H01J2237/3175 - CPC Classification Index

ClassID:

206638 ⎘

H01J2237/3175 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale Lithography

Sub-classes:

H01J2237/31752 » using particular beams or near-field effects, e.g. STM-like techniques 3
H01J2237/31761 » Patterning strategy 57
H01J2237/31769 » Proximity effect correction 91
H01J2237/31772 » Flood beam 1
H01J2237/31774 » Multi-beam 159
H01J2237/31776 » Shaped beam 154
H01J2237/31777 » by projection 14
H01J2237/31793 » Problems associated with lithography 47

Recent Application in this class:

20240061342

2024-02-22

Electron beam lithography with dynamic fin overlay correction

20230143407

2023-05-11

Exposure apparatus and exposure method, and device manufacturing method

20220121125

2022-04-21

Exposure apparatus and exposure method, and device manufacturing method

20210358713

2021-11-18

Fill pattern to enhance ebeam process margin

20210065335

2021-03-04

BLADE DEPLOYMENT MECHANISMS FOR SURGICAL FORCEPS

20210041789

2021-02-11

Exposure apparatus and exposure method, and device manufacturing method

20200006037

2020-01-02

Electron-beam lithography process adapted for a sample comprising at least one fragile nanostructure

20190346770

2019-11-14

Exposure apparatus and exposure method, and device manufacturing method

20190172185

2019-06-06

Blade deployment mechanisms for surgical forceps

#10

20190164723

2019-05-30

Fill pattern to enhance e-beam process margin

#11

20180136566

2018-05-17

Exposure apparatus and exposure method, and device manufacturing method

#12

20170221674

2017-08-03

Vacuum chamber arrangement for charged particle beam generator

#13

20170200582

2017-07-13

Charged particle beam writing apparatus and charged particle beam writing method

#14

20170097571

2017-04-06

Method of reducing shot count in direct writing by a particle or photon beam

#15

20170047199

2017-02-16

Scanning probe lithography methods utilizing an enclosed sinusoidal pattern

#16

20160343535

2016-11-24

Charged particle beam drawing apparatus and charged particle beam drawing method

#17

20160336147

2016-11-17

Multi-beam writing using inclined exposure stripes

#18

20160300687

2016-10-13

Charged particle beam writing apparatus and charged particle beam writing method

#19

20160284508

2016-09-29

Substrate alignment through detection of rotating timing pattern

#20

20160211118

2016-07-21

Method of generating write data for energy beam writing apparatus, method of writing with energy beam, and energy beam writing apparatus

#21

20160211117

2016-07-21

System and method for maskless direct write lithography

#22

20160172151

2016-06-16

Apparatus and methods for aberration correction in electron beam based system

#23

20160133438

2016-05-12

Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same

#24

20160071696

2016-03-10

Beam grid layout

#25

20160064179

2016-03-03

Blanking device for multi-beam of charged particle writing apparatus using multi-beam of charged particle and defective beam blocking method for multi-beam of charged particle

#26

20150371810

2015-12-24

Individually switched field emission arrays

#27

20150357158

2015-12-10

Method for pattern measurement, method for setting device parameters of charged particle radiation device, and charged particle radiation device

#28

20150340196

2015-11-26

Multi charged particle beam writing method, and multi charged particle beam writing apparatus

#29

20150294836

2015-10-15

Shot data generation method and multi charged particle beam writing method

#30

20150286147

2015-10-08

Exposure apparatus and exposure method, and device manufacturing method

#31

20150279617

2015-10-01

Charged particle beam drawing apparatus, information processing apparatus and pattern inspection apparatus

#32

20150221469

2015-08-06

Top opening-closing mechanism and inspection apparatus

#33

20150179403

2015-06-25

Method and apparatus for transferring pixel data for electron beam lithography

#34

20150155136

2015-06-04

Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus

#35

20140264086

2014-09-18

Charged particle lithography system

#36

20140264085

2014-09-18

Method for exposing a wafer

#37

20140264066

2014-09-18

Deflection scan speed adjustment during charged particle exposure

#38

20140038107

2014-02-06

Method and system for E-beam lithography with multi-exposure

#39

20130143161

2013-06-06

Charged particle beam apparatus

#40

20130134324

2013-05-30

Compact high-voltage electron gun

#41

20130020502

2013-01-24

Charged particle beam drawing apparatus and method of manufacturing article

#42

20120286170

2012-11-15

Dual pass scanning

#43

20120248340

2012-10-04

Charged particle beam writing apparatus and charged particle beam writing method

#44

20120153537

2012-06-21

Lithography system and lithography method

#45

20120145895

2012-06-14

Method of processing of an object

#46

20120141693

2012-06-07

Ion sources, systems and methods

#47

20120112323

2012-05-10

Apparatus and method for controlled particle beam manufacturing

#48

20120083827

2012-04-05

Blade deployment mechanisms for surgical forceps

#49

20120056100

2012-03-08

Charged particle beam lithography system and target positioning device

#50

20110204255

2011-08-25

Stage device

#51

20110180721

2011-07-28

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#52

20110053088

2011-03-03

ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD

#53

20110012617

2011-01-20

Methods and systems for testing digital-to-analog converter/amplifier circuits

#54

20100219357

2010-09-02

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#55

20100200766

2010-08-12

ELECTRON EMITTER HAVING NANO-STRUCTURE TIP AND ELECTRON COLUMN USING THE SAME

#56

20100193686

2010-08-05

Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus

#57

20100127170

2010-05-27

Electron beam control method, electron beam generating apparatus, apparatus using the same, and emitter

#58

20100098922

2010-04-22

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

#59

20100084566

2010-04-08

Electron Column Using A Magnetic Lens Layer Having Permanent Magnets

#60

20100044578

2010-02-25

Charged particle beam lithography system and target positioning device

#61

20100006756

2010-01-14

CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING CHARGED PARTICLE BEAM IMAGE

#62

20100002212

2010-01-07

SCANNING EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD

#63

20100001203

2010-01-07

Method of acquiring offset deflection amount for shaped beam and lithography apparatus

#64

20090206271

2009-08-20

FOCUSSING MASK

#65

20090180373

2009-07-16

Electron beam applying apparatus and drawing apparatus

#66

20090179161

2009-07-16

Ion sources, systems and methods

#67

20090160307

2009-06-25

DIAMOND ELECTRON SOURCE AND METHOD FOR MANUFACTURING THE SAME

#68

20080315089

2008-12-25

Electron gun, electron beam exposure apparatus, and exposure method

#69

20080224064

2008-09-18

Charged particle beam apparatus

#70

20080210866

2008-09-04

Motioning Equipment for Electron Column

#71

20080093562

2008-04-24

Beam recording method and device

#72

20080078933

2008-04-03

Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus

#73

20080061246

2008-03-13

Apparatus for blanking a charged particle beam

#74

20080054186

2008-03-06

Method of aberration correction and electron beam system

#75

20080054180

2008-03-06

APPARATUS AND METHOD OF DETECTING SECONDARY ELECTRONS

#76

20070284695

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#77

20070284538

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#78

20070284537

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#79

20070284527

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#80

20070278428

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#81

20070278419

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#82

20070278418

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#83

20070182303

2007-08-09

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#84

20070152150

2007-07-05

Charged particle beam apparatus

#85

20070111116

2007-05-17

Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same

#86

20070085003

2007-04-19

Electron beam applying apparatus and drawing apparatus

#87

20070080647

2007-04-12

Hybrid multibeam electronic emission device with controlled divergence

#88

20070075262

2007-04-05

Electrostatic deflection system with low aberrations and vertical beam incidence

#89

20070075258

2007-04-05

Electrostatic deflector

#90

20070069666

2007-03-29

Apparatus for processing an object with high position accurancy

#91

20070069148

2007-03-29

Beam blanker driver system and method

#92

20070045534

2007-03-01

Apparatus and method for controlled particle beam manufacturing

#93

20060289754

2006-12-28

Charged particle beam apparatus

#94

20060289753

2006-12-28

Charged particle beam apparatus

#95

20060244352

2006-11-02

Diamond electron emitter and electron beam source using same

#96

20060169928

2006-08-03

Radiantly heated cathode for an electron gun and heating assembly

#97

20060169926

2006-08-03

Electron beam lithography apparatus and lithography method

#98

20060155414

2006-07-13

Semiconductor manufacturing apparatus

#99

20060145585

2006-07-06

Electron gun

#100

20060102848

2006-05-18

Corrector for correcting first-order chromatic aberrations of the first degree

#101

20060097165

2006-05-11

Electron beam apparatus and method for manufacturing semiconductor device

#102

20060082755

2006-04-20

Stage system, exposure apparatus, and device manufacturing method

#103

20060082225

2006-04-20

Linear motor, moving stage system, exposure apparatus, and device manufacturing method

#104

20060076504

2006-04-13

Electron source, and charged-particle apparatus comprising such an electron source

#105

20060060259

2006-03-23

Moving vacuum chamber stage with air bearing and differentially pumped grooves

#106

20060056131

2006-03-16

Charged particle beam application system

#107

20060038139

2006-02-23

Trigger probe for determining the orientation of the power distribution of an electron beam

#108

20060028114

2006-02-09

System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission

#109

20060001350

2006-01-05

Field emission electron gun and electron beam apparatus using the same

#110

20050270857

2005-12-08

Semiconductor manufacturing apparatus

#111

20050266322

2005-12-01

Electron beam lens for micro-column electron beam apparatus and method of fabricating the same

#112

20050263712

2005-12-01

Electron beam lens for micro-column electron beam apparatus and method of fabricating the same

#113

20050253082

2005-11-17

Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method

#114

20050242295

2005-11-03

Apertured plate support mechanism and charged-particle beam instrument equipped therewith

#115

20050242286

2005-11-03

Electron beam apparatus and method with surface height calculator and a dual projection optical unit

#116

20050211681

2005-09-29

Charged-particle beam system

#117

20050208395

2005-09-22

Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same

#118

20050199827

2005-09-15

Charged particle beam apparatus, charged particle beam control method, substrate inspection method and method of manufacturing semiconductor device

#119

20050178966

2005-08-18

Light weight portable scanning electron microscope

#120

20050151284

2005-07-14

Pattern drawing method, method of manufacturing a master disk for manufacturing information recording media, and method of manufacturing an information recording medium

#121