207003 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning; Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a delineation, e.g. RIE, of conductive layers
Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean
#302APPARATUS FOR REMOVING A HALOGEN-CONTAINING RESIDUE
#303SINGLE-WAFER CLEANING PROCEDURE
#304Method for removing a halogen-containing residue
#305Microelectronic cleaning compositions containing ammonia-free fluoride salts for selective photoresist stripping and plasma ash residue cleaning
#306Method to manipulate post metal etch/side wall residue
#307Manufacturing method of semiconductor device using etching solution
#308Cleaning compositions and methods of use thereof
#309Cleaning apparatus and high pressure cleaner for use therein
#310Method for removing metal foot during high-k dielectric/metal gate etching
#311pH buffered aqueous cleaning composition and method for removing photoresist residue
#312Process for removing material from substrates
#313Aqueous solution for removing post-etch residue
#314Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor
#315SEMICONDUCTOR PROCESS AND METHOD FOR REMOVING CONDENSED GASEOUS ETCHANT RESIDUES ON WAFER
#316Method for removing a passivation layer prior to depositing a barrier layer in a copper metallization layer
#317Method of manufacturing semiconductor device
#318PURGE PROCESS AFTER DRY ETCHING
#319Aqueous cleaning composition and method for using same
#320System and method of cleaning substrates using a subambient process solution
#321Stripper
#322Semiconductor device fabrication method
#323Composition for cleaning substrates and method of forming gate using the composition
#324Process for producing semiconductor integrated circuit device
#325Photoresist stripping solution and a method of stripping photoresists using the same
#326Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
#327Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor
#328Technique for efficiently patterning an underbump metallization layer using a dry etch process
#329METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#330Uniform, far-field megasonic cleaning method and apparatus
#331Cleaning composition and related methods
#332Method for removing material from semiconductor wafer and apparatus for performing the same
#333Removing agent composition and removing/cleaning method using same
#334Compositions containing free radical quenchers
#335Methods of Forming Corrosion-Inhibiting Cleaning Compositions for Metal Layers and Patterns on Semiconductor Substrates
#336Semiconductor device and method of manufacturing the same
#337Method for forming metal line of semiconductor device
#338Methods of fabricating integrated circuitry
#339Method to chemically remove metal impurities from polycide gate sidewalls
#340Method to chemically remove metal impurities from polycide gate sidewalls
#341Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
#342Etching residue removal method and semiconductor device fabrication method using this method
#343Treatment of substrate using functionalizing agent in supercritical carbon dioxide
#344Polymer remover
#345Composition for cleaning semiconductor device and method for cleaning semiconductor device using the same
#346Cleaning solution and method of forming a metal pattern for a semiconductor device using the same
#347Removal of copper oxides from integrated interconnects
#348Atmospheric transfer chamber, processed object transfer method, program for performing the transfer method, and storage medium storing the program
#349Compositions substrate for removing etching residue and use thereof
#350Method to remove resist, etch residue, and copper oxide from substrates having copper and low-k dielectric material
#351Plasma processing method and post-processing method
#352Selective surface exposure, cleans and conditioning of the germanium film in a Ge photodetector
#353Semiconductor cleaning using superacids
#354System and method for removal of materials from an article
#355Method of cleaning wafer and method of manufacturing gate structure
#356Remover solution
#357Stripping and cleaning compositions for microelectronics
#358Method of manufacturing a semiconductor device and an apparatus for use in such a method
#359Systems and methods for single integrated substrate cleaning and rinsing
#360Method of manufacturing a semiconductor device
#361Device and method of performing a seasoning process for a semiconductor device manufacturing apparatus
#362Removing solution
#363SINGLE-WAFER CLEANING PROCEDURE
#364Method for controlling corrosion of a substrate
#365Passivating metal etch structures
#366Ferroelectric capacitor stack etch cleaning methods
#367Method of removing etch residues
#368System and method for reducing metal oxides with hydrogen radicals
#369Etching composition and use thereof with feedback control of HF in BEOL clean
#370Method for manufacturing electronic device
#371Compositions and processes for photoresist stripping and residue removal in wafer level packaging
#372Method for forming capacitor of semiconductor device
#373Process for removing a residue from a metal structure on a semiconductor substrate
#374Apparatus for treating a substrate with an ozone-solvent solution
#375Compositions for removal of processing byproducts and method for using same
#376Compositions and processes for photoresist stripping and residue removal in wafer level packaging
#377Cleaning solution and method for cleaning semiconductor device by using the same
#378Composition for the removing of sidewall residues
#379Copper processing using an ozone-solvent solution
#380Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal
#381Method for using a water vapor treatment to reduce surface charge after metal etching
#382Apparatus for the optimization of atmospheric plasma in a processing system
#383Etchant composition and the use thereof
#384Tungsten plug corrosion prevention method using gas sparged water
#385Composition for removing a photoresist residue and polymer residue, and residue removal process using same
#386Cleaning submicron structures on a semiconductor wafer surface
#387Encapsulation of post-etch halogenic residue
#388Methods of processing substrates during semiconductor manufacturing processes
#389Cluster tool and method for process integration in manufacture of a gate structure of a field effect transistor
#390Method for preventing a metal corrosion in a semiconductor device
#391Composition for removing photoresist and/or etching residue from a substrate and use thereof
#392Composition for stripping and cleaning and use thereof
#393Method of manufacturing a semiconductor device using a cleaning composition
#394Method for finishing metal line for semiconductor device
#395Method of manufacturing semiconductor integrated circuit device having polymetal gate electrode
#396Method for manufacturing semiconductor device
#397Semiconductor device and fabrication method thereof
#398Forming a passivating aluminum fluoride layer and removing same for use in semiconductor manufacture
#399Manufacturing method of semiconductor device and semiconductor manufacturing apparatus
#400Method of manufacturing electronic device
#401Semiconductor device having silicon carbide and conductive pathway interface
#402Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates
#403Method for manufacturing semiconductor device
#404Microelectronic cleaning compositions containing oxidizers and organic solvents
#405Deposit removing apparatus and deposit removing method
#406Method for manufacturing a semiconductor device having a W/WN/polysilicon layered film
#407Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition
#408Aqueous stripping and cleaning composition
#409Methods using a peroxide-generating compound to remove group VIII metal-containing residue
#410Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#411Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates
#412Photoresist residue remover composition and semiconductor circuit element production process employing the same
#413Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device
#414Compositions for cleaning organic and plasma etched residues for semiconductor devices
#415Method for ashing
#416Method of manufacturing a semiconductor device
#417Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates
#418Cleaning composition and method of cleaning a semiconductor device using the same
#419Plasma etch reactor and method
#420Method of manufacturing a semiconductor device using a wet process
#421Composition for cleaning semiconductor device
#422Cleaning solutions and etchants and methods for using same
#423Cleaning solution and method of cleaning a semiconductor device using the same
#424Wet cleaning method to eliminate copper corrosion
#425Method to remove fluorine residue from bond pads
#426Method for reducing corrosion of metal surfaces during semiconductor processing
#427Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrates
#428Method for removing photoresist
#429Substrate treating apparatus and substrate treating method
#430Clean chemistry for tungsten/tungsten nitride gates
#431System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing
#432Semiconductor process residue removal composition and process
#433Tungsten plug corrosion prevention method using gas sparged water
#434Method for controlling accuracy and repeatability of an etch process
#435Photoresist stripping solution and a method of stripping photoresists using the same
#436Method and apparatus for dry etching
#437Post-deposition treatment to enhance properties of Si-O-C low k films
#438Solution applying apparatus and method
#439Method of processing substrate and chemical used in the same
#440Method to chemically remove metal impurities from polycide gate sidewalls
#441Method and apparatus for manufacturing semiconductor devices
#442Method for producing and testing a corrosion-resistant channel in a silicon device
#443Method of forming metal line layer in semiconductor device
#444Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#445Method of detecting photoresist scum, method of forming semiconductor package and photoresist scum detection apparatus
#446Magnetic tunnel junction (MTJ) performance by introducing oxidants to methanol with or without noble gas during MTJ etch