ClassID:

207180

H01L21/2053 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AB compounds with or without impurities, e.g. doping materials; Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition Expitaxial deposition of elements of Group IV of the Periodic System, e.g. Si, Ge

Recent Application in this class:
#1
20220384192
2022-12-01

EPITAXIAL GROWTH DEVICE

#2
20220359195
2022-11-10

METHODS FOR FORMING AN EPITAXIAL WAFER

#3
20220205137
2022-06-30

Crucible having an improved crystal growth base for manufacturing silicon carbide single crystal and method of use

#4
20220181156
2022-06-09

SiC EPITAXIAL SUBSTRATE MANUFACTURING METHOD AND MANUFACTURING DEVICE THEREFOR

#5
20220064818
2022-03-03

Method of manufacturing semiconductor element, semiconductor element, and substrate

#6
20220059350
2022-02-24

Source/drain structure for semiconductor device

#7
20220044934
2022-02-10

Method for manufacturing silicon carbide epitaxial substrate

#8
20210384032
2021-12-09

Diamond semiconductor system and method

#9
20200294794
2020-09-17

Method for depositing an epitaxial layer on a front side of a semiconductor wafer and device for carrying out the method

#10
20200266067
2020-08-20

Diamond semiconductor system and method

#11
20200158954
2020-05-21

Integrated photonics including waveguiding material

#12
20200135583
2020-04-30

Transistor structure with multiple halo implants having epitaxial layer over semiconductor-on-insulator substrate

#13
20200102667
2020-04-02

Crystal laminate structure

#14
20200026003
2020-01-23

Integrated photonics including germanium

#15
20190242014
2019-08-08

Silicon carbide epitaxial substrate and method for manufacturing silicon carbide semiconductor device

#16
20190115217
2019-04-18

Manufacturing method for a semiconductor device including a polysilicon resistor

#17
20190025513
2019-01-24

Integrated photonics including germanium

#18
20180346494
2018-12-06

Chlorosilylarylgermanes, method for preparation thereof and use thereof

#19
20180237942
2018-08-23

Method for manufacturing silicon carbide epitaxial substrate, method for manufacturing silicon carbide semiconductor device, and apparatus for manufacturing silicon carbide epitaxial substrate

#20
20180226352
2018-08-09

Method to reduce variability in contact resistance

#21
20180090323
2018-03-29

Substrate processing apparatus

#22
20180083104
2018-03-22

Method of doped germanium formation

#23
20180073164
2018-03-15

Crystal laminate structure

#24
20180053653
2018-02-22

Gas flow control for EPI thickness uniformity improvement

#25
20180016706
2018-01-18

SiC epitaxial wafer and method for manufacturing SiC epitaxial wafer

#26
20170352785
2017-12-07

Light emitting device, light emitting device package, light unit, and method of manufacturing same

#27
20170236713
2017-08-17

Diamond semiconductor system and method

#28
20170004962
2017-01-05

Method of fabricating double sided Si(Ge)/Sapphire/III-nitride hybrid structure

#29
20160347604
2016-12-01

Method for manufacturing resistive element, method for manufacturing pressure sensor element, pressure sensor element, pressure sensor, altimeter, electronic apparatus, and moving object

#30
20160223749
2016-08-04

Integrated photonics including waveguiding material

#31
20160211181
2016-07-21

Transistor structure and fabrication methods with an epitaxial layer over multiple halo implants

#32
20160197111
2016-07-07

Integrated photonics including germanium

#33
20160163648
2016-06-09

Method for forming an electrical contact

#34
20150214117
2015-07-30

FinFET structures having silicon germanium and silicon channels

#35
20140024204
2014-01-23

Method for selective growth of highly doped group IV—Sn semiconductor materials

#36
20130175546
2013-07-11

Diamond Semiconductor System and Method

#37
15425162
2017-12-05

Method to reduce variability in contact resistance

#38
15068068
2017-06-27

Fin-type resistor