206653 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Processing objects on a microscale; Lithography Shaped beam
Apparatus and Method for Writing a Moveable Target in a Multi-Column Exposure Apparatus
#2MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND STORAGE MEDIUM
#3MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING PROGRAM THEREIN
#4MULTI-ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTI-ELECTRON BEAM IMAGE ACQUISITION METHOD
#5DATA GENERATION APPARATUS, DATA GENERATION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM
#6ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD
#7Method and system for determining a charged particle beam exposure for a local pattern density
#8CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#9APPARATUS FOR ANALYZING AND/OR PROCESSING A SAMPLE WITH A PARTICLE BEAM AND METHOD
#10METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY
#11SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME
#12Semiconductor device, multi-charged-particle beam writing apparatus, and multi-charged-particle beam exposure apparatus
#13Method and system for determining a charged particle beam exposure for a local pattern density
#14Semiconductor apparatus and method of operating the same
#15Method and system for determining a charged particle beam exposure for a local pattern density
#16Adapting the duration of exposure slots in multi-beam writers
#17Multi charged particle beam writing apparatus and multi charged particle beam writing method
#18Method of pattern data preparation and method of forming pattern in layer
#19Measurement and inspection device
#20Method for projecting a beam of particles onto a substrate with correction of scattering effects
#21Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate
#22Drawing apparatus and control method thereof
#23Charged particle beam writing apparatus and charged particle beam writing method
#24Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#25CHARGED PARTICLE BEAM IRRADIATION APPARATUS AND METHOD FOR REDUCING ELECTRIFICATION OF SUBSTRATE
#26Multi charged particle beam writing apparatus and multi charged particle beam writing method
#27Micro-electro-mechanical-systems processing method, and micro-electro-mechanical-systems processing apparatus
#28Charged particle beam writing apparatus and charged particle beam writing method
#29Calibration of elementary small patterns in variable-shaped-beam electron-beam lithography
#30METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#31Data processing method, charged particle beam writing apparatus, and charged particle beam writing system
#32Charged particle beam writing method and charged particle beam writing apparatus
#33Charged particle beam lithography apparatus and charged particle beam lithography method
#34Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#35Method and system for dimensional uniformity using charged particle beam lithography
#36Charged particle beam apparatus and positional displacement correcting method of charged particle beam
#37Electron beam apparatus and positional displacement correcting method of electron beam
#38Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
#39Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#40Charged particle beam writing apparatus and charged particle beam writing method
#41Systems and methods for rapidly fabricating nanopatterns in a parallel fashion over large areas
#42Multi charged-particle beam writing apparatus and adjustment method for the same
#43Method and system for forming a pattern on a reticle using charged particle beam lithography
#44Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage
#45Drawing data generating method
#46Ebeam non-universal cutter
#47Charged particle beam lithography apparatus and charged particle beam lithography method
#48Charged particle beam lithography method and charged particle beam lithography apparatus
#49Method for evaluating charged particle beam drawing apparatus
#50Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#51Charged particle beam drawing apparatus and drawing data generation method
#52Method and system for dimensional uniformity using charged particle beam lithography
#53Method and system for forming a pattern on a reticle using charged particle beam lithography
#54Free form fracturing method for electronic or optical lithography using resist threshold control
#55Charged particle beam writing apparatus, charged particle beam writing method, and shot correction method of charged particle beam writing method
#56Method for correcting drift of accelerating voltage, method for correcting drift of charged particle beam, and charged particle beam writing apparatus
#57Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#58Electron gun supporting member and electron gun apparatus
#59Patterning method using electron beam and exposure system configured to perform the same
#60Apparatus and method for calculating drawing speeds of a charged particle beam
#61Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#62Charged particle beam writing apparatus and charged particle beam writing method
#63Method for correcting drift of charged particle beam, and charged particle beam writing apparatus
#64Method and system for forming patterns with charged particle beam lithography
#65Electron beam exposure method
#66Multi charged particle beam writing apparatus and multi charged particle beam writing method
#67Free form fracturing method for electronic or optical lithography
#68Electron beam exposure apparatus and method of detecting error using the same
#69Charged particle beam writing apparatus, and charged particle beam writing method
#70Charged particle beam writing apparatus and method utilizing a sum of the weighted area density of each figure pattern
#71Charged particle beam writing apparatus and method for acquiring dose modulation coefficient of charged particle beam
#72Free form fracturing method for electronic or optical lithography
#73Method and system for forming patterns with charged particle beam lithography
#74Exposure apparatus for forming a reticle
#75Charged particle beam writing apparatus, method of adjusting beam incident angle to target object surface, and charged particle beam writing method
#76Method and system for forming a pattern on a reticle using charged particle beam lithography
#77Method and system for forming a pattern on a reticle using charged particle beam lithography
#78Method and system for improving critical dimension uniformity using shaped beam lithography
#79Electron beam exposure method
#80Charged particle beam lithography apparatus and charged particle beam pattern writing method
#81Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
#82Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
#83Charged particle beam writing apparatus and charged particle beam writing method
#84Charged particle beam writing apparatus and charged particle beam writing method
#85Method and system for forming high precision patterns using charged particle beam lithography
#86Large-mesh cell-projection electron-beam lithography method
#87Charged-particle beam drawing method, computer-readable recording media, and charged-particle beam drawing apparatus
#88Charged particle beam writing apparatus and charged particle beam writing method
#89Charged particle beam writing apparatus and charged particle beam writing method
#90Method and System for Optimization of an Image on a Substrate to be Manufactured Using Optical Lithography
#91Exposure apparatus for forming a reticle and method of forming a reticle using the same
#92Method and system for charged particle beam lithography
#93CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF
#94Method for generating wiring pattern data
#95Method and system for forming patterns with charged particle beam lithography
#96Charged particle beam writing apparatus
#97Charged particle beam writing apparatus and charged particle beam writing method using a generated frame that surrounds a first data processing block
#98Exposure systems for integrated circuit fabrication
#99Methods of forming a photolithography reticle
#100CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#101Method and system for fracturing a pattern using lithography with multiple exposure passes
#102METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY
#103Charged particle beam writing apparatus and charged particle beam writing method
#104METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING CHARGED PARTICLE BEAM LITHOGRAPHY
#105METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY
#106METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#107METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH OVERLAPPING SHOTS
#108Charged particle beam writing apparatus and charged particle beam writing method
#109Charged particle beam writing apparatus and charged particle beam writing method
#110Charged particle beam writing apparatus and charged particle beam writing method
#111Pattern forming method
#112Charged particle beam writing apparatus and charged particle beam writing method
#113Charged particle beam writing apparatus and charged particle beam writing method
#114Method for manufacturing semiconductor device by correcting overlapping shots based on a radiation influenced pattern
#115Charged particle beam pattern forming apparatus and charged particle beam pattern forming method
#116Charged particle beam drawing apparatus and control method thereof
#117Charged particle beam writing apparatus, write data creation method and charged particle beam writing method
#118Pattern writing system and method and abnormality diagnosing method
#119Charged particle beam writing apparatus and charged particle beam writing method
#120Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
#121Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
#122Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
#123CHARGED PARTICLE BEAM DRAWING APPARATUS AND ELECTRICAL CHARGING EFFECT CORRECTION METHOD THEREOF
#124Charged particle beam drawing apparatus and proximity effect correction method thereof
#125Charged particle beam writing apparatus and method thereof
#126Write error verification method of writing apparatus and creation apparatus of write error verification data for writing apparatus
#127Pattern forming method
#128Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same
#129Charged particle beam exposure method and charged particle beam exposure device
#130Method of forming pattern writing data by using charged particle beam
#131Electron-beam exposure system
#132Method of calculating deflection aberration correcting voltage and charged particle beam writing method
#133Position measuring apparatus and positional deviation measuring method
#134Writing a circuit design pattern with shaped particle beam flashes
#135Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam
#136Electron beam writing apparatus and writing method
#137Method and apparatus for applying charged particle beam
#138Raster frame beam system for electron beam lithography
#139Raster frame beam system for electron beam lithography
#140Electron beam irradiating apparatus and irradiating method
#141Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method
#142Focusing apparatus and lithography system using the same
#143Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems
#144Electron beam control method, electron beam drawing apparatus and method of fabricating a semiconductor device
#145Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method
#146Variably shaped beam EB writing system
#147Electron-beam drawing apparatus and electron-beam drawing method
#148Method of generation of charged particle beam exposure data and charged particle beam exposure method using a block mask
#149Charged particle beam exposure method and charged particle beam exposure device
#150Raster frame beam system for electron beam lithography
#151Optical disc and apparatus for manufacturing a master disc therefor
#152Charged beam writing apparatus and writing method
#153Charged beam exposure apparatus having blanking aperture and basic figure aperture
#154Charged beam writing method and writing tool
#155Charged-particle beam lithographic system
#156Pattern-definition device for maskless particle-beam exposure apparatus
#157Photo mask, method of manufacturing photo mask, and method of generating mask data
#158Method and system for determining a charged particle beam exposure for a local pattern density