207003 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Cleaning; Cleaning during device manufacture during, before or after processing of conductive layers, e.g. polysilicon or amorphous silicon layers the processing being a delineation, e.g. RIE, of conductive layers
METHOD FOR CLEANING A CHAMBER
#2SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
#3PROTECTION STRUCTURE FOR LINER REMOVAL
#4MULTI-LAYER LINE STRUCTURE
#5METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCTOR PACKAGE AND PHOTORESIST SCUM DETECTION APPARATUS
#6STRIPPER COMPOSITION
#7ETCHING COMPOSITIONS
#8Multi-layer line structure
#9LASER SCRIBING TRENCH OPENING CONTROL IN WAFER DICING USING HYBRID LASER SCRIBING AND PLASMA ETCH APPROACH
#10MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#11Chemical solution, method for manufacturing chemical solution, and method for treating substrate
#12SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#13METHOD FOR CLEANING A CHAMBER
#14CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE
#15Selective metal residue and liner cleanse for post-subtractive etch
#16Abatement and strip process chamber in a load lock configuration
#17Treatment liquid and method for treating object to be treated
#18SUBSTRATE PROCESSING APPARATUS, SIGNAL SOURCE DEVICE, METHOD OF PROCESSING MATERIAL LAYER, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE
#19SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
#20Cleaning formulation for removing residues on surfaces
#21Cleaning formulation for removing residues on surfaces
#22PREPARATION METHOD OF METAL CONNECTING LINE
#23SELECTIVE FILM FORMATION USING A SELF-ASSEMBLED MONOLAYER
#24Metal gate with silicon sidewall spacers
#25COMPOSITION AND METHOD FOR TREATING SUBSTRATE
#26CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
#27Cleaning formulation for removing residues on surfaces
#28METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR STRUCTURE
#29Semiconductor device and method for manufacture
#30Semiconductor device and method for fabricating the same
#31Chemical liquid and method for treating object to be treated
#32Laser scribing trench opening control in wafer dicing using hybrid laser scribing and plasma etch approach
#33ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
#34WATER SOLUBLE POLYMERS FOR PATTERN COLLAPSE MITIGATION
#35Multi-layer line structure and method for manufacturing thereof
#36Processing of workpieces using fluorocarbon plasma
#37Substrate treatment method and substrate treatment equipment
#38Three-dimensional memory device containing horizontal and vertical word line interconnections and methods of forming the same
#39Semiconductor device and manufacturing method thereof
#40THIN FILM TRANSISTOR AND MANUFACTURING METHOD FOR THIN FILM TRANSISTOR
#41Cleaning agent and preparation method and use thereof
#42Method of detecting photoresist scum, method of forming semiconductor package and photoresist scum detection apparatus
#43Thermal atomic layer etch with rapid temperature cycling
#44Cleaning solution for removing dry etching residue and method for manufacturing semiconductor substrate using same
#45Methods and apparatus for hybrid feature metallization
#46Cleaning formulation for removing residues on surfaces
#47ETCHING COMPOSITIONS
#48Chemical solution, method for manufacturing chemical solution, and method for treating substrate
#49Metal gate with silicon sidewall spacers
#50Substrate processing method and substrate processing apparatus
#51Silicon mandrel etch after native oxide punch-through
#52Line structure and a method for producing the same
#53Line structure and a method for producing the same
#54ABATEMENT AND STRIP PROCESS CHAMBER IN A LOAD LOCK CONFIGURATION
#55Abatement and strip process chamber in a dual load lock configuration
#56Semiconductor device with an interconnect structure and method for forming the same
#57Abatement and strip process chamber in a load lock configuration
#58Cleaning formulation for removing residues on surfaces
#59Abatement and strip process chamber in a dual loadlock configuration
#60Substrate processing apparatus, signal source device, method of processing material layer, and method of fabricating semiconductor device
#61METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND CLEANING APPARATUS
#62Gate hole defect relieving method
#63Method for cutting element chip by laser scribing
#64SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM WITH PROGRAM STORED THEREIN FOR EXECUTING SUBSTRATE PROCESSING METHOD
#65Mechanisms for forming patterns using multiple lithography processes
#66Cleaning formulation for removing residues on surfaces
#67Cleaning formulation for removing residues on surfaces
#68Stripper solutions and methods of using stripper solutions
#69Fill material to mitigate pattern collapse
#70Line structure and a method for producing the same
#71METHOD OF FABRICATING BURIED WORD LINE AND GATE ON FINFET
#72Manufacturing method of semiconductor structure
#73Method of cleaning and drying semiconductor substrate
#74Method to remove sidewall damage after MTJ etching
#75Cleaning compositions for removing residues on semiconductor substrates
#76Substrate processing method, substrate processing apparatus and recording medium
#77Methods and systems for chemical mechanical polish cleaning
#78Cleaning formulations
#79Semiconductor device with an interconnect structure and method for forming the same
#80Manufacturing method of semiconductor memory device
#81Wafer processing method for reforming protective film
#82Enhanced charged particle beam processes for carbon removal
#83Removal of metal
#84Manufacturing method of semiconductor device
#85Method for treating pattern structure, method for manufacturing electronic device, and treatment liquid for inhibiting collapse of pattern structure
#86Cobalt-containing material removal
#87Method of fabricating semiconductor device
#88Method for manufacturing mold or optical element
#89Plasma processing method
#90Method for manufacturing ferroelectric thin film device
#91Composition for removing photoresist residue and/or polymer residue
#92Semiconductor structure and method for forming the same
#93Substrate processing apparatus, substrate processing method, and storage medium with program stored therein for executing substrate processing method
#94Cluster tool and manufacuturing method of semiconductor structure using the same
#95Substrate processing method and substrate processing device
#96Mechanisms for forming patterns using multiple lithography processes
#97HKMG integration
#98Cleaning liquid and method for cleaning
#99Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility
#100Etching method and substrate
#101Method for cleaning substrate
#102Methods of forming an interconnection line and methods of fabricating a magnetic memory device using the same
#103Cleaning formulation for removing residues on surfaces
#104Systems and methods for selectively etching tungsten in a downstream reactor
#105Metal gate with silicon sidewall spacers
#106Wet clean process for removing CHFetch residue
#107Semiconductor device with an interconnect structure and method for forming the same
#108Integrated bit-line airgap formation and gate stack post clean
#109Metal removal with reduced surface roughness
#110Semiconductor element cleaning liquid and cleaning method
#111Gate electrode material residual removal process
#112Substrate treatment method and substrate treatment equipment
#113Removal of metal
#114Thin film transistor and display device using the same
#115Method of etching organic film
#116Selective etch for metal-containing materials
#117Metal gate with silicon sidewall spacers
#118Substrate liquid processing method and substrate liquid processing apparatus
#119Integrated bit-line airgap formation and gate stack post clean
#120Mechanisms for forming patterns using multiple lithography processes
#121AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE
#122Methods for forming interconnection structures in an integrated cluster system for semicondcutor applications
#123Cleaning composition, cleaning process, and process for producing semiconductor device
#124Interconnection structure and method of forming the same
#125Method of manufacturing a semiconductor device
#126Manufacturing method of semiconductor device
#127Cleaning formulation for removing residues on surfaces
#128Cleaning liquid composition, method for cleaning semiconductor element, and method for manufacturing semiconductor element
#129Methods and systems for chemical mechanical polish cleaning
#130Plasma-free metal etch
#131Selective etch for metal-containing materials
#132Aluminum selective etch
#133Mechanisms for forming protection layer on back side of wafer
#134Plasma processing method
#135Method of manufacturing semiconductor device
#136Process for etching metal using a combination of plasma and solid state sources
#137LED based optical source coupled with plasma source
#138Methods of non-destructive post tungsten etch residue removal
#139METHODS FOR THE SELECTIVE REMOVAL OF ASHED SPIN-ON GLASS
#140Method of forming magnetic memory devices
#141Using sacrificial oxide layer for gate length tuning and resulting device
#142Semiconductor device and method for manufacturing the same
#143Method of etching metal layer
#144System, method and apparatus for ion milling in a plasma etch chamber
#145System and process to remove film from semiconductor devices
#146NOR flash device manufacturing method
#147Cleaning composition, cleaning process, and process for producing semiconductor device
#148Methods and apparatus for providing a gas mixture to a pair of process chambers
#149High productivity combinatorial workflow for post gate etch clean development
#150Techniques for treating sidewalls of patterned structures using angled ion treatment
#151Abatement and strip process chamber in a dual loadlock configuration
#152Metal conservation with stripper solutions containing resorcinol
#153Aqueous cleaner for the removal of post-etch residues
#154Cleaning methods and compositions
#155Aluminum post-etch residue removal with simultaneous surface passivation
#156Abatement and strip process chamber in a load lock configuration
#157METHOD OF FORMING A METAL PATTERN AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE
#158Methods for stripping photoresist and/or cleaning metal regions
#159Semiconductor structure having a polysilicon structure and method of forming same
#160Hard mask removal method
#161Structure and method for MOSFETS with high-K and metal gate structure
#162Process for removing material from substrates
#163AlCu hard mask process
#164Controllable Undercut Etching of Tin Metal Gate Using DSP+
#165Semiconductor device and method for manufacturing the same
#166Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#167Method for removing material from semiconductor wafer and apparatus for performing the same
#168Apparatus for efficient removal of halogen residues from etched substrates
#169Composition for Removing Photoresist and/or Etching Residue From a Substrate and Use Thereof
#170Removal of metal
#171INTERCONNECTION STRUCTURE AND METHOD OF FORMING THE SAME
#172METHOD FOR MANUFACTURING INTEGRATED CIRCUIT DEVICE
#173SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
#174Method for removing polymer after etching gate stack structure of high-K gate dielectric/metal gate
#175Method for treating a semiconductor wafer
#176Semiconductor device with inverted trapezoidal cross sectional profile in surface areas of substrate
#177METHOD FOR TREATING A SEMICONDUCTOR WAFER
#178Method of manufacturing semiconductor device
#179Composition and method for treating semiconductor substrate surface
#180Cleaning agent for semiconductor substrate, cleaning method using the cleaning agent, and method for producing semiconductor element
#181CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
#182Substrate cleaning method
#183Conductive lines and pads and method of manufacturing thereof
#184Plasma processing method and manufacturing method of semiconductor device
#185Semiconductor device and method of manufacturing a semiconductor device
#186Composition for stripping and cleaning and use thereof
#187Methods for forming a gate and a shallow trench isolation region and for planarizing an etched surface of silicon substrate
#188Methods for forming a gate and a shallow trench isolation region and for planarizing an etched surface of silicon substrate
#189Methods of forming conductive layer patterns using gas phase cleaning process and methods of manufacturing semiconductor devices
#190Methods and apparatus for providing a gas mixture to a pair of process chambers
#191Residue removing liquid composition and method for cleaning semiconductor element using same
#192Memory device and method for manufacturing memory devices
#193Cleaning composition, cleaning process, and process for producing semiconductor device
#194Gluconic acid containing photoresist cleaning composition for multi-metal device processing
#195Hard mask removal method
#196SEMICONDUCTOR CLEANING USING SUPERACIDS
#197Post deposition wafer cleaning formulation
#198PROCESS FOR CLEANING SEMICONDUCTOR ELEMENT
#199Method of removing post-etch residues
#200IN-SITU CLEAN TO REDUCE METAL RESIDUES AFTER ETCHING TITANIUM NITRIDE
#201Cleaning apparatus and high pressure cleaner for use therein
#202Composition and method for treating semiconductor substrate surface
#203Post chromium alloy plasma etch ashing process
#204Methods for forming integrated circuits
#205Cleaning composition, cleaning process, and process for producing semiconductor device
#206Dry etching method
#207RINSE FORMULATION FOR USE IN THE MANUFACTURE OF AN INTEGRATED CIRCUIT
#208Method of manufacturing semiconductor device
#209Method of manufacturing semiconductor device
#210Method of treating a semiconductor substrate
#211Method for Reducing the Damage Induced by a Physical Force Assisted Cleaning
#212Stripper solutions effective for back-end-of-line operations
#213Photoresist residue removal composition
#214METHOD FOR REMOVING HARDENED POLYMER RESIDUE
#215Post high-k dielectric/metal gate clean
#216Post metal gate VT adjust etch clean
#217METHOD FOR FORMING METAL LINE OF SEMICONDUCTOR DEVICE
#218Cleaning liquid for semiconductor device and cleaning method
#219METHOD FOR REMOVING ETCHING RESIDUES FROM SEMICONDUCTOR COMPONENTS
#220Apparatus for efficient removal of halogen residues from etched substrates
#221Method for removing dummy poly in a gate last process
#222METHOD FOR REMOVING ETCHING RESIDUES FROM SEMICONDUCTOR COMPONENTS
#223METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
#224Method of treating a semiconductor substrate
#225Semiconductor device and fabrication method thereof
#226Solution for polymer and capping layer removing with wet dipping in HK metal gate etching process
#227Compositions for processing of semiconductor substrates
#228Liquid composition for removing photoresist residue and polymer residue
#229Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions
#230Substrate processing method and substrate processing apparatus
#231Method to integrate gate etching as all-in-one process for high K metal gate
#232Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#233Apparatus for removing material from one or more substrates
#234Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applications
#235CLEANING COMPOSITIONS WITH VERY LOW DIELECTRIC ETCH RATES
#236Materials and systems for advanced substrate cleaning
#237Method of semiconductor processing
#238Method of treating surface of semiconductor substrate
#239Method of etching a material surface
#240Method for manufacturing capacitor of semiconductor device
#241SEMICONDUCTOR DEVICE FABRICATION METHOD
#242Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean
#243Mitigation of edge degradation in ferroelectric memory devices through plasma etch clean
#244Removing agent composition and removing/cleaning method using same
#245Densely packed metal segments patterned in a semiconductor die
#246Method and Apparatus for Preventing Galvanic Corrosion in Semiconductor Processing
#247Semiconductor process residue removal composition and process
#248METHOD OF FABRICATING MIM STRUCTURE CAPACITOR
#249Methods for forming a gate and a shallow trench isolation region and for planarizating an etched surface of silicon substrate
#250Remover compositions
#251METHODS OF POST CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING USING AMIDOXIME COMPOSITIONS
#252Methods of forming a conductive pattern in semiconductor devices and methods of manufacturing semiconductor devices having a conductive pattern
#253Method for forming metal line in semiconductor device
#254Semiconductor substrate cleaning methods, and methods of manufacture using same
#255Semiconductor device having silicon carbide and conductive pathway interface
#256Metal conservation with stripper solutions containing resorcinol
#257METHOD FOR REMOVING POLYMER RESIDUE FROM METAL LINES OF SEMICONDUCTOR DEVICE
#258METHOD FOR REMOVING CONTAMINATION WITH FLUORINATED COMPOSITIONS
#259Integrated apparatus for efficient removal of halogen residues from etched substrates
#260Method of fabricating a semiconductor device
#261Method for producing a microelectronic structure
#262Surface treatment method, etching method, and method for manufacturing electronic device
#263Photoresist residue remover composition and semiconductor circuit element production process employing the same
#264Substrate processing apparatus, substrate processing method and storage medium
#265Composition for cleaning semiconductor device
#266Substrate processing apparatus and substrate processing method
#267Composition for the removal of sidewall residues
#268Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
#269SUBSTRATE PROCESSING APPARATUS
#270Methods for stripping photoresist and/or cleaning metal regions
#271Method for flexing a substrate during processing
#272METHODS OF USING CORROSION-INHIBITING CLEANING COMPOSITIONS FOR METAL LAYERS AND PATTERNS ON SEMICONDUCTOR SUBSTRATES
#273Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device
#274Wet cleaning process and method for fabricating semiconductor device using the same
#275Substrate processing apparatus and gas supply method
#276METHOD FOR PROCESSING WAFER IN REACTION CHAMBER
#277COMPOSITION FOR CLEANING SUBSTRATES AND METHOD OF FORMING GATE USING THE COMPOSITION
#278REDUCTION OF LINE EDGE ROUGHNESS BY CHEMICAL MECHANICAL POLISHING
#279Systems and methods for single integrated substrate cleaning and rinsing
#280PASSIVATING METAL ETCH STRUCTURES
#281METHOD OF PROCESSING SUBSTRATE AND CHEMICAL USED IN THE SAME
#282METHOD OF PROCESSING SUBSTRATE AND CHEMICAL USED IN THE SAME
#283Post-deposition treatment to enhance properties of Si-O-C low K films
#284Methods of cleaning a semiconductor device and methods of manufacturing a semiconductor device using the same
#285Integrated method and apparatus for efficient removal of halogen residues from etched substrates
#286Device with patterned semiconductor electrode structure and method of manufacture
#287Integrated method for removal of halogen residues from etched substrates in a processing system
#288Method for forming metal line and method for manufacturing display substrate by using the same
#289Separation-material composition for photo-resist and manufacturing method of semiconductor device
#290SUBSTRATE WATER-REMOVING AGENT, AND WATER-REMOVING METHOD AND DRYING METHOD EMPLOYING SAME
#291METHOD OF REMOVING PHOTORESIST
#292Cleaning compositions for microelectronic substrates
#293Device for Treating Object and Process Therefor
#294Photoresist stripping solution and a method of stripping photoresists using the same
#295Resist, barc and gap fill material stripping chemical and method
#296Cleaning formulation for removing residues on surfaces
#297Semiconductor process residue removal composition and process
#298Method for patterning metal line in semiconductor device
#299Method for forming a gate of a semiconductor device
#300Method for cleaning post-etch noble metal residues