatus for electron beam lithography

 #80
20150155136
2015-06-04

Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus

 #81
20150136994
2015-05-21

Modulation device and power supply arrangement

 #82
20150102236
2015-04-16

Electron beam exposure apparatus and method of detecting error using the same

 #83
20150097126
2015-04-09

Alignment sensor and height sensor

 #84
20150076988
2015-03-19

Electron emitter device with integrated multi-pole electrode structure

 #85
20150028230
2015-01-29

Method for charged-particle multi-beam exposure

 #86
20150008331
2015-01-08

Charged particle inspection method and charged particle system

 #87
20140367588
2014-12-18

Method and system for E-beam lithography with multi-exposure

 #88
20140346369
2014-11-27

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

 #89
20140268076
2014-09-18

Self-aligned dynamic pattern generator device and method of fabrication

 #90
20140162466
2014-06-12

Method and system for forming a pattern on a reticle using charged particle beam lithography

 #91
20140158916
2014-06-12

Method and system for forming a pattern on a reticle using charged particle beam lithography

 #92
20140158902
2014-06-12

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #93
20140151570
2014-06-05

Charged particle beam lens and exposure apparatus using the same

 #94
20140124684
2014-05-08

Multi charged particle beam writing method and multi charged particle beam writing apparatus

 #95
20140061499
2014-03-06

Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table

 #96
20140038107
2014-02-06

Method and system for E-beam lithography with multi-exposure

 #97
20130320225
2013-12-05

Devices and methods for improved reflective electron beam lithography

 #98
20130293865
2013-11-07

Linear Stage for reflective electron beam lithography

 #99
20130168569
2013-07-04

Drawing apparatus, and method of manufacturing article

 #100
20130153782
2013-06-20

Multi-axis magnetic lens for focusing a plurality of charged particle beams

 #101
20130149646
2013-06-13

Charged particle beam writing apparatus and charged particle beam writing method

 #102
20130078577
2013-03-28

CHARGED PARTICLE BEAM DRAWING APPARATUS, DRAWING DATA GENERATION METHOD, DRAWING DATA GENERATION PROGRAM STORAGE MEDIUM, AND ARTICLE MANUFACTURING METHOD

 #103
20130043414
2013-02-21

System for magnetic shielding

 #104
20130020502
2013-01-24

Charged particle beam drawing apparatus and method of manufacturing article

 #105
20120328988
2012-12-27

Drawing apparatus, method of manufacturing article, and processing apparatus

 #106
20120312975
2012-12-13

ELECTRON BEAM EXPOSURE APPARATUS AND ELECTRON BEAM EXPOSURE METHOD

 #107
20120287410
2012-11-15

Data path for lithography apparatus

 #108
20120235063
2012-09-20

Systems and methods providing electron beam writing to a medium

 #109
20120228516
2012-09-13

Charged particle beam drawing apparatus and article manufacturing method using same

 #110
20120224155
2012-09-06

Direct write lithography system

 #111
20120204136
2012-08-09

Method and system for feature function aware priority printing

 #112
20120175527
2012-07-12

Lithography system and method of processing substrates in such a lithography system

 #113
20120164583
2012-06-28

Drawing apparatus and method of manufacturing article

 #114
20120145915
2012-06-14

Lithography system and method of refracting

 #115
20120115306
2012-05-10

DEFLECTOR ARRAY, CHARGED PARTICLE BEAM DRAWING APPARATUS, DEVICE MANUFACTURING METHOD, AND DEFLECTOR ARRAY MANUFACTURING METHOD

 #116
20120104252
2012-05-03

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #117
20110266418
2011-11-03

Charged particle multi-beamlet lithography system, modulation device, and method of manufacturing thereof

 #118
20110261340
2011-10-27

Modulation device and charged particle multi-beamlet lithography system using the same

 #119
20110260040
2011-10-27

Charged particle multi-beamlet lithography system with modulation device

 #120
20110180721
2011-07-28

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

 #121
20110165502
2011-07-07

Method and system for feature function aware priority printing

 #122
20100219357
2010-09-02

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

 #123
20100181479
2010-07-22

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #124
20090256075
2009-10-15

Charged Particle Inspection Method and Charged Particle System

 #125
20090212240
2009-08-27

Charged particle beam exposure system

 #126
20090200495
2009-08-13

Particle-beam exposure apparatus with overall-modulation of a patterned beam

 #127
20090114818
2009-05-07

Charged particle-optical systems, methods and components

 #128
20080169429
2008-07-17

Microelectronic multiple electron beam emitting device

 #129
20080142739
2008-06-19

Synchronous raster scanning lithographic system

 #130
20080128638
2008-06-05

Multi-beam modulator for a particle beam and use of the multi-beam modulator for the maskless structuring of a substrate

 #131
20080110745
2008-05-15

Method and device for ion beam processing of surfaces

 #132
20080073547
2008-03-27

Apparatus for generating a plurality of beamlets

 #133
20080054184
2008-03-06

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #134
20080049204
2008-02-28

Multi-column type electron beam exposure apparatus

 #135
20070235665
2007-10-11

Charged particle beam system and method for manufacturing and inspecting LCD devices

 #136
20070182303
2007-08-09

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

 #137
20070181828
2007-08-09

E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same

 #138
20070080647
2007-04-12

Hybrid multibeam electronic emission device with controlled divergence

 #139
20070029509
2007-02-08

Apparatus for generating a plurality of beamlets

 #140
20070029499
2007-02-08

Apparatus for generating a plurality of beamlets

 #141
20070023672
2007-02-01

Apparatus and method for controlling the beam current of a charged particle beam

 #142
20070018112
2007-01-25

Apparatus for generating a plurality of beamlets

 #143
20060289804
2006-12-28

Particle-optical systems and arrangements and particle-optical components for such systems and arrangements

 #144
20060289781
2006-12-28

Method and apparatus for applying charged particle beam

 #145
20060255286
2006-11-16

Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same

 #146
20060214105
2006-09-28

Micromachining process, system and product

 #147
20060183335
2006-08-17

Using an electron beam to write phase change memory devices

 #148
20060060789
2006-03-23

Focusing system and method for a charged particle imaging system

 #149
20060055321
2006-03-16

Hetero-junction electron emitter with Group III nitride and activated alkali halide

 #150
20060028114
2006-02-09

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

 #151
20060017019
2006-01-26

Charged particle beam exposure apparatus, charged particle beam exposure method and device manufacturing method

 #152
20060006342
2006-01-12

Mechanism for sealing

 #153
20050264148
2005-12-01

Multiple electron beam system with electron transmission gates

 #154
20050263713
2005-12-01

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus

 #155
20050253093
2005-11-17

Parallel multi-electron beam lithography for IC fabrication with precise X-Y translation

 #156
20050253082
2005-11-17

Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method

 #157
20050242303
2005-11-03

Advanced pattern definition for particle-beam exposure

 #158
20050242302
2005-11-03

Advanced pattern definition for particle-beam processing

 #159
20050224726
2005-10-13

Direct write lithography system

 #160
20050145835
2005-07-07

Manufacturing method for emitter for electron-beam projection lithography

 #161
20050087701
2005-04-28

Pattern-definition device for maskless particle-beam exposure apparatus

 #162
20050035300
2005-02-17

Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus

 #163
16422269
2020-08-18

Method and system for determining a charged particle beam exposure for a local pattern density

 #164
15469177
2018-07-10

Alignment and registration targets for charged particle beam substrate patterning and inspection

 #165
14607821
2015-12-08

Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems

 #166
14607799
2015-11-10

Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp

 #167
14542105
2017-07-25

Apparatus and methods for electron beam lithography using array cathode