207032 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by plasma treatment, e.g. plasma oxidation of the substrate
Semiconductor device having multiple work functions and manufacturing method thereof
#302Chemistry compatible coating material for advanced device on-wafer particle performance
#303Frequency and match tuning in one state and frequency tuning in the other state
#304Semiconductor memory device and method for manufacturing the same
#305Formation of inner spacer on nanosheet MOSFET
#306Method for ultra-shallow etching using neutral beam processing based on gas cluster ion beam technology
#307Directional deposition on patterned structures
#308Fabrication of multi-channel nanowire devices with self-aligned internal spacers and SOI FinFETs using selective silicon nitride capping
#309Shaped etch profile with oxidation
#310Plasma processing apparatus
#311Approach to control over-etching of bottom spacers in vertical fin field effect transistor devices
#312Approach to control over-etching of bottom spacers in vertical fin field effect transistor devices
#313Stacked nanowire device width adjustment by gas cluster ion beam (GCIB)
#314Protective film forming method
#315Semiconductor device structure and method for forming the same
#316Etching method
#317Method of selective deposition for BEOL dielectric etch
#318Method for generating vertical profiles in organic layer etches
#319Formation of silicon-containing thin films
#320Bonding electrode structure of flip-chip led chip and fabrication method
#321Semiconductor device and manufacturing method thereof
#322Semiconductor device
#323PLASMA PROCESSING DEVICE
#324SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#325Self-formed liner for interconnect structures
#326Frequency and match tuning in one state and frequency tuning in the other state
#327Integrated method for wafer outgassing reduction
#328STEAM OXIDATION INITIATION FOR HIGH ASPECT RATIO CONFORMAL RADICAL OXIDATION
#329Fabrication of vertical fin transistor with multiple threshold voltages
#330Fabrication of vertical fin transistor with multiple threshold voltages
#331Fabrication of vertical fin transistor with multiple threshold voltages
#332Formation of inner spacer on nanosheet MOSFET
#333Hybrid source and drain contact formation using metal liner and metal insulator semiconductor contacts
#334METHOD OF FABRICATING THIN FILM
#335Semiconductor device having multiple thickness oxides
#336OXIDIZING FILLER MATERIAL LINES TO INCREASE WIDTH OF HARD MASK LINES
#337Silicon germanium selective oxidation process
#338Simultaneous formation of liner and metal conductor
#339Stacked nanowire device width adjustment by gas cluster ion beam (GCIB)
#340Three-dimensional stacking structure
#341Semiconductor device and FinFET transistor
#342Semiconductor device and manufacturing method of semiconductor device
#343Integrated circuit devices
#344Advanced through substrate via metallization in three dimensional semiconductor integration
#345Substrate processing method and substrate processing apparatus
#346Oxidizing treatment of aluminum nitride films in semiconductor device manufacturing
#347Hybrid source and drain contact formation using metal liner and metal insulator semiconductor contacts
#348Method for preferential oxidation of silicon in substrates containing silicon and germanium
#349Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#350Electrical components having metal traces with protected sidewalls
#351Oxidizing filler material lines to increase width of hard mask lines
#352Fabrication of vertical fin transistor with multiple threshold voltages
#353Semiconductor device manufacturing method and recording medium
#354PEELING METHOD
#355Film forming method and film forming apparatus
#356Thin-film transistor substrate and method of manufacturing the same
#357Interconnect structure and method of forming
#358Methods for cyclic etching of a patterned layer
#359Package structure and method for forming the same
#360Non-uniform gate oxide thickness for DRAM device
#361Semiconductor device structure comprising a plurality of metal oxide fibers and method for forming the same
#362DIRECTIONAL DEPOSITION ON PATTERNED STRUCTURES
#363Method for manufacturing insulating film laminated structure
#364Gate spacer and methods of forming
#365Method for modifying epitaxial growth shape
#366Semiconductor device structure and method for forming the same
#367Hybrid source and drain contact formation using metal liner and metal insulator semiconductor contacts
#368Method of corner rounding and trimming of nanowires by microwave plasma
#369Thin film transistor substrate and method of manufacturing the same
#370III-N material structure for gate-recessed transistors
#371Method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#372Stacked nanowire device width adjustment by gas cluster ion beam (GCIB)
#373Stacked nanowire device width adjustment by gas cluster ion beam (GCIB)
#374Dry etching method and dry etching agent
#375Method of fabricating a charge-trapping gate stack using a CMOS process flow
#376Array substrate for liquid crystal display device and method of manufacturing the same
#377Semiconductor memory device and method for manufacturing the same
#378Semiconductor device including electromagnetic interference (EMI) shielding layer and method for manufacturing the semiconductor device
#379FINFET semiconductor devices and method of forming the same
#380Methods of forming CMOS based integrated circuit products using disposable spacers
#381Semiconductor device structure and method for forming the same
#382ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF AND DISPLAY DEVICE
#383Method for processing substrate including forming a film on a silicon-containing surface of the substrate to prevent resist from extruding from the substrate during an imprinting process
#384Integrated circuit devices and methods of manufacturing the same
#385Flexible electronic device having adhesive function and method of manufacturing the same
#386Semiconductor memory device and method of manufacturing the same
#387Semiconductor device
#388Oxide formation in a plasma process
#389Interconnects having sealing structures to enable selective metal capping layers
#390Self-aligned hard mask for epitaxy protection
#391SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#392Semiconductor device, FinFET transistor and fabrication method thereof
#393Method of manufacturing a semiconductor device
#394Method of manufacturing a horizontal gate-all-around transistor having a fin
#395Isotropic atomic layer etch for silicon oxides using no activation
#396Non-lithographic line pattern formation
#397THIN-FILM TRANSISTOR AND MANUFACTURING METHOD FOR SAME
#398Apparatus and method for selective oxidation at lower temperature using remote plasma source
#399Method of manufacturing a transistor with oxidized cap layer
#400Graphene wiring structure and manufacturing method thereof
#401Fin end spacer for preventing merger of raised active regions
#402Method of manufacturing semiconductor device
#403Method of manufacturing silicon carbide semiconductor device by using protective films to activate dopants in the silicon carbide semiconductor device
#404Finfet crosspoint flash memory
#405Single-crystal silicon carbide substrate, method for producing single-crystal silicon carbide substrate, and method for inspecting single-crystal silicon carbide substrate
#406Method of forming spacers for a gate of a transistor
#407Isotropic atomic layer etch for silicon oxides using no activation
#408e-Flash Si dot nitrogen passivation for trap reduction
#409Conformal nitridation of one or more fin-type transistor layers
#410GATE OXIDE FORMATION PROCESS
#411Method of selective gas phase film deposition on a substrate by modifying the surface using hydrogen plasma
#412Nitride layer protection between PFET source/drain regions and dummy gate during source/drain etch
#413Uniform thickness blocking dielectric portions in a three-dimensional memory structure
#414Selective floating gate semiconductor material deposition in a three-dimensional memory structure
#415SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
#416Gate spacers and methods of forming
#417PRECISION INTRALEVEL METAL CAPACITOR FABRICATION
#418Dual epitaxy CMOS processing using selective nitride formation for reduced gate pitch
#419Dual epitaxy CMOS processing using selective nitride formation for reduced gate pitch
#420Method of depositing ammonia free and chlorine free conformal silicon nitride film
#421Semiconductor device and method of fabricating the same
#422Methods for controlling Fin recess loading
#423Semiconductor device and method for forming the same
#424THIN FILM TRANSISTOR ELEMENT, PRODUCTION METHOD FOR SAME, AND DISPLAY DEVICE
#425METHOD AND APPARATUS FOR CHARACTERIZING METAL OXIDE REDUCTION
#426Method and structure for transistors using gate stack dopants with minimal nitrogen penetration
#427Semiconductor device and method for manufacturing the same
#428Method for making semiconductor devices including reactant treatment of residual surface portion
#429METHOD OF FORMING A DIELECTRIC LAYER
#430Substrate processing method and substrate processing apparatus
#431Methods of manufacturing semiconductor devices that include performing hydrogen plasma treatment on insulating layer
#432Semiconductor memory device and method for manufacturing the same
#433III-N material structure for gate-recessed transistors
#434Method for void-free cobalt gap fill
#435Substrate processing method
#436Fin end spacer for preventing merger of raised active regions
#437Fin end spacer for preventing merger of raised active regions
#438Fin end spacer for preventing merger of raised active regions
#439Carbon and/or nitrogen incorporation in silicon based films using silicon precursors with organic co-reactants by PE-ALD
#440Method of fabricating a charge-trapping gate stack using a CMOS process flow
#441Thin film transistor and method for manufacturing the same, array substrate including the thin film transistor and display device including the array substrate
#442Semiconductor device and method of fabricating the same
#443Transistor with oxidized cap layer
#444Passivation structure of fin field effect transistor
#445Method of manufacturing dielectric layers of semiconductor structure
#446Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#447Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus
#448Pixelated capacitance controlled ESC
#449Store resource event detection
#450SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
#451Conversion process utilized for manufacturing advanced 3D features for semiconductor device applications
#452Method to improve MIM device performance
#453Semiconductor memory device and method of fabricating the same
#454Methods and systems for using oxidation layers to improve device surface uniformity
#455Semiconductor device and method for forming the same
#456Semiconductor device with reduced leakage current and method for making the same
#457Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#458Spacer material modification to improve K-value and etch properties
#459Method of enhancing high-k film nucleation rate and electrical mobility in a semiconductor device by microwave plasma treatment
#460Gas supplying method and semiconductor manufacturing apparatus
#461FinFET device containing a composite spacer structure
#462Processing method of stacked-layer film and manufacturing method of semiconductor device
#463Semiconductor device and method for fabricating the same
#464Methods of selectively growing source/drain regions of fin field effect transistor and method of manufacturing semiconductor device including a fin field effect transistor
#465METHOD OF MODIFYING POLYSILICON LAYER THROUGH NITROGEN INCORPORATION FOR ISOLATION STRUCTURE
#466Fin end spacer for preventing merger of raised active regions
#467Method of manufacturing semiconductor device and semiconductor device
#468Fin arrangement and method for manufacturing the same
#469Method for making semiconductor devices including reactant treatment of residual surface portion
#470Radical oxidation process for fabricating a nonvolatile charge trap memory device
#471Multi-plasma nitridation process for a gate dielectric
#472Semiconductor device and method for manufacturing semiconductor device
#473Multi-plasma nitridation process for a gate dielectric
#474Methods for fabricating semiconductor device
#475III-N material structure for gate-recessed transistors
#476TRANSISTORS HAVING MULTIPLE LATERAL CHANNEL DIMENSIONS
#477Surface preparation with remote plasma
#478Trimming silicon fin width through oxidation and etch
#479Multi-cell resonator microwave surface-wave plasma apparatus
#480NARROW DIFFUSION BREAK FOR A FIN FIELD EFFECT (FinFET) TRANSISTOR DEVICE
#481Mechanisms for forming protection layer on back side of wafer
#482Interconnects having sealing structures to enable selective metal capping layers
#483Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#484Method of manufacturing semiconductor device by alternatively increasing and decreasing pressure of process chamber
#485Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#486METHOD FOR PRODUCING SILICON CARBIDE SEMICONDUCTOR DEVICE
#487Process for thinning the active silicon layer of a substrate of “silicon on insulator” (SOI) type
#488Systems, methods, and apparatus for minimizing cross coupled wafer surface potentials
#489Method for manufacturing semiconductor device
#490Non-lithographic line pattern formation
#491Non-lithographic hole pattern formation
#492Method for conformal treatment of dielectric films using inductively coupled plasma
#493Methods for forming layers on semiconductor substrates
#494Safe handling of low energy, high dose arsenic, phosphorus, and boron implanted wafers
#495Remote plasma radical treatment of silicon oxide
#496Method of forming silicon oxide film
#497Method for forming a layer on a substrate at low temperatures
#498Method to control depth profiles of dopants using a remote plasma source
#499Method for fabricating semiconductor device
#500Semiconductor device dielectric interface layer
#501Apparatus and methods for backside passivation
#502Method of fabricating GaN high voltage HFET with passivation plus gate dielectric multilayer structure
#503Plasma enhanced atomic layer deposition with pulsed plasma exposure
#504Substrate processing apparatus and method of manufacturing semiconductor device
#505Film forming method and film forming apparatus
#506Method of forming isolation structure
#507Oxide TFT and manufacturing method thereof
#508Non-lithographic hole pattern formation
#509Non-lithographic line pattern formation
#510Gallium nitride to silicon direct wafer bonding
#511Radical oxidation process for fabricating a nonvolatile charge trap memory device
#512Semiconductor device dielectric interface layer
#513Nucleation of III-N on REO templates
#514Oxide semiconductor device with an oxygen-controlling insulating layer
#515Methods of fabricating gate insulating layers in gate trenches and methods of fabricating semiconductor devices including the same
#516GaN high voltage HFET with passivation plus gate dielectric multilayer structure
#517Method and apparatus for selective nitridation process
#518Remote plasma radical treatment of silicon oxide
#519Metal oxide semiconductor device having a predetermined threshold voltage and a method of making
#520Semiconductor device and method of manufacturing semiconductor device
#521Nitrogen passivation of source and drain recesses
#522Semiconductor device and manufacturing method for the same
#523SEMICONDUCTOR PROCESS
#524Method and apparatus for selective nitridation process
#525Converting metal mask to metal-oxide etch stop layer and related semiconductor structure
#526Surface treatment method for atomically flattening a silicon wafer and heat treatment apparatus
#527Semiconductor device and method for manufacturing the same
#528PLASMA PROCESSING METHOD
#529METHOD FOR FORMING GERMANIUM OXIDE FILM AND MATERIAL FOR ELECTRONIC DEVICE
#530Method of manufacturing semiconductor device
#531Semiconductor device and method of manufacturing the same
#532PLASMA PROCESSING APPARATUS AND WAVE RETARDATION PLATE USED THEREIN
#533CLEANING METHOD FOR SILICON CARBIDE SEMICONDUCTOR AND CLEANING APPARATUS FOR SILICON CARBIDE SEMICONDUCTOR
#534METHOD FOR SELECTIVE OXIDATION, DEVICE FOR SELECTIVE OXIDATION, AND COMPUTER-READABLE MEMORY MEDIUM
#535Method for manufacturing semiconductor device
#536High-K gate dielectric oxide
#537Semiconductor device and method for manufacturing the same
#538Interconnects having sealing structures to enable selective metal capping layers
#539Method of manufacturing semiconductor device, method of processing substrate, and substrate processing apparatus
#540Semiconductor device and method of manufacturing semiconductor device
#541Method for manufacturing semiconductor device with silicon nitride charge trapping film having varying hydrogen concentration
#542Method of forming an insulation structure and method of manufacturing a semiconductor device using the same
#543Method for producing an organic radiation-emitting component and organic radiation-emitting component
#544Methods for oxidation of a semiconductor device
#545PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND END POINT DETECTION METHOD
#546Method and apparatus for forming silicon oxide film
#547Method and apparatus of plasma treatment
#548Semiconductor device and method for manufacturing the same
#549Method of manufacturing magnetic tunnel junction device and apparatus for manufacturing the same
#550Low-temperature grown high quality ultra-thin CoTiOgate dielectrics
#551Semiconductor device comprising capacitive element
#552Atomic layer deposition apparatus and atomic layer deposition method
#553OXIDATION METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESS
#554Organic transistor, manufacturing method of semiconductor device and organic transistor
#555PLASMA PROCESSING METHOD, PLASMA PROCESSING APPARATUS, AND COMPUTER RECORDING MEDIUM
#556Post treatment methods for oxide layers on semiconductor devices
#557Dual frequency low temperature oxidation of a semiconductor device
#558METHOD AND APPARATUS OF PLASMA TREATMENT
#559Method and apparatus for forming silicon oxide film
#560Ultra-thin film formation using gas cluster ion beam processing
#561Methods for forming conformal oxide layers on semiconductor devices
#562Method of forming silicon oxide film and method of production of semiconductor memory device using this method
#563SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREFOR
#564SAFE HANDLING OF LOW ENERGY, HIGH DOSE ARSENIC, PHOSPHORUS, AND BORON IMPLANTED WAFERS
#565Substrate processing method and substrate processing apparatus
#566Plasma oxidation processing method, plasma processing apparatus and storage medium
#567Plasma oxidizing method, storage medium, and plasma processing apparatus
#568Method for forming silicon oxide film, plasma processing apparatus and storage medium
#569Method for forming silicon oxide film, plasma processing apparatus and storage medium
#570Pattern forming method and semiconductor device manufacturing method
#571Method to maximize nitrogen concentration at the top surface of gate dielectrics
#572Method of fabricating a gate dielectric for high-k metal gate devices
#573Method for fabricating a locally passivated germanium-on-insulator substrate
#574PLASMA OXIDIZING METHOD, PLASMA PROCESSING APPARATUS, AND STORAGE MEDIUM
#575METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#576Plasma oxidizing method, plasma processing apparatus, and storage medium
#577POST OXIDATION ANNEALING OF LOW TEMPERATURE THERMAL OR PLASMA BASED OXIDATION
#578Method to form ultra high quality silicon-containing compound layers
#579Method for nitriding substrate and method for forming insulating film
#580Plasma oxidation processing method
#581Method for manufacturing semiconductor device and substrate processing apparatus
#582Methods of Forming an Oxide Layer and Methods of Forming a Gate Using the Same
#583METHOD FOR FORMING INSULATING FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#584METHOD FOR PRODUCING SILICON OXIDE FILM, CONTROL PROGRAM THEREOF, RECORDING MEDIUM AND PLASMA PROCESSING APPARATUS
#585Methods for oxidation of a semiconductor device
#586Method for forming insulating film and method for manufacturing semiconductor device
#587Semiconductor device and method for manufacturing the same
#588Method for forming dielectric films
#589Substrate processing method and substrate processing apparatus
#590Tunnel insulating layer of flash memory device and method of forming the same
#591Substrate Treating Method
#592Protection of SiGe during etch and clean operations
#593METHOD OF FABRICATING FLASH MEMORY DEVICE
#594METHOD FOR FORMING RADICAL OXIDE LAYER AND METHOD FOR FORMING DUAL GATE OXIDE LAYER USING THE SAME
#595Method for fabricating gate dielectrics of metal-oxide-semiconductor transistors using rapid thermal processing
#596Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus
#597Method of Fabricating Flash Memory Device
#598Nonvolatile semiconductor memory element with silicon nitride charge trapping film having varying hydrogen concentration
#599PLASMA TREATMENT APPARATUS, AND SUBSTRATE HEATING MECHANISM TO BE USED IN THE APPARATUS
#600Plasma oxidation method and method for manufacturing semiconductor device