207032 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by plasma treatment, e.g. plasma oxidation of the substrate
SUBSTRATE PROCESSING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND MICROWAVE PLASMA APPARATUS
#2METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING VANADIUM AND NITROGEN
#3SEMICONDUCTOR DEVICE
#4SELECTIVE PROCESS FOR SIMULTANEOUS PFET EPI HARDMASK AND NFET PARTIAL BOTTOM DIELECTRIC ISOLATION LAYER FORMATION
#5SELECTIVE ETCHING BETWEEN SILICON-AND-GERMANIUM-CONTAINING MATERIALS WITH VARYING GERMANIUM CONCENTRATIONS
#6DUAL PRESSURE OXIDATION METHOD FOR FORMING AN OXIDE LAYER IN A FEATURE
#7THIN AND HIGH-QUALITY OXIDE LAYERS
#8METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#9SUBSTRATE TREATMENT METHOD
#10METHOD TO REDUCE BREAKDOWN FAILURE IN A MIM CAPACITOR
#11SEMICONDUCTOR DEVICES WITH OXIDIZED LAYER SEGMENTS IN DEVICE REGIONS
#12METHODS AND ASSEMBLIES FOR MODIFYING A SURFACE
#13INCREASING Q-TIME
#14SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
#15THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELECTRIC AND METHODS FOR FORMING THE SAME
#16SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
#17SEMICONDUCTOR DEVICE WITH COMPOSITE DIELECTRIC AND METHOD FOR FABRICATING THE SAME
#18SEMICONDUCTOR DEVICE WITH COMPOSITE DIELECTRIC AND METHOD FOR FABRICATING THE SAME
#19SEMICONDUCTOR DEVICE WITH COMPOSITE DIELECTRIC AND METHOD FOR FABRICATING THE SAME
#20ANTI-OXIDATION LAYER TO PREVENT DIELECTRIC LOSS FROM PLANARIZATION PROCESS
#21SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#22Contact with a Silicide Region
#23Fill Structures With Air Gaps
#24METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#25GROWTH OF THIN OXIDE LAYER IN VERTICAL CHANNEL STRUCTURE
#26SELF-ALIGNED INNER SPACER ON GATE-ALL-AROUND STRUCTURE AND METHODS OF FORMING THE SAME
#27SURFACE OXIDATION LAYER FOR METAL VOIDING REDUCTION
#28METHODS FOR PATTERNING A SEMICONDUCTOR SUBSTRATE USING METALATE SALT IONIC LIQUID CRYSTALS
#29METAL OXIDE COMPOSITE AS ETCH STOP LAYER
#30USE OF TIN THIN FILM FOR BONDING AND AS MASKING FILM
#31METHODS FOR TREATMENT OF HIGH-K MATERIALS TO REDUCE LEAKAGE CURRENT AND INCREASE CAPACITANCE
#32THIN FILM STRUCTURE AND METHOD OF MANUFACTURING THE THIN FILM STRUCTURE
#333D DRAM WITH ENLARGE-LESS TRIM
#34BORON NITRIDE LAYER, APPARATUS INCLUDING THE SAME, AND METHOD OF FABRICATING THE BORON NITRIDE LAYER
#35SELECTIVE ETCHING BETWEEN SILICON-AND-GERMANIUM-CONTAINING MATERIALS WITH VARYING GERMANIUM CONCENTRATIONS
#36METHODS AND SYSTEMS FOR TOPOGRAPHY-SELECTIVE DEPOSITIONS
#37LOW-PRESSURE OXIDATION TREATMENT METHOD AND DEVICE FOR SEMICONDUCTOR WORKPIECES
#38METHOD OF PATTERNING ELEMENTAL METALS
#39NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION
#40DENSIFIED SEAM-FREE SILICON-CONTAINING MATERIAL GAP FILL PROCESSES
#41METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICES
#42TUNING THRESHOLD VOLTAGE THROUGH META STABLE PLASMA TREATMENT
#43METHOD OF FORMING A MEOL CONTACT STRUCTURE
#44INTERCONNECT STRUCTURE AND METHOD OF FORMING THE SAME
#45SEMICONDUCTOR DEVICES WITH MODIFIED SOURCE/DRAIN FEATURE AND METHODS THEREOF
#46THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELECTRIC AND METHODS FOR FORMING THE SAME
#47SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURE
#48FILM FORMATION METHOD AND PLASMA PROCESSING METHOD
#49Gate Structures For Semiconductor Devices
#50PLASMA ENHANCED ATOMIC LAYER DEPOSITION OF DIELECTRIC MATERIAL UPON OXIDIZABLE MATERIAL
#51SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR PACKAGE INCLUDING SEMICONDUCTOR DEVICE
#52SEMICONDUCTOR STRUCTURE AND METHOD OF FORMING THE SAME
#53SUBSTRATE PROCESSING METHOD
#54Fill structures with air gaps
#55INTEGRATED ATMOSPHERIC PLASMA TREATMENT STATION IN PROCESSING TOOL
#56APPARATUS AND METHODS FOR PROCESSING BONDING SEMICONDUCTOR WAFERS
#57Sidewall Inorganic Passivation for Dielectric Etching Via Surface Modification
#58Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device, and recording medium
#59THERMAL ETCHING OF RUTHENIUM
#60METHOD AND APPARATUS FOR PRODUCING GROUP III NITRIDE SEMICONDUCTOR
#61METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
#62SIN GAP FILL VIA NUCLEATION INHIBITION
#63STABILIZING DIELECTRIC STRESS IN A GALVANIC ISOLATION DEVICE
#64MANUFACTURING METHOD OF INSULATION FILM
#65SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING
#66ANTI-OXIDATION LAYER TO PREVENT DIELECTRIC LOSS FROM PLANARIZATION PROCESS
#67SYSTEM AND METHOD FOR RADICAL AND THERMAL PROCESSING OF SUBSTRATES
#68PLASMA SURFACE TREATMENT FOR WAFER BONDING METHODS
#69DC bias in plasma process
#70SUBSTRATE PROCESSING METHOD
#71METHOD FOR FORMING SEMICONDUCTOR STRUCTURE WITH HIGH ASPECT RATIO
#72ETCH MONITORING AND PERFORMING
#73SEMICONDUCTOR DEVICE AND METHOD FOR FORMING THE SAME
#74Method of manufacturing semiconductor device including isolation structure with nitridation layer
#75METHOD OF MANUFACTURING SILICON NITROGENEOUS FILM
#76SEMICONDUCTOR DEVICE
#77METHOD FOR FORMING EPITAXIAL SOURCE/DRAIN FEATURES USING A SELF-ALIGNED MASK AND SEMICONDUCTOR DEVICES FABRICATED THEREOF
#78Self-aligned inner spacer on gate-all-around structure and methods of forming the same
#79Forming an oxide volume within a fin
#80THIN FILM TRANSISTOR INCLUDING A COMPOSITIONALLY-GRADED GATE DIELECTRIC AND METHODS FOR FORMING THE SAME
#81Nanostructure Field-Effect Transistor Device and Method of Forming
#82SEMICONDUCTOR DEVICE HAVING NANOSTRUCTURE TRANSISTOR AND METHODS OF FABRICATION THEREOF
#83METHOD FOR GROWING A SEMICONDUCTOR ASSEMBLY AND SEMICONDUCTOR ASSEMBLY
#84RINSE PROCESS AFTER FORMING FIN-SHAPED STRUCTURE
#85METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND SEMICONDUCTOR DEVICES
#86Tuning threshold voltage through meta stable plasma treatment
#87Boron nitride layer, apparatus including the same, and method of fabricating the boron nitride layer
#88METHODS FOR OXIDIZING A SILICON HARDMASK USING ION IMPLANT
#89Interconnect structure and method for forming the same
#90Methods for near surface work function engineering
#91Method of forming oxide layer on a doped substrate using nitridation and oxidation process
#92Dual pressure oxidation method for forming an oxide layer in a feature
#93METHOD TO REDUCE BREAKDOWN FAILURE IN A MIM CAPACITOR
#94SEMICONDUCTOR STRUCTURE AND METHOD FOR MANUFACTURING SAME
#95Treatment for adhesion improvement
#96SCALED LINER LAYER FOR ISOLATION STRUCTURE
#97NH RADICAL THERMAL NITRIDATION TO FORM METAL SILICON NITRIDE FILMS
#98PLASMA PROCESSING WITH TUNABLE NITRIDATION
#99Methods for seamless gap filling of dielectric material
#100ETCHING METHOD AND ETCHING APPARATUS
#101SEMICONDUCTOR STRUCTURE AND FORMING METHOD THEREOF
#102METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#103GERMANIUM AND SILICON STACKS FOR 3D NAND
#104ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#105SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#106Method of making a metal silicide contact to a silicon substrate
#107Etch monitoring and performing
#108Semiconductor devices and methods of manufacture
#109SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
#110Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor
#111Method for manufacturing semiconductor device and substrate processing apparatus
#112Methods of manufacturing high electron mobility transistors having a modified interface region
#113Contact with a Silicide Region
#114METHOD AND SYSTEM FOR FORMING METAL-INSULATOR-METAL CAPACITORS
#115LOW-K DIELECTRIC DAMAGE PREVENTION
#116Method for fabricating semiconductor devices
#117DC bias in plasma process
#118Method of forming memory device
#119Methods for manufacturing semiconductor memory
#120Fill structures with air gaps
#121Semiconductor memory device and method of manufacturing thereof
#122METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF PROCESSING SUBSTRATE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
#123Anti-oxidation layer to prevent dielectric loss from planarization process
#124Semiconductor devices with modified source/drain feature and methods thereof
#125ISOLATION STRUCTURE OF A PHOTORESIST STRIPPER, TFT ARRAYS AND PREPARATION METHOD THEREOF
#126METHODS AND SYSTEMS FOR FORMING A LAYER COMPRISING VANADIUM AND NITROGEN
#127Method for forming epitaxial source/drain features using a self-aligned mask and semiconductor devices fabricated thereof
#128Method of making a semiconductor arrangement
#129METHOD FOR ETCHING A THREE-DIMENSIONAL DIELECTRIC LAYER
#130Thin film transistor including a compositionally-graded gate dielectric and methods for forming the same
#131METHOD OF MANUFACTURING METAL OXIDE FILM AND DISPLAY DEVICE INCLUDING METAL OXIDE FILM
#132Metal oxide composite as etch stop layer
#133Semiconductor device and method for forming the same
#134Semiconductor device structure with etch stop layer for reducing RC delay
#135Gate structures for semiconductor devices
#136METHOD OF TREATING A SUBSTRATE
#137Semiconductor device
#138Semiconductor memory device and method for manufacturing the same
#139Semiconductor structure and fabrication method thereof
#140Tuning threshold voltage through meta stable plasma treatment
#141Method for fabricating semiconductor devices
#142BOTTOM-UP FILL DIELECTRIC MATERIALS FOR SEMICONDUCTOR STRUCTURE FABRICATION AND THEIR METHODS OF FABRICATION
#143Nanostructure field-effect transistor device and method of forming
#144Method to reduce breakdown failure in a MIM capacitor
#145Steam oxidation initiation for high aspect ratio conformal radical oxidation
#146Conformal oxidation for gate all around nanosheet I/O device
#147Memory device and method of forming the same
#148PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#149Method of manufacturing semiconductor device, and recording medium
#150Vertical transistor fabrication for memory applications
#151Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#152Semiconductor device
#153Surface Smoothing of Workpieces
#154Gate structures for semiconductor devices
#155Plasma block with integrated cooling
#156VERTICALLY STACKED FIN SEMICONDUCTOR DEVICES
#157Back-side illuminated image sensor
#158Semiconductor device
#159System and method for radical and thermal processing of substrates
#160System and method for radical and thermal processing of substrates
#161Method of manufacturing a semiconductor device
#162METHOD OF FORMING GATE
#163Method and system for forming metal-insulator-metal capacitors
#164MULTIPLE GATE SIDEWALL SPACER WIDTHS
#165Low-k dielectric damage prevention
#166Method and apparatus for forming substrate surfaces with exposed crystal lattice using accelerated neutral atom beam
#167Memory cell fabrication for 3D NAND applications
#168Fin field-effect transistor device and method
#169Method and apparatus for selective nitridation process
#170Semiconductor nitridation passivation
#171Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium
#172Self-aligned inner spacer on gate-all-around structure and methods of forming the same
#173Display substrate and manufacturing method therefor, and display device
#174Methods for in-situ chamber monitoring
#175Interconnect structure and method of forming the same
#176Boron nitride layer, apparatus including the same, and method of fabricating the boron nitride layer
#177Plasma processing device member and plasma processing device provided with same
#178Method of topology-selective film formation of silicon oxide
#179Method to reduce breakdown failure in a MIM capacitor
#180Methods of forming NAND memory arrays
#181Methods and apparatus for dynamical control of radial uniformity with two-story microwave cavities
#182Plasma processing method
#183Method for processing a workpiece
#184Element chip smoothing method and element chip manufacturing method
#185Oxidative trim
#186Method for forming semiconductor structure with high aspect ratio
#187PNA temperature monitoring method
#188Plasma processing device member, plasma processing device comprising said plasma processing device member, and method for manufacturing plasma processing device member
#189Semiconductor device
#190Forming an oxide volume within a fin
#191Fabrication method of semiconductor device
#192Treatment for adhesion improvement
#193Surface pretreatment process to improve quality of oxide films produced by remote plasma
#194Electrostatic chucking process
#195Tuning threshold voltage through meta stable plasma treatment
#196Substrate processing apparatus and substrate processing method
#197Film forming method and film forming apparatus
#198RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP MEMORY DEVICE
#199Fabrication of multi-channel nanowire devices with self-aligned internal spacers and SOI FinFETs using selective silicon nitride capping
#200Semiconductor structure and formation method thereof
#201Method for gate stack formation and etching
#202Semiconductor device and method for fabricating the same
#203Vertical transistor fabrication for memory applications
#204Argon addition to remote plasma oxidation
#205Method of processing substrates and substrate processing apparatus
#206Steam oxidation initiation for high aspect ratio conformal radical oxidation
#207Array substrate, display device, thin film transistor, and method for manufacturing array substrate
#208Memory cell fabrication for 3D nand applications
#209Method of manufacturing semiconductor device
#210Surface smoothing of workpieces
#211Sequential deposition and high frequency plasma treatment of deposited film on patterned and un-patterned substrates
#212Self-aligned inner spacer on gate-all-around structure and methods of forming the same
#213RADICAL OXIDATION PROCESS FOR FABRICATING A NONVOLATILE CHARGE TRAP MEMORY DEVICE
#214OXIDE FORMATION IN A PLASMA PROCESS
#215Semiconductor memory device and method for manufacturing the same
#216SCALED LINER LAYER FOR ISOLATION STRUCTURE
#217Contact with a silicide region
#218Semiconductor device
#219PLANARIZATION DEPTH TRIGGERED BY PROCESS INTERACTION
#220Methods for film modification
#221Plasma deposition method, plasma deposition apparatus and method of manufacturing semiconductor device
#222Method of reducing lift-off related redeposit defects on semiconductor wafers
#223Structure and formation method of semiconductor device with monoatomic etch stop layer
#224Method of manufacturing a semiconductor device
#225Method of manufacturing a semiconductor device
#226Semiconductor device structure and method for forming the same
#227Gate spacer and method of forming
#228Metal oxide composite as etch stop layer
#229Remote plasma oxide layer
#230Method for fabricating a semiconductor structure on a semiconductor wafer
#231Approach to control over-etching of bottom spacers in vertical fin field effect transistor devices
#232Gate spacer and methods of forming
#233Contact via structure including a barrier metal disc for low resistance contact and methods of making the same
#234Fin field-effect transistor device and method
#235Method and system for selectively forming film
#236Treatment for adhesion improvement
#237Methods of forming a silicon-insulator layer and semiconductor device having the same
#238Self-aligned hard masks with converted liners
#239Method of manufacturing an insulation layer on silicon carbide
#240Graphene semiconductor design method
#241Method for manufacturing grooved MOSFET device based on two-step microwave plasma oxidation
#242Semiconductor device and manufacturing method thereof
#243SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure material
#244VFET devices with improved performance
#245Methods for cyclic etching of a patterned layer
#246Surface treatment of silicon or silicon germanium surfaces using organic radicals
#247Method and structure of forming finFET contact
#248NAND memory arrays, devices comprising semiconductor channel material and nitrogen, and methods of forming NAND memory arrays
#249Semiconductor device
#250Method of forming a contact with a silicide region
#251Method of forming transistor device having fin cut regions
#252Bottom-up fill dielectric materials for semiconductor structure fabrication and their methods of fabrication
#253DC bias in plasma process
#254Method to achieve a sidewall etch
#255Back-side illuminated image sensor
#256Methods of fabricating semiconductor devices
#257Self-formed liner for interconnect structures
#258Argon addition to remote plasma oxidation
#259Method and structure of forming FinFET contact
#260Surface treatment of carbon containing films using organic radicals
#261Metal recess for semiconductor structures
#262Metal recess for semiconductor structures
#263Semiconductor device and manufacturing method thereof
#264Technique for multi-patterning substrates
#265SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#266Method for forming semiconductor structure with high aspect ratio
#267Hybrid source and drain contact formation using metal liner and metal insulator semiconductor contacts
#268Methods, apparatus and system for forming a FinFET device comprising a first portion capable of operating at a first voltage and a second portion capable of operating at a second voltage
#269Method of manufacturing metal oxide film and display device including metal oxide film
#270Semiconductor structure and fabrication method thereof
#271Semiconductor device structure comprising a plurality of metal oxide fibers and method for forming the same
#272Surface treatment of silicon and carbon containing films by remote plasma with organic precursors
#273Oxide formation in a plasma process
#274Method and apparatus for selective nitridation process
#275Film formation apparatus
#276Interconnect structure with insulation layer and method of forming the same
#277PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#278Method of manufacturing semiconductor device, and recording medium
#279Techniques and structure for forming thin silicon-on-insulator materials
#280Structure and formation method of semiconductor device structure with etch stop layer
#281NAND memory arrays, and devices comprising semiconductor channel material and nitrogen
#282Method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#283Method for manufacturing thin film transistor, method for manufacturing array substrate, array substrate and display device
#284Silicon germanium selective oxidation process
#285Substrate treatment method
#286Substrate processing method and substrate processing apparatus
#287Radical oxidation process for fabricating a nonvolatile charge trap memory device
#288Method of manufacturing memory device
#289Thin film transistor, method for manufacturing the same and display device
#290Semiconductor structure and manufacturing method thereof
#291SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF
#292Devices, systems, and methods for light emission and detection using amorphous silicon
#293Method of manufacturing thin film transistor
#294Package structure
#295Method and apparatus for neutral beam processing based on gas cluster ion beam technology
#296Apparatus and methods for backside passivation
#297Enhanced high aspect ratio etch performance using accelerated neutral beams derived from gas-cluster ion beams
#298Method of manufacturing semiconductor device
#299Manufacturing method of a semiconductor device
#300Semiconductor device and method for fabricating the same