207046 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof; Forming layers; Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer post-treatment
Sub-classes:METHODS FOR FILLING RECESSED FEATURES ON A SUBSTRATE WITH A FLOWABLE LAYER STRUCTURE
#2FILM FORMING METHOD, ARTICLE MANUFACTURING METHOD, AND PATTERN FORMING APPARATUS
#3HEAT TREATMENT APPARATUS AND HEAT TREATMENT METHOD
#4INSULATED TURN-OFF DEVICE WITH REDUCED SENSITIVITY TO VARIATIONS IN TRENCH DEPTH
#5SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
#6SEMICONDUCTOR STRUCTURE
#7CONFORMAL DEPOSITION OF SILICON NITRIDE
#8DIAMOND-LIKE CARBON GAP FILL
#9SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
#10SEMICONDUCTOR DEVICE AND METHOD
#11SURFACE PROCESSING METHOD OF SEMICONDUCTOR WAFER
#12DOPED SILICON-CONTAINING MATERIALS WITH INCREASED ELECTRICAL, MECHANICAL, AND ETCH CHARACTERISTICS
#13Method of Conductive Material Deposition
#14SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE
#15SACRIFICIAL LAYER FOR SUBSTRATE ANALYSIS
#16METHODS AND SYSTEMS FOR FORMING MEMORY DEVICES AND COMPONENTS THEREOF
#17Methods of forming SOI substrates
#18Mechanism for finFET well doping
#19METHOD FOR CHUCK COMPENSATION VIA WAFER SHAPE CONTROL
#20EXPANDABLE DOPED OXIDE FILMS FOR ADVANCED SEMICONDUCTOR APPLICATIONS
#21Method for forming a semiconductor structure
#22METHODS OF FORMING NANOSTRUCTURES INCLUDING METAL OXIDES USING BLOCK COPOLYMER MATERIALS
#23METHODS AND SYSTEMS FOR FILLING A GAP
#24Semiconductor devices having dipole-inducing elements
#25METHODS TO ENABLE SEAMLESS HIGH QUALITY GAPFILL
#26Atomic Layer Deposition Of Metal Fluoride Films
#27SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD
#28Methods and apparatus for test pattern forming and film property measurement
#29SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND HOT PLATE
#30Semiconductor device and method
#31Molecular layer deposition method and system
#32Liquid crystal display device including transistor comprising oxide semiconductor
#33Mechanism for FinFET well doping
#34Semiconductor device and method
#35Layer stack for display applications
#36Method and device for decreasing generation of surface oxide of aluminum nitride
#37Film structure including hafnium oxide, electronic device including the same, and method of manufacturing the same
#38Self-assembled monolayers as sacrificial capping layers
#39Composition for forming coating film and method for manufacturing semiconductor device
#40Semiconductor device and method
#41Methods of forming SOI substrates
#42Apparatus and method for solvent vapour annealing of a block copolymer
#43Apparatus and methods for manufacturing semiconductor structures using protective barrier layer
#44Liquid crystal display device comprising an oxide semiconductor
#45Semiconductor device and manufacturing method thereof
#46Semiconductor film composition, method for manufacturing semiconductor film composition, method for manufacturing semiconductor member, method for manufacturing semiconductor processing material, and semiconductor device
#47Methods and apparatus for test pattern forming and film property measurement
#48Direct formation of hexagonal boron nitride on silicon based dielectrics
#49Direct formation of hexagonal boron nitride on silicon based dielectrics
#50Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
#51Crossbar reinforced semiconductor fins having reduced wiggling
#52Highly selective dry etch process for vertical FET STI recess
#53Semiconductor device and method
#54Fin structures
#55Selective deposition method for forming semiconductor structure
#56Methods to reduce gouging for core removal processes using thermal decomposition materials
#57Semiconductor device comprising oxide semiconductor
#58Mechanism for FinFET well doping
#59High temperature ultra-fast annealed soft mask for semiconductor devices
#60Substrate processing apparatus, method of manufacturing semiconductor device and non-transistory computer-readable recording medium
#61Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
#62Semiconductor device and manufacturing method thereof
#63Layer stack for display applications
#64SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#65Semiconductor structure and fabrication method thereof
#66Direct formation of hexagonal boron nitride on silicon based dielectrics
#67Methods of forming SOI substrates
#68Semiconductor device, method for manufacturing semiconductor device, inverter circuit, driving device, vehicle, and elevator
#69Low-temperature passivation of ferroelectric integrated circuits for enhanced polarization performance
#70Preparation of anti-reflection and passivation layers of silicon surface
#71Semiconductor structures with deep trench capacitor and methods of manufacture
#72Method of semiconductor device fabrication having application of material with cross-linkable component
#73Self-assembled nanostructures including metal oxides and semiconductor structures comprised thereof
#74Semiconductor film composition, method for manufacturing semiconductor film composition, method for manufacturing semiconductor member, method for manufacturing semiconductor processing material, and semiconductor device
#75Semiconductor film composition, method of manufacturing semiconductor film composition, method of manufacturing semiconductor member, method of manufacturing semiconductor processing material, and semiconductor device
#76Semiconductor memory device and manufacturing method thereof
#77Semiconductor device
#78DENSIFYING FILMS IN SEMICONDUCTOR DEVICE
#79Method of reforming insulating film deposited on substrate with recess pattern
#80Power electronics assemblies and vehicles incorporating the same
#81Fluid dispense methodology and apparatus for imprint lithography
#82Method of manufacturing semiconductor device and vacuum processing apparatus
#83Semiconductor device and method for manufacturing same
#84Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
#85Substrate treating method and apparatus used therefor
#86Design-aware pattern density control in directed self-assembly graphoepitaxy process
#87Composition and method of producing siliceous film
#88Semiconductor device and method for manufacturing the semiconductor device
#89Composition for forming silica layer, method for manufacturing silica layer, and electric device including silica layer
#90Fluid droplet methodology and apparatus for imprint lithography
#91Semiconductor device having high-κ dielectric layer and method for manufacturing the same
#92Orientation layer for directed self-assembly patterning process
#93Transistors having dielectric material containing non-hydrogenous ions and methods of their fabrication
#94Method for fully self-aligned via formation using a directed self assembly (DSA) process
#95Substrates support apparatus, substrate treating system including the same, and substrate treating method
#96Semiconductor device and manufacturing method of the same
#97Preventing oxidation defects in strain-relaxed fins by reducing local gap fill voids
#98Semiconductor lithography alignment feature with epitaxy blocker
#99Thermal processing device, substrate processing apparatus, thermal processing method and substrate processing method
#100Tensile strained high percentage silicon germanium alloy FinFETS
#101Method and structure for gap filling improvement
#102Monolayer film mediated precision film deposition
#103Design-aware pattern density control in directed self-assembly graphoepitaxy process
#104Method of densifying films in semiconductor device
#105Low-temperature polycrystalline silicon thin film transistor, and manufacturing method for fabricating the same, array substrate, display panel and display device
#106Articles including ultra low dielectric layers
#107Method for manufacturing laterally insulated-gate bipolar transistor
#108Method for forming organic film and method for manufacturing substrate for semiconductor apparatus
#109Spin on hard mask material
#110PEELING METHOD
#111Thin Film Device Fabrication Methods and Apparatus
#112Semiconductor device and manufacturing method of the same
#113DOPED GRAPHENE ELECTRODES AS INTERCONNECTS FOR FERROELECTRIC CAPACITORS
#114Semiconductor structures with deep trench capacitor and methods of manufacture
#115Methods of forming fine patterns
#116Method of manufacturing semiconductor device
#117Method of production of semiconductor device
#118METHOD OF FORMING A SEMICONDUCTOR DEVICE
#119Pattern forming method
#120Method of forming a polysilicon sidewall oxide region in a memory cell
#121Additions of organic species to facilitate crosslinker removal during PSPI cure
#122Bottom processing
#123Orientation layer for directed self-assembly patterning process
#124Graphene device and method of operating the same
#125Integrated circuit package
#126Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium
#127Tensile strained high percentage silicon germanium alloy FinFETs
#128Method of manufacturing an ultra low dielectric layer
#129Pattern forming method
#130Directed self-assembly using trench assisted chemoepitaxy
#131Methods of manufacturing semiconductor devices
#132Method of densifying films in semiconductor device
#133Methods of manufacturing semiconductor devices including isolation layers
#134Methods of forming different sized patterns
#135Template and pattern formation method
#136Semiconductor device and manufacturing method of the same
#137Method of manufacturing a semiconductor device
#138Semiconductor devices and methods of forming the same
#139Method of forming pattern and method of manufacturing integrated circuit device by using the same
#140Mechanism for FinFET well doping
#141Composition for forming passivation film, including resin having carbon-carbon multiple bond
#142Subtractive methods for creating dielectric isolation structures within open features
#143System and method for mitigating oxide growth in a gate dielectric
#144Methods of forming different sized patterns
#145Dielectric filling materials with ionic compounds
#146Method and structure to suppress finFET heating
#147Pattern forming method
#148Lithographic resist with floating protectant
#149Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same
#150Aspect ratio trapping and lattice engineering for III/V semiconductors
#151Methods of adjusting flatband voltage of a memory device
#152Methods of forming fin isolation regions on FinFET semiconductor devices using an oxidation-blocking layer of material and by performing a fin-trimming process
#153Methods of forming hardmask material film
#154Controlling the reflow behaviour of BPSG films and devices made thereof
#155Method for semiconductor device fabrication
#156SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRICATING THE SAME
#157Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and recording medium
#158Imprint apparatus and method of manufacturing article
#159FCVD line bending resolution by deposition modulation
#160Heat treatment apparatus, heat treatment method, and storage medium
#161Method for curing flowable layer
#162Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and non-transitory computer-readable recording medium
#163Aspect ratio trapping and lattice engineering for III/V semiconductors
#164Low-Temperature Passivation of Ferroelectric Integrated Circuits for Enhanced Polarization Performance
#165Semiconductor device and method for manufacturing the semiconductor device
#166Mechanism of forming a trench structure
#167METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#168Low temperature atomic layer deposition of oxides on compound semiconductors
#169Semiconductor device and manufacturing method of semiconductor device
#170Semiconductor Device Manufacturing Method
#171Self-assembled nanostructures including metal oxides and semiconductor structures comprised thereof
#172Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#173Crystalline strontium titanate and methods of forming the same
#174Method for repairing an oxide layer and method for manufacturing a semiconductor structure applying the same
#175Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#176Low temperature molecular layer deposition of SiCON
#177Porous film with high hardness and a low dielectric constant and preparation method thereof
#178Method for semiconductor device fabrication
#179Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process
#180Integrated circuits with an insultating layer and methods for producing such integrated circuits
#181Oxide shell formation on inorganic substrates via lithium polyoxoanion salt deposition
#182Semiconductor devices and fabrication method thereof
#183Uniform gate height for mixed-type non-planar semiconductor devices
#184Alkyl-alkoxysilacyclic compounds
#185Segmented graphene growth on surfaces of a patterned substrate layer and devices thereof
#186Group 5 metal oxo-alkoxo complex, method for producing same, and method for manufacturing group 5 metal oxide film
#187Substrate heat treatment apparatus and heat treatment method
#188Passivation structure of fin field effect transistor
#189Method for coating a workpiece
#190Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin
#191Deposition of boron and carbon containing materials
#192Dry-removable protective coatings
#193POWER SEMICONDUCTOR DEVICE,POWER ELECTRONIC MODULE, AND METHOD FOR PROCESSING A POWER SEMICONDUCTOR DEVICE
#194Growing graphene on substrates
#195Method for passivating surfaces, functionalizing inert surfaces, layers and devices including same
#196Method and structure for gap filling improvement
#197Method for Removing Micro Scratches In Chemical Mechanical Polishing Processes
#198Multi-plasma nitridation process for a gate dielectric
#199Mechanism for FinFET well doping
#200Multi-plasma nitridation process for a gate dielectric
#201Fin field effect transistor and method for forming the same
#202Method of fabricating semiconductor device
#203Two Step Deposition of High-k Gate Dielectric Materials
#204Semiconductor device and method of producing semiconductor device
#205Methods of fabricating memory devices having charged species
#206Semiconductor device and manufacturing method of the same
#207Method for preparing thin samples for TEM imaging
#208Layer deposition on III-V semiconductors
#209Semiconductor device and method of manufacturing the same
#210Method of manufacturing semiconductor device having oxide semiconductor layer
#211Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent
#212COMPOSITION FOR FORMING PASSIVATION FILM, INCLUDING RESIN HAVING CARBON-CARBON MULTIPLE BOND
#213Resin-sealed semiconductor device and method of manufacturing the same
#214Resin-sealed semiconductor device and method of manufacturing resin-sealed semiconductor device
#215Ion sensitive device and method of fabrication
#216SILICON-RICH ANTIREFLECTIVE COATING MATERIALS AND METHOD OF MAKING SAME
#217Substrate processing method, program, control apparatus, film forming apparatus, and substrate processing system
#218Method for manufacturing SOI wafer
#219Method of manufacturing semiconductor device and semiconductor device
#220Method of manufacturing semiconductor device, substrate processing apparatus, substrate processing system and non-transitory computer-readable recording medium
#221Unlocking layer and method
#222SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SUBSTRATE PROCESSING SYSTEM
#223Method for facilitating crack initiation during controlled substrate spalling
#224Self-adjusting gate hard mask
#225Semiconductor structure and process thereof
#226Method for preparing samples for imaging
#227Method of fabricating dielectric layer and shallow trench isolation
#228Methods for fabrication of an air gap-containing interconnect structure
#229Method for forming pattern and method for manufacturing semiconductor device
#230Method of manufacturing a semiconductor device including a dielectric structure
#231Method for forming conformal, homogeneous dielectric film by cyclic deposition and heat treatment
#232Flip-chip electronic device and production method thereof
#233Semiconductor device and method of manufacturing the same
#234DRAM cells and methods of forming silicon dioxide
#235Compound semiconductor device and method of manufacturing the same
#236Method for pore sealing of porous materials using polyimide langmuir-blodgett film
#237SPIN-ON DIELECTRIC METHOD WITH MULTI-STAGE RAMPING TEMPERATURE
#238Methods for preparing thin samples for TEM imaging
#239Modification of silicon layers formed from silane-containing formulations
#240Glass composition for protecting semiconductor junction, method of manufacturing semiconductor device and semiconductor device
#241C-rich carbon boron nitride dielectric films for use in electronic devices
#242Hafnium tantalum oxide dielectrics
#243Interconnect structures containing a photo-patternable low-k dielectric with a curved sidewall surface
#244Air gap-containing interconnect structure having photo-patternable low k material
#245Self-aligned permanent on-chip interconnect structure formed by pitch splitting
#246BOTTOM UP FILL IN HIGH ASPECT RATIO TRENCHES
#247Semiconductor device and method for manufacturing the semiconductor device
#248Structures and techniques for atomic layer deposition
#249Method for filling cavities in wafers, correspondingly filled blind hole and wafer having correspondingly filled insulation trenches
#250Self-aligned permanent on-chip interconnect structure formed by pitch splitting
#251Flatband voltage adjustment in a semiconductor device
#252Method for air gap interconnect integration using photo-patternable low k material
#253Structures and methods for air gap integration
#254Method of etching organosiloxane dielectric material and semiconductor device thereof
#255Method of Providing a Semiconductor Device With a Dielectric Layer and Semiconductor Device Thereof
#256Methods for fabrication of an air gap-containing interconnect structure
#257Method for producing ceramic passivation layers on silicon for solar cell manufacture
#258System and method for mitigating oxide growth in a gate dielectric
#259Methods for photo-patternable low-k (PPLK) integration with curing after pattern transfer
#260Process for producing oxide films
#261Printed dopant layers
#262Methods of forming a silicon oxide layer and methods of forming an isolation layer
#263Method of forming insulation layer of semiconductor device and method of forming semiconductor device using the insulation layer
#264Semiconductor device and method for manufacturing the semiconductor device
#265Hafnium tantalum oxide dielectrics
#266Semiconductor device and method for manufacturing the same
#267Electronic devices including barium strontium titanium oxide films
#268Method and apparatus for processing polysilazane film
#269Method of forming a stressed passivation film using a microwave-assisted oxidation process
#270Method of forming a stressed passivation film using a non-ionizing electromagnetic radiation-assisted oxidation process
#271METHOD FOR TREATING A DIELECTRIC FILM WITH INFRARED RADIATION
#272METHOD AND APPARATUS FOR TREATING A SEMI-CONDUCTOR SUBSTRATE
#273Method for fabricating non-volatile memory device with charge trapping layer
#274Method for forming device isolation structure of semiconductor device using annealing steps to anneal flowable insulation layer
#275High-dielectric film substrate processing method
#276Method of selectively forming a silicon nitride layer
#277Semiconductor devices and methods of manufacture thereof
#278Defect control in gate dielectrics
#279System and method for mitigating oxide growth in a gate dielectric
#280Atomic layer deposited barium strontium titanium oxide films
#281Printed dopant layers
#282Semiconductor devices having dielectric layers and methods of forming the same
#283Methods of fabricating ferroelectric devices
#284Method and apparatus for processing polysilazane film
#285Hafnium tantalum oxide dielectrics
#286Method and apparatus of fabricating semiconductor device
#287Process for producing oxide films
#288Multi-step annealing process
#289Method of manufacturing an insulating layer and method of manufacturing a semiconductor device using the insulating layer
#290IN-SITU ATOMIC LAYER DEPOSITION
#291Method of manufacturing semiconductor device
#292Method for manufacturing a semiconductor device
#293Atomic layer deposited hafnium tantalum oxide dielectrics
#294Forming a porous dielectric layer and structures formed thereby
#295Forming a porous dielectric layer and structures formed thereby
#296Using zeolites to improve the mechanical strength of low-k interlayer dielectrics
#297Forming gas anneal process for high dielectric constant gate dielectrics in a semiconductor fabrication process
#298Using polydentate ligands for sealing pores in low-k dielectrics
#299Materials with enhanced properties for shallow trench isolation/premetal dielectric applications
#300Semiconductor device and method for manufacturing the same