SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

SYSTEM FOR TARGET ARCING MAPPING AND PLASMA DIAGNOSIS

Scanning Magnetron Device and Magnetron Sputtering Apparatus for PVD Planar Target

SPUTTERING APPARATUS, APPARATUS FOR MANUFACTURING MAGNETIC RECORDING MEDIUM, THIN FILM FORMING METHOD, AND METHOD FOR MANUFACTURING MAGNETIC RECORDING MEDIUM

METHOD AND APPARATUS FOR METAL AND CERAMIC NANOLAYERING FOR ACCIDENT TOLERANT NUCLEAR FUEL, PARTICLE ACCELERATORS, AND AEROSPACE LEADING EDGES

Tubular Sputter Cathode

ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELD

SYSTEM AND METHOD FOR MEASURING MAGNETIC FIELDS IN PVD SYSTEM

SEMICONDUCTOR PROCESSING TOOL AND METHODS OF OPERATION

SPUTTERING APPARATUS

SPUTTERING APPARATUS

DEPOSITION SYSTEM AND METHOD

METHODS OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING CHAMBERS

FILM FORMING APPARATUS AND FILM FORMING METHOD

Magnetron design for improved bottom coverage and uniformity

PHYSICAL VAPOR DEPOSITION SOURCE AND CHAMBER ASSEMBLY

FILM FORMATION METHOD AND FILM FORMATION DEVICE

Sputtering apparatus

PLASMA PROCESS APPARATUS

BIAS MAGNETIC FIELD CONTROL METHOD, CONTROL DEVICE, AND SEMICONDUCTOR PROCESS EQUIPMENT

FILM FORMATION METHOD AND FILM FORMATION APPARATUS

SYSTEM AND METHODS FOR DEPOSITING MATERIAL ON A SUBSTRATE

Sputtering apparatus for coating of 3D-objects

FILM FORMING APPARATUS AND METHOD OF CONTROLLING FILM FORMING APPARATUS

Vacuum deposition into trenches and vias

SYSTEM AND METHOD FOR MEASURING MAGNETIC FIELDS IN PVD SYSTEM

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

Deposition system and method

Plasma processing apparatus

Physical vapor deposition apparatus and method thereof

Cathode unit for magnetron sputtering apparatus and magnetron sputtering apparatus

Semiconductor processing apparatus and magnetron mechanism

Magnet system, sputtering device and housing cover

Tilted PVD source with rotating pedestal

APPARATUS AND PROCESS WITH A DC-PULSED CATHODE ARRAY

Physical vapor deposition process apparatus and method of optimizing thickness of a target material film deposited using the same

SPUTTERING DEVICE

Semiconductor apparatus and magnetic structure of semiconductor apparatus

Movable magnet array for magnetron sputtering

Sputtering apparatus

Method for particle removal from wafers through plasma modification in pulsed PVD

FILM FORMING APPARATUS, PROCESSING CONDITION DETERMINATION METHOD, AND FILM FORMING METHOD

Methods and apparatus for processing a substrate

Methods and apparatus for processing a substrate

Physical vapor deposition apparatus and method thereof

EM SOURCE FOR ENHANCED PLASMA CONTROL

FILM DEPOSITION APPARATUS, SPUTTERING TARGET, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE

APPARATUS FOR PERFORMING SPUTTERING PROCESS AND METHOD THEREOF

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Film forming apparatus and film forming method

Methods and apparatus for zone control of RF bias for stress uniformity

METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS ON INSULATOR SURFACES

Magnetron sputtering apparatus and magnetron sputtering method

Device for sputtering

Deposition system and method

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Methods and apparatus for extended chamber for through silicon via deposition

Method and system for adjustable coating using magnetron sputtering systems

ROTARY MAGNETRON SPUTTERING WITH INDIVIDUALLY ADJUSTABLE MAGNETIC FIELD

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

Multi-radius magnetron for physical vapor deposition (PVD) and methods of use thereof

Method of coating a substrate and coating apparatus for coating a substrate

Tilted magnetron in a PVD sputtering deposition chamber

Magnetically Enhanced High Density Plasma-Chemical Vapor Deposition Plasma Source For Depositing Diamond and Diamond-Like Films

Substrate processing method and apparatus

Cathode unit and film forming apparatus

Magnet unit for magnetron sputtering apparatus

Machine for the deposition of material by the cathodic sputtering technique

MAGNETRON SPUTTERING APPARATUS AND CATHODE DEVICE THEREOF

Sputtering a layer on a substrate using a high-energy density plasma magnetron

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES

Methods and apparatus for depositing aluminum by physical vapor deposition (PVD)

Depositing apparatus

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

Method and apparatus for metal and ceramic nanolayering for accident tolerant nuclear fuel, particle accelerators, and aerospace leading edges

Method for particle removal from wafers through plasma modification in pulsed PVD

Interchangeable magnet pack

Magnetron drive mechanism, magnetron assembly and reaction chamber

Apparatus and methods for depositing durable optical coatings

Modifiable magnet configuration for arc vaporization sources

Physical vapor deposition apparatus and method thereof

Apparatus and a method of controlling thickness variation in a material layer formed using physical vapour deposition

Sputtering apparatus and method of forming film

Film forming apparatus and film forming method using the same

A UNIVERSALLY MOUNTABLE END-BLOCK

PVD REACTOR WITH MAGNETIC ROTATION MECHANISM

Electrically and magnetically enhanced ionized physical vapor deposition unbalanced sputtering source

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Film forming system and method for forming film on substrate

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

Magnetron having enhanced target cooling configuration

Method of coating a substrate and coating apparatus for coating a substrate

Magnetic force release for sputtering sources with magnetic target materials

Processing apparatus and collimator

Cathode assembly having a dual position magnetron and centrally fed coolant

Film-forming apparatus and film-forming method

Flexible adjustable return path magnet assembly and methods

METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS ON INSULATOR SURFACES

Magnetron sputtering device, magnetron sputtering apparatus and magnetron sputtering method

Semiconductor manufacturing apparatus

Physical vapor deposition method using backside gas cooling of workpieces

Magnetically enhanced high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond-like films

Magnetron Sputtering Apparatus

Connector piece for a tubular target

Nanoparticle Deposition Systems

Rotary cathode unit for magnetron sputtering apparatus

Physical vapor deposition (PVD) plasma energy control per dynamic magnetron control

Adjustable return path magnet assembly and methods

Laterally adjustable return path magnet assembly and methods

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

Method of sputtering and sputter system

Capacitive coupled plasma source for sputtering and resputtering

Electrically and Magnetically Enhanced Ionized Physical Vapor Deposition Unbalanced Sputtering Source

Magnetically enhanced low temperature-high density plasma-chemical vapor deposition plasma source for depositing diamond and diamond like films

SPUTTERING DEVICE AND METHOD OF FORMING THIN FILM USING THE SAME

Physical vapor deposition system using rotating pallet with X and Y positioning

Physical vapor deposition system using backside gas cooling of workpieces

Physical vapor deposition system with target magnets controlled to only be above workpiece

MAGNETRON SPUTTERING DEVICE AND METHOD USING THE SAME

High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process

Sputter System for Uniform Sputtering

HIGH POWER PULSE IONIZED PHYSICAL VAPOR DEPOSITION

LINEAR SCANNING SPUTTERING SYSTEM AND METHOD

Sputter deposition source, apparatus for sputter deposition and method of assembling thereof

Sputtering apparatus

Multi-Magnetron Arrangement

SPUTTERING APPARATUS

Magnetron sputtering apparatus

METHOD FOR SPUTTERING SYSTEM AND USING COUNTERWEIGHT

Interchangeable magnet pack

MOVING MAGNET ASSEMBLY TO INCREASE THE UTILITY OF A RECTANGULAR MAGNETRON SPUTTERING TARGET

SPUTTERING SYSTEM AND METHOD FOR HIGHLY MAGNETIC MATERIALS

Sputtering method using sputtering device

Sputtering apparatus

Magnetron assembly for physical vapor deposition chamber

SPUTTERING APPARATUS

Online adjustable magnet bar

Method of HIPIMS sputtering and HIPIMS sputter system

Physical vapor deposition methods and systems to form semiconductor films using counterbalance magnetic field generators

Rotation plus vibration magnet for magnetron sputtering apparatus

SPUTTERING SYSTEM AND METHOD FOR HIGHLY MAGNETIC MATERIALS

Plasma apparatus, magnetic-field controlling method, and semiconductor manufacturing method

UNIFORM FORCE FLANGE CLAMP

MAGNETRON SPUTTERING APPARATUS

Film deposition device

MAGNETRON SPUTTERING DEVICE, MAGNETRON SPUTTERING METHOD, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM

FILM FORMING APPARATUS

Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes

PVD plasma control using a magnet edge lift mechanism

Magnetic field generation apparatus and sputtering apparatus

SYSTEMS FOR FORMING PHOTOVOLTAIC CELLS ON FLEXIBLE SUBSTRATES

Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device

SPUTTERING SYSTEM AND METHOD USING COUNTERWEIGHT

Sputtering system and method using direction-dependent scan speed or power

Apparatus and arrangements of magnetic field generators to facilitate physical vapor deposition to form semiconductor films

Sputtering devices and methods

Sputter source for use in a semiconductor process chamber

Configurable variable position closed track magnetron

Sputtering apparatus

Sputtering apparatus

Cylindrical evaporation source

Variable radius dual magnetron

PVD RF DC open/closed loop selectable magnetron

Adjustable shunt assembly for a sputtering magnetron and a method for adjusting such a shunt

APPARATUS AND METHODS FOR PHYSICAL VAPOR DEPOSITION

Thin film forming apparatus and thin film forming method

Magnet module having epicyclic gearing system and method of use

Sputtering apparatus

Magnetron source, magnetron sputtering apparatus and magnetron sputtering method

Rotation plus vibration magnet for magnetron sputtering apparatus

Magnetron sputtering apparatus and film forming method

Interchangeable magnet pack

LINEAR SCANNING SPUTTERING SYSTEM AND METHOD

Sputtering method using sputtering device

MAGNETRON SPUTTERING APPARATUS AND METHOD

ROTARY CATHODES FOR MAGNETRON SPUTTERING SYSTEM

Arc PVD plasma source and method of deposition of nanoimplanted coatings

SPUTTER GUN

Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source

METHOD FOR COATING A SUBSTRATE AND COATER

SPUTTERING DEVICE AND SPUTTERING METHOD

SPUTTERING APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD

Sputtering magnetron assembly

Production of Nanoparticles

Nanoparticle Deposition Systems

PVD PROCESS WITH SYNCHRONIZED PROCESS PARAMETERS AND MAGNET POSITION

Sputtering apparatus

MAGNETRON ARRANGEMENT WITH A HOLLOW TARGET

Homing of arbitrary scan path of a rotating magnetron

Magnet mounting system and magnetron sputtering device having same

Magnet transportation system, sputtering apparatus including the same and sputtering method

MAGNET FOR PHYSICAL VAPOR DEPOSITION PROCESSES TO PRODUCE THIN FILMS HAVING LOW RESISTIVITY AND NON-UNIFORMITY

Triangular Scanning Magnet in Sputtering Tool Moving Over Larger Triangular Target

Deposition apparatus and methods to reduce deposition asymmetry

Modifiable magnet configuration for arc vaporization sources

Homing device for magnetron rotating on two arms

Magnetic field control for uniform film thickness distribution in sputter apparatus

Physical vapor deposition chamber with rotating magnet assembly and centrally fed RF power

Deposition system and methods having improved material utilization

METHODS AND APPARATUS FOR MAGNETRON METALLIZATION FOR SEMICONDUCTOR FABRICATION

Sputtering apparatus, sputtering method, and electronic device manufacturing method

Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor

Magnetron source and method of manufacturing

INDEXING MAGNET ASSEMBLY FOR ROTARY SPUTTERING CATHODE

STRUCTURE FOR INCREASING UTILIZATION RATE OF TARGET

Magnetic field generating apparatus and plasma processing apparatus

METHOD FOR COATING A SUBSTRATE AND COATER

MAGNETRON SPUTTERING DEVICE

MAGNETRON SPUTTERING TARGET ASSEMBLY AND COATING APPARATUS HAVING SAME

Magnetic device and magnetron sputtering device using the same

Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities

MAGNETRON ASSEMBLY

Rotary magnet sputtering apparatus

High Power Pulse Ionized Physical Vapor Deposition

SPUTTERING FILM FORMING METHOD AND SPUTTERING FILM FORMING APPARATUS

High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches

MAGNETRON SPUTTERING TARGET AND MAGNETRON SPUTTERING SYSTEM

HIGH PRESSURE RF-DC SPUTTERING AND METHODS TO IMPROVE FILM UNIFORMITY AND STEP-COVERAGE OF THIS PROCESS

Mechanism for continuously varying radial position of a magnetron

Magnet target and magnetron sputtering apparatus having the same

FILM FORMATION APPARATUS

SPUTTERING APPARATUS

Method of forming thin film and apparatus for forming thin film

Film forming method by sputtering and sputtering apparatus thereof

MAGNETRON SPUTTERING APPARATUS

Magnetron sputtering apparatus

Physical vapor deposition reactor with circularly symmetric RF feed and DC feed to the sputter target

SPUTTERING METHOD AND SPUTTERING APPARATUS

Magnetron sputtering apparatus

Magnetron sputtering electrode, and sputtering apparatus provided with magnetron sputtering electrode

Sputtering target including magnetic field uniformity enhancing sputtering target backing tube

SPUTTERING APPARATUS, SPUTTERING METHOD AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM

Trim magnets to adjust erosion rate of cylindrical sputter targets

Drive end-block for a rotatable magnetron

DEPOSITION SYSTEM HAVING IMPROVED MATERIAL UTILIZATION

Magnetron unit moving apparatus for preventing magnetization and magnetron sputtering equipment having the same

Sputtering method and apparatus

MAGNETIC FIELD GENERATING APPARATUS, MAGNETIC FIELD GENERATING METHOD, SPUTTERING APPARATUS, AND METHOD OF MANUFACTURING DEVICE

ADJUSTABLE MAGNET PACK FOR SEMICONDUCTOR WAFER PROCESSING

MAGNETRON SPUTTERING TARGET STRUCTURE AND APPARATUS HAVING THE SAME

Magnetron unit, magnetron sputtering apparatus, and method of manufacturing electronic device

Sputtering cathode, sputtering apparatus provided with sputtering cathode, film-forming method, and method for manufacturing electronic device

Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement

HIGH POWER IMPULSE MAGNETRON SPUTTERING VAPOUR DEPOSITION

MAGNETRON SPUTTERING MAGNET ASSEMBLY, MAGNETRON SPUTTERING DEVICE, AND MAGNETRON SPUTTERING METHOD

SPUTTER COATING DEVICE

Method of magnetron sputtering and a method for determining a power modulation compensation function for a power supply applied to a magnetron sputtering source

Sputtering devices and methods

Control of arbitrary scan path of a rotating magnetron

Coating apparatus

MAGNET CHOIR DESIGN FOR TARGET MATERIAL EROSION

SPUTTER COATING DEVICE AND COATING METHOD

CHALCOGENIDE TARGET AND METHOD

BIAS SPUTTERING FILM FORMING PROCESS AND BIAS SPUTTERING FILM FORMING APPARATUS

MAGNET ASSEMBLY CAPABLE OF GENERATING MAGNETIC FIELD HAVING DIRECTION THAT IS UNIFORM AND CAN BE CHANGED AND SPUTTERING APPARATUS USING THE SAME

Sputtering system

MAGNETRON SPUTTERING APPARATUS AND MANUFACTURING METHOD FOR STRUCTURE OF THIN FILM

SWINGING MAGNETS TO IMPROVE TARGET UTILIZATION

SPUTTER CATHODE ASSEMBLY AND SPUTTER COATING DEVICE

METHOD AND APPARATUS FOR MANUFACTURING A SUBSTRATE WITH A MAGNETRON SPUTTER COATING

RESPUTTERED COPPER SEED LAYER

DESIGN SUPPORTING METHOD, SYSTEM, AND PROGRAM OF MAGNETRON SPUTTERING APPARATUS

Magnetron Sputtering Source, Sputter-Coating Installation, and Method for Coating a Substrate

Magnetron sputtering apparatus and method of manufacturing semiconductor device

MAGNETRON SPUTTERING APPARATUS

Self-ionized and capacitively-coupled plasma for sputtering and resputtering

PHYSICAL VAPOR DEPOSITION CHAMBER HAVING AN ADJUSTABLE TARGET

Position controlled dual magnetron

Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum

Coaxial shafts for radial positioning of rotating magnetron

Ganged scanning of multiple magnetrons, especially two level folded magnetrons

MAGNETRON ASSEMBLY

COOLED ANODES

Magnetron cathode and sputtering device installing it

ROTARY VACUUM FEEDTHROUGH FOR ROTATABLE MAGNETRONS

Partially suspended rolling magnetron

Sputter target utilization

METHOD OF MANUFACTURING AT LEAST ONE SPUTTER-COATED SUBSTRATE AND SPUTTER SOURCE

Method and apparatus for improving symmetry of a layer deposited on a semiconductor substrate

Flexible magnetron including partial rolling support and centering pins

Sputtering apparatus

Sputtering method and sputtering device

Small scanned magentron

Controlled multi-step magnetron sputtering process

Protective offset sputtering

Protective offset sputtering

CATHODE INCORPORATING FIXED OR ROTATING TARGET IN COMBINATION WITH A MOVING MAGNET ASSEMBLY AND APPLICATIONS THEREOF

Method for the production of a substrate

Sputtering device

Apparatus and method of positioning a multizone magnetron assembly

Multizone magnetron assembly

Single-process-chamber deposition system

Method and apparatus for sputtering onto large flat panels

Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities

Method for operating a sputter cathode with a target

Sputtering devices and methods

Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilities

Reduced maintenance sputtering chambers