Patents-Review.com
ClassID:

207179 ⎘

H01L21/205 - CPC Classification

Classification description:

Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AB compounds with or without impurities, e.g. doping materials; Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy using reduction or decomposition of a gaseous compound yielding a solid condensate, i.e. chemical deposition

Sub-classes:
Recent Application in this class:
#1
20230227998
2023-07-20

METHOD FOR ADJUSTING THERMAL FIELD OF SILICON CARBIDE SINGLE CRYSTAL GROWTH

 #2
20230060609
2023-03-02

WAFER CARRIER ASSEMBLY WITH PEDESTAL AND COVER RESTRAINT ARRANGEMENTS THAT CONTROL THERMAL GAPS

 #3
20220396875
2022-12-15

Showerhead and substrate processing apparatus

 #4
20220328723
2022-10-13

AlN MONOCRYSTAL PLATE

 #5
20220319851
2022-10-06

Method for setting a nitrogen concentration of a silicon epitaxial film in manufacturing an epitaxial silicon wafer

 #6
20220290299
2022-09-15

Vapor delivery device, methods of manufacture and methods of use thereof

 #7
20220267928
2022-08-25

Methods and compositions for RNA-directed target DNA modification and for RNA-directed modulation of transcription

 #8
20220243329
2022-08-04

Processing apparatus and processing method

 #9
20220195594
2022-06-23

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #10
20220148889
2022-05-12

System for coating a substrate

 #11
20220119951
2022-04-21

Substrate processing apparatus, method of processing substrate, method of manufacturing semiconductor device and recording medium

 #12
20220093447
2022-03-24

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

 #13
20220093388
2022-03-24

Method and apparatus for selective film formation in semiconductor substrate processing

 #14
20220005696
2022-01-06

SiC EPITAXIAL GROWTH APPARATUS

 #15
20220004209
2022-01-06

Flow control system, method, and apparatus

 #16
20210358755
2021-11-18

Semiconductor epitaxial wafer and method of producing semiconductor epitaxial wafer, and method of producing solid-state imaging device

 #17
20210310154
2021-10-07

Vapor phase epitaxial growth device

 #18
20210301422
2021-09-30

SiC composite substrate including biaxially oreinted SiC layer and semiconductor device

 #19
20210225646
2021-07-22

Silicon carbide epitaxial substrate and method of manufacturing silicon carbide semiconductor device

 #20
20210222205
2021-07-22

Methods and compositions for RNA-directed target DNA modification and for RNA-directed modulation of transcription

 #21
20210172061
2021-06-10

Method for producing GaN crystal

 #22
20210151314
2021-05-20

METHOD FOR MANUFACTURING GROUP III NITRIDE SEMICONDUCTOR SUBSTRATE

 #23
20210098250
2021-04-01

Substrate processing apparatus

 #24
20210004027
2021-01-07

Flow control system, method, and apparatus

 #25
20200407851
2020-12-31

Substrate processing apparatus and method of manufacturing semiconductor device

 #26
20200365693
2020-11-19

Silicon carbide epitaxial substrate having grooves extending along main surface and method of manufacturing silicon carbide semiconductor device

 #27
20200312656
2020-10-01

Epitaxial silicon carbide single crystal wafer and process for producing the same

 #28
20200299837
2020-09-24

Vapor delivery device, methods of manufacture and methods of use thereof

 #29
20200270767
2020-08-27

Vapor phase epitaxial growth device

 #30
20200270766
2020-08-27

Silicon carbide epitaxial substrate and silicon carbide semiconductor device

 #31
20200224776
2020-07-16

Valve device, flow control method using the same, and semiconductor manufacturing method

 #32
20200212178
2020-07-02

Nanorod production method and nanorod produced thereby

 #33
20200208297
2020-07-02

Nitride crystal substrate, semiconductor laminate, method of manufacturing semiconductor laminate and method of manufacturing semiconductor device

 #34
20200199745
2020-06-25

SiC chemical vapor deposition apparatus

 #35
20200152457
2020-05-14

Semiconductor stack

 #36
20200135460
2020-04-30

SINGLE CRYSTAL SILICON PRODUCTION METHOD, EPITAXIAL SILICON WAFER PRODUCTION METHOD, SINGLE CRYSTAL SILICON, AND EPITAXIAL SILICON WAFER

 #37
20200126796
2020-04-23

Semiconductor epitaxial wafer and method of producing semiconductor epitaxial wafer, and method of producing solid-state imaging device

 #38
20200115801
2020-04-16

Source gas supply apparatus, film forming apparatus, and source gas supply method

 #39
20200102667
2020-04-02

Crystal laminate structure

 #40
20200098567
2020-03-26

Optical semiconductor element and method of manufacturing the same

 #41
20200080113
2020-03-12

Methods and compositions for RNA-directed target DNA modification and for RNA-directed modulation of transcription

 #42
20200052074
2020-02-13

Silicon carbide epitaxial substrate having grooves extending along main surface and method of manufacturing silicon carbide semiconductor device

 #43
20200051817
2020-02-13

EPITAXIAL SILICON WAFER AND METHOD FOR MANUFACTURING EPITAXIAL SILICON WAFER

 #44
20200035507
2020-01-30

Method of depositing tungsten

 #45
20200013907
2020-01-09

Silicon carbide substrate, method for manufacturing silicon carbide substrate, and method for manufacturing silicon carbide semiconductor device

 #46
20200006066
2020-01-02

Silicon carbide stacked substrate and manufacturing method thereof

 #47
20190382892
2019-12-19

Substrate processing apparatus

 #48
20190360119
2019-11-28

Group 13 (III) nitride thick layer formed on an underlying layer having high and low carrier concentration regions with different defect densities

 #49
20190341247
2019-11-07

Semiconductor stack

 #50
20190296136
2019-09-26

Semiconductor wafer

 #51
20190287799
2019-09-19

Apparatus for manufacturing group III nitride single crystal, method for manufacturing group III nitride single crystal using the apparatus, and aluminum nitride single crystal

 #52
20190284697
2019-09-19

Deposition apparatus and deposition method

 #53
20190280156
2019-09-12

Nitride semiconductor substrate, manufacturing method therefor, and semiconductor device

 #54
20190245044
2019-08-08

Silicon carbide epitaxial substrate and method for manufacturing a silicon carbide semiconductor device

 #55
20190243393
2019-08-08

Flow control system, method, and apparatus

 #56
20190242029
2019-08-08

Group 13 nitride layer, composite substrate, and functional element

 #57
20190229237
2019-07-25

Group III nitride stacked body, and semiconductor device having the stacked body

 #58
20190228972
2019-07-25

Manufacturing method of nitride semiconductor ultraviolet light emitting element, and nitride semiconductor ultraviolet light emitting element

 #59
20190226118
2019-07-25

Silicon carbide epitaxial substrate and silicon carbide semiconductor device

 #60
20190206686
2019-07-04

COMPONENT FOR FABRICATING SIC SEMICONDUCTOR, HAVING PLURALITY OF LAYERS HAVING DIFFERENT TRANSMITTANCES, AND METHOD FOR MANUFACTURING SAME

 #61
20190206685
2019-07-04

Vapor phase growth apparatus, method of manufacturing epitaxial wafer, and attachment for vapor phase growth apparatus

 #62
20190198742
2019-06-27

Thermoelectric material, thermoelectric element, optical sensor, and method of manufacturing thermoelectric material

 #63
20190189808
2019-06-20

Semiconductor device and method for manufacturing the same

 #64
20190189442
2019-06-20

Method of manufacturing epitaxial silicon wafer, epitaxial silicon wafer, and method of manufacturing solid-state image sensing device

 #65
20190181007
2019-06-13

Epitaxial silicon wafer, and method for manufacturing epitaxial silicon wafer

 #66
20190181003
2019-06-13

Dielectric gap-fill material deposition

 #67
20190153602
2019-05-23

Substrate processing apparatus, substrate processing method, and storage medium

 #68
20190148594
2019-05-16

Semiconductor optical device

 #69
20190148247
2019-05-16

Nitride semiconductor laminate, method for manufacturing nitride semiconductor laminate, method for manufacturing semiconductor laminate, and method for inspecting semiconductor laminate

 #70
20190145021
2019-05-16

Silicon carbide epitaxial substrate and silicon carbide semiconductor device

 #71
20190134586
2019-05-09

Precursor supply system and precursors supply method

 #72
20190134545
2019-05-09

Reheating collection device for gas phase process

 #73
20190112705
2019-04-18

Cleaning method of semiconductor manufacturing device

 #74
20190093255
2019-03-28

Method for producing aluminum nitride single crystal substrate

 #75
20190088477
2019-03-21

Semiconductor stack

 #76
20190071773
2019-03-07

Film forming apparatus

 #77
20190067523
2019-02-28

Vertical-type ultraviolet light-emitting diode

 #78
20190051724
2019-02-14

Nanorod production method and nanorod produced thereby

 #79
20190040546
2019-02-07

Epitaxial substrate

 #80
20190040545
2019-02-07

Silicon carbide epitaxial substrate and silicon carbide semiconductor device

 #81
20190035894
2019-01-31

Semiconductor substrate made of silicon carbide and method for manufacturing same

 #82
20190031515
2019-01-31

Single-crystal diamond, method for manufacturing single-crystal diamond, and chemical vapor deposition device used in same

 #83
20190027362
2019-01-24

Pre-treatment approach to improve continuity of ultra-thin amorphous silicon film on silicon oxide

 #84
20190010605
2019-01-10

Method for producing GaN crystal

 #85
20190006555
2019-01-03

Nitride semiconductor light-emitting element

 #86
20180374721
2018-12-27

Film forming apparatus

 #87
20180371640
2018-12-27

Wafer supporting mechanism, chemical vapor deposition apparatus, and epitaxial wafer manufacturing method

 #88
20180363138
2018-12-20

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

 #89
20180315823
2018-11-01

Semiconductor device and method for manufacturing the same

 #90
20180309020
2018-10-25

Semiconductor light-emitting device and method of manufacturing semiconductor light-emitting device

 #91
20180277635
2018-09-27

Silicon carbide epitaxial substrate having a silicon carbide layer and method of manufacturing silicon carbide semiconductor device

 #92
20180274128
2018-09-27

Group 13 (III) nitride thick layer formed on an underlying layer having high and low carrier concentration regions with different defect densities

 #93
20180274092
2018-09-27

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #94
20180274090
2018-09-27

METHOD AND APPARATUS FOR COATING INNER SURFACE

 #95
20180274088
2018-09-27

Method for manufacturing nitride semiconductor substrate

 #96
20180266012
2018-09-20

Epitaxial growth method for silicon carbide

 #97
20180247817
2018-08-30

Epitaxial substrate for semiconductor elements, semiconductor element, and manufacturing method for epitaxial substrates for semiconductor elements

 #98
20180247810
2018-08-30

Epitaxial substrate for semiconductor elements, semiconductor element, and manufacturing method for epitaxial substrates for semiconductor elements

 #99
20180247809
2018-08-30

Epitaxial substrate for semiconductor elements, semiconductor element, and manufacturing method for epitaxial substrates for semiconductor elements

 #100
20180218905
2018-08-02

APPLYING EQUALIZED PLASMA COUPLING DESIGN FOR MURA FREE SUSCEPTOR

 #101
20180190866
2018-07-05

Semiconductor optical device

 #102
20180179625
2018-06-28

Film forming apparatus, film forming method and heat insulating member

 #103
20180166271
2018-06-14

Method for manufacturing group III-V nitride semiconductor epitaxial wafer

 #104
20180158710
2018-06-07

High-tech temperature control device for semiconductor manufacturing facility

 #105
20180138039
2018-05-17

Method of fabricating black phosphorus ultrathin film and black phosphorus ultrathin film thereof

 #106
20180135166
2018-05-17

Epitaxial growth device, production method for epitaxial wafer, and lift pin for epitaxial growth device

 #107
20180122638
2018-05-03

SUBSTRATE PROCESSING APPARATUS

 #108
20180100235
2018-04-12

Susceptor and epitaxial growth device

 #109
20180097191
2018-04-05

Method for manufacturing a graphene thin-film transistor

 #110
20180090323
2018-03-29

Substrate processing apparatus

 #111
20180090322
2018-03-29

Substrate processing apparatus

 #112
20180087152
2018-03-29

Substrate processing apparatus, nozzle base, and manufacturing method for semiconductor device

 #113
20180071702
2018-03-15

Vaporization supply apparatus

 #114
20180068832
2018-03-08

Film deposition apparatus and method for cleaning film deposition apparatus

 #115
20180053683
2018-02-22

Lift pin and method for manufacturing same

 #116
20180053647
2018-02-22

Composite semiconductor substrate

 #117
20180038011
2018-02-08

Alumina substrate

 #118
20180033858
2018-02-01

Thin film transistor and method for manufacturing the same

 #119
20180030594
2018-02-01

High-frequency wave supplying structure

 #120
20180026131
2018-01-25

Semiconductor device and production method therefor

 #121
20180019125
2018-01-18

Method of manufacturing semiconductor device

 #122
20180016706
2018-01-18

SiC epitaxial wafer and method for manufacturing SiC epitaxial wafer

 #123
20180010246
2018-01-11

Nitride semiconductor template, manufacturing method thereof, and epitaxial wafer

 #124
20180004235
2018-01-04

Flow control system, method, and apparatus

 #125
20180003178
2018-01-04

Vacuum exhaust system and channel-switching valve used in this vacuum exhaust system

 #126
20170372902
2017-12-28

CRYSTAL PRODUCTION SYSTEMS AND METHODS

 #127
20170365463
2017-12-21

Epitaxial silicon carbide single crystal wafer and process for producing the same

 #128
20170356088
2017-12-14

Method of manufacturing an epitaxial wafer comprising measuring a level difference between a front surface of a susceptor and an upper surface of a lift pin and adjusting a ratio of the heat source output

 #129
20170345658
2017-11-30

Method for manufacturing SiC epitaxial wafer by simultaneously utilizing an N-based gas and a CI-based gas, and SiC epitaxial growth apparatus

 #130
20170345647
2017-11-30

Substrate processing method

 #131
20170342553
2017-11-30

Selective deposition with surface treatment

 #132
20170330745
2017-11-16

Apparatus for manufacturing group III nitride single crystal, method for manufacturing group III nitride single crystal using the apparatus, and aluminum nitride single crystal

 #133
20170321346
2017-11-09

Film-forming apparatus

 #134
20170316919
2017-11-02

Plasma processing method and plasma processing apparatus

 #135
20170315051
2017-11-02

Optical gas concentration measuring method by forming a differential signal using lights with different absorbabilities to a raw material in a gas flow path using a time-sharing method

 #136
20170292188
2017-10-12

Substrate processing apparatus

 #137
20170211204
2017-07-27

Alumina substrate

 #138
20170204860
2017-07-20

Dry pump and exhaust gas treatment method

 #139
20170200622
2017-07-13

Vacuum evacuation system

 #140
20170162425
2017-06-08

Susceptor and method for manufacturing same

 #141
20170159208
2017-06-08

Method for producing epitaxial silicon carbide wafers

 #142
20170145590
2017-05-25

Semiconductor substrate, epitaxial wafer, and method for manufacturing epitaxial wafer

 #143
20170076956
2017-03-16

Plasma processing method and plasma processing apparatus

 #144
20170040229
2017-02-09

Semiconductor device manufacturing method

 #145
20160265138
2016-09-15

Template for epitaxial growth, method for producing the same, and nitride semiconductor device

 #146
20150228476
2015-08-13

Batch-type remote plasma processing apparatus

 #147
20150152991
2015-06-04

Mechanisms for supplying process gas into wafer process apparatus

 #148
20140015028
2014-01-16

Microelectronic memory devices having flat stopper layers

 #149
20130330930
2013-12-12

Substrate processing apparatus, method for manufacturing substrate, and method for manufacturing semiconductor device

 #150
20130122692
2013-05-16

Semiconductor device manufacturing method and substrate manufacturing method of forming silicon carbide films on the substrate

 #151
20130072002
2013-03-21

Batch-type remote plasma processing apparatus

 #152
20120037970
2012-02-16

Methods of fabricating microelectronic memory devices having flat stopper layers

 #153
20100297832
2010-11-25

SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE MANUFACTURING METHOD

 #154
20100289060
2010-11-18

Method of fabricating free-form, high-aspect ratio components for high-current, high-speed microelectronics

 #155
20090159440
2009-06-25

Batch-type remote plasma processing apparatus

 #156
20090133630
2009-05-28

Batch-type remote plasma processing apparatus

 #157
20080093215
2008-04-24

Batch-Type Remote Plasma Processing Apparatus

 #158
20080066681
2008-03-20

Batch-type remote plasma processing apparatus

 #159
20080060580
2008-03-13

Batch-Type Remote Plasma Processing Apparatus

 #160
20070246355
2007-10-25

Batch-type remote plasma processing apparatus