207032 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by plasma treatment, e.g. plasma oxidation of the substrate
Semiconductor device manufacturing method, semiconductor device, plasma nitriding treatment method, control program and computer storage medium
#602Methods for low temperature oxidation of a semiconductor device
#603NITRIDING METHOD OF GATE OXIDE FILM
#604Plasma processing method
#605PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
#606Dielectric film, its formation method, semiconductor device using the dielectric film and its production method
#607Method for manufacturing semiconductor device
#608Method for manufacturing semiconductor device
#609Method for manufacturing semiconductor device
#610Low-temperature grown high quality ultra-thin CoTiOgate dielectrics
#611Method of forming a dielectic film that contains silicon, oxygen and nitrogen and method of fabricating a semiconductor device that uses such a dielectric film
#612Semiconductor memory device and manufacturing method thereof
#613Methods for forming an enriched metal oxide surface
#614Semiconductor structure and an apparatus and a method for producing a semiconductor structure
#615Manufacturing method of semiconductor device
#616NITRIDATION PROCESS
#617Method for forming shallow trench isolation of semiconductor device
#618Interconnects having sealing structures to enable selective metal capping layers
#619Selective plasma processing method
#620SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BORON IMPLANTED WAFERS
#621Plasma processing apparatus
#622Substrate processing method and substrate processing apparatus
#623Method for manufacturing semiconductor device
#624Method for reducing resist poisoning during patterning of stressed nitrogen-containing layers in a semiconductor device
#625Method for fabricating semiconductor device including recess gate
#626Oxidation method and apparatus for semiconductor process
#627Dielectric material with a reduced dielectric constant and methods of manufacturing the same
#628Method to form ultra high quality silicon-containing compound layers
#629METHOD FORMING SILICON OXYNITRIDE GATE DIELECTRIC LAYER WITH UNIFORM NITROGEN CONCENTRATION
#630CMOS SION GATE DIELECTRIC PERFORMANCE WITH DOUBLE PLASMA NITRIDATION CONTAINING NOBLE GAS
#631Method of manufacturing a semiconductor device and a non-volatile semiconductor storage device including the formation of an insulating layer using a plasma treatment
#632Semiconductor device and semiconductor device manufacturing method
#633Insulating film forming method and substrate processing method
#634Semiconductor memory device and manufacturing method thereof
#635HIGH DENSITY PLASMA OXIDATION
#636Low-temperature dielectric formation for devices with strained germanium-containing channels
#637Method for manufacturing semiconductor device and plasma oxidation method
#638Plasma processing apparatus and plasma processing method
#639Process for producing materials for electronic device
#640METHOD FOR FORMING SILICON OXYNITRIDE MATERIALS
#641Multiple nitrogen plasma treatments for thin SiON dielectrics
#642Dielectric material with reduced dielectric constant and methods of manufacturing the same
#643Method of forming insulating layer of semiconductor device
#644Method of forming an insulation structure and method of manufacturing a semiconductor device using the same
#645Semiconductor device and method for fabricating the same
#646Nitriding method of gate oxide film
#647Method and system for forming a nitrided germanium-containing layer using plasma processing
#648Method for forming a nitrided germanium-containing layer using plasma processing
#649Method for fabricating a gate dielectric of a field effect transistor
#650Method for fabricating a gate dielectric of a field effect transistor
#651Semiconductor device, manufacturing method thereof, liquid crystal display device, RFID tag, light emitting device, and electronic device
#652Method and system for forming a layer with controllable spstial variation
#653Multi-source method and system for forming an oxide layer
#654Method and apparatus for improving nitrogen profile during plasma nitridation
#655Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
#656Manufacturing method for two-step post nitridation annealing of plasma nitrided gate dielectric
#657Semiconductor device and manufacturing method thereof
#658Interconnects having sealing structures to enable selective metal capping layers
#659Organic transistor, manufacturing method of semiconductor device and organic transistor
#660Plasma processing method
#661Substrate processing method and substrate processing apparatus
#662Methods for forming an enriched metal oxide surface
#663Dry etching method, fabrication method for semiconductor device, and dry etching apparatus
#664Method and system for forming a high-k dielectric layer
#665Method and system for forming an oxynitride layer by performing oxidation and nitridation concurrently
#666Method for treatment of silicon-based target object to be processed, apparatus for treatment and method of manufacturing semiconductor device
#667Plasma gate oxidation process using pulsed RF source power
#668Selective plasma re-oxidation process using pulsed RF source power
#669Method and apparatus for forming thin film of semiconductor device
#670Method of forming a dielectric structure having a high dielectric constant and method of manufacturing a semiconductor device having the dielectric structure
#671Manufacturing method of semiconductor device, semiconductor manufacturing apparatus, plasma nitridation method, computer recording medium, and program
#672Complex oxides for use in semiconductor devices and related methods
#673Remote plasma activated nitridation
#674Method and apparatus for forming insulating film
#675Method of manufacturing semiconductor device
#676Layer system comprising a silicon layer and a passivation layer, method for production a passivation layer on a silicon layer and the use of said system and method
#677Method of inhibiting degradation of gate oxide film
#678Scalable gate and storage dielectric
#679High density plasma grown silicon nitride
#680Method of manufacturing flash memory device
#681Methods for forming an enriched metal oxide surface for use in a semiconductor device
#682Substrate processing method
#683Ultraviolet blocking layer
#684Method and apparatus for processing
#685Plasma processing method, plasma processing apparatus, and computer recording medium
#686SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
#687Plasma method with high input power
#688Method of forming gate insulation film using plasma method of fabricating poly-silicon thin film transistor using the same
#689Semiconductor memory device and manufacturing method thereof
#690High density plasma process for the formation of silicon dioxide on silicon carbide substrates
#691Plasma processing apparatus and plasma processing method
#692Method for fabricating oxide thin films
#693Process for producing materials for electronic device
#694Substrate processing method
#695Substrate treating method
#696Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics
#697Method for forming gate dielectric layer
#698Method of inhibiting degradation of gate oxide film
#699Process for forming oxide film, apparatus for forming oxide film and material for electronic device
#700Lanthanide doped TiOx dielectric films by plasma oxidation
#701Method to form ultra high quality silicon-containing compound layers
#702Method of manufacturing a thin dielectric layer using a heat treatment and a semiconductor device formed using the method
#703Processing apparatus and method
#704Substrate processing method and substrate processing apparatus
#705Crystalline or amorphous medium-K gate oxides, Y0and Gd0
#706Highly reliable amorphous high-k gate oxide ZrO2
#707Lanthanide doped TiOdielectric films by plasma oxidation
#708Method of forming gates in semiconductor devices
#709Gate oxide formation through hybrid methods of thermal and deposition processes and method for producing the same
#710Methods for anisotropic control of selective silicon removal
#711Self-formed liner for interconnect structures
#712Three-dimensional stacking structure and manufacturing method thereof
#713Locally-trap-characteristic-enhanced charge trap layer for three-dimensional memory structures
#714Methods of forming multi-Vt III-V TFET devices
#715Package structure and method for forming the same
#716Partially dielectric isolated fin-shaped field effect transistor (FinFET)
#717Nitride-enriched oxide-to-oxide 3D wafer bonding
#718Method for fabricating nanowires for horizontal gate all around devices for semiconductor applications
#719RF impedance matching network
#720Electronically variable capacitor and RF matching network incorporating same
#721Oxide formation in a plasma process
#722Method of fabricating a charge-trapping gate stack using a CMOS process flow