207547 ⎘
Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof; Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof; Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
SOI device with contact trenches formed during epitaxial growing
#3302Semiconductor device including a capacitance
#3303Backside contacts for MOS devices
#3304Protect diodes for hybrid-orientation substrate structures
#3305Device having dual etch stop liner and protective layer
#3306Method of fabricating heterojunction photodiodes with CMOS
#3307SEMICONDUCTOR DEVICE AND A METHOD OF MANUFACTURING THE SAME
#3308SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
#3309Nonvolatile semiconductor memory device
#3310MULTIPLE DIELECTRIC FINFET STRUCTURE AND METHOD
#3311Semiconductor memory device and method of manufacturing the same
#3312Method for producing SiGebased zones with different contents in Ge on a same substrate by condensation of germanium
#3313Bipolar transistor, BiCMOS device, and method for fabricating thereof
#3314Three dimensional integrated circuit and method of design
#3315Memory array having a programmable word length, and method of operating same
#3316Semiconductor device and IC label, IC tag, and IC card having the same
#3317Apparatus and method for controlled particle beam manufacturing
#3318Semiconductor memory device and method of manufacturing the same
#3319Curled semiconductor transistor
#3320Method for producing SiGebased zones with different contents in Ge on a same substrate by condensation of germanium
#3321Semiconductor device and manufacturing method of the same
#3322Apparatus and method for controlled particle beam manufacturing
#3323Apparatus and method for controlled particle beam manufacturing
#3324Apparatus and method for controlled particle beam manufacturing
#3325Dual surface SOI by lateral epitaxial overgrowth
#3326Trench liner for DSO integration
#3327Engineering strain in thick strained-SOI substrates
#3328Semiconductor device and manufacturing method thereof
#3329Semiconductor device
#3330Semiconductor integrated circuit devices having high-Q wafer back-side capacitors
#3331CMOS structure and method for fabrication thereof using multiple crystallographic orientations and gate materials
#3332STRUCTURE AND METHOD FOR IMPLEMENTING OXIDE LEAKAGE BASED VOLTAGE DIVIDER NETWORK FOR INTEGRATED CIRCUIT DEVICES
#3333Asymmetric channel doping for improved memory operation for floating body cell (FBC) memory
#3334Nonvolatile semiconductor memory device
#3335Integrated Circuit with a Transistor Structure Element
#3336Apparatus and method for controlled particle beam manufacturing
#3337Apparatus and method for controlled particle beam manufacturing
#3338Apparatus and method for controlled particle beam manufacturing
#3339Semiconductor device and method of manufacturing same
#3340Reliable Contacts
#3341Electronic devices including a semiconductor layer
#3342Strained HOT (hybrid orientation technology) MOSFETs
#3343Structure and method of fabricating a hybrid substrate for high-performance hybrid-orientation silicon-on-insulator CMOS devices
#3344Dual wired integrated circuit chips
#3345Silicon-on-insulator structures
#3346Semiconductor-on-insulator SRAM configured using partially-depleted and fully-depleted transistors
#3347Semiconductor memory device
#3348Semiconductor device having a frontside contact and vertical trench isolation and method of fabricating same
#3349Transistors having v-shape source/drain metal contacts
#3350Selective uniaxial stress relaxation by layout optimization in strained silicon on insulator integrated circuit
#3351Semiconductor device and method of manufacturing the same
#3352SOI SUBSTRATE AND SEMICONDUCTOR INTEGRATED CIRUIT DEVICE
#3353Semiconductor device and method for manufacturing semiconductor device
#3354Strained silicon directly-on-insulator substrate with hybrid crystalline orientation and different stress levels
#3355Electrostatic discharge protection device and method of fabricating same
#3356Method of forming transistor structure having stressed regions of opposite types
#3357Methods and apparatus for implementing bit-by-bit erase of a flash memory device
#3358Semiconductor device
#3359Ion implantation combined with in situ or ex situ heat treatment for improved field effect transistors
#3360Integrated circuit chip with FETs having mixed body thickness and method of manufacture thereof
#3361Semiconductor memory device including an SOI substrate
#3362SEMICONDUCTOR-ON-INSULATOR (SOI) SUBSTRATES AND SEMICONDUCTOR DEVICES USING VOID SPACES
#3363Body-tied MOSFET device with strained active area
#3364Wireless chip
#3365Semiconductor Device and Method for Manufacturing the Same
#3366Semiconductor integrated circuit, manufacturing method thereof, and semiconductor device using semiconductor integrated circuit
#3367Semiconductor device having stressed etch stop layers of different intrinsic stress in combination with PN junctions of different design in different device regions
#3368Method of manufacturing a semiconductor integrated circuit and semiconductor integrated circuit
#3369Structure and method for implementing oxide leakage based voltage divider network for integrated circuit devices
#3370Semiconductor device with Cu metal-base and manufacturing method thereof
#3371Hybrid orientation SOI substrates, and method for forming the same
#3372Semiconductor device including a current mirror circuit
#3373Semiconductor element, semiconductor device and methods for manufacturing thereof
#3374SOI transistor having a reduced body potential and a method of forming the same
#3375SOI transistor having an embedded strain layer and a reduced floating body effect and a method for forming the same
#3376Semiconductor device and method for manufacturing the same
#3377Patterning sub-lithographic features with variable widths
#3378Method for fabricating a semiconductor component including a high capacitance per unit area capacitor
#3379Process of forming an electronic device including a layer formed using an inductively coupled plasma
#3380Method of forming silicon-on-insulator wafer having reentrant shape dielectric trenches
#3381CONDUCTIVE SPACERS FOR SEMICONDUCTOR DEVICES AND METHODS OF FORMING
#3382Electronic device including a semiconductor layer and a sidewall spacer and a process of forming the same
#3383Dynamic memory cell structures
#3384Method of making strained semiconductor transistors having lattice-mismatched semiconductor regions underlying source and drain regions
#3385Method of making a multi-gate device
#3386Process of forming an electronic device including a semiconductor layer and another layer adjacent to an opening within the semiconductor layer
#3387Semiconductor device formed on a SOI substrate
#3388Fabrication of active areas of different natures directly onto an insulator: application to the single or double gate MOS transistor
#3389Semiconductor device having a schottky source/drain transistor
#3390Semiconductor memory and read method of the same
#3391Field-effect-transistor multiplexing/demultiplexing architectures
#3392High density memory array having increased channel widths
#3393Nonvolatile semiconductor memory device
#3394Trench-edge-defect-free recrystallization by edge-angle-optimized solid phase epitaxy: method and applications to hybrid orientation substrates
#3395Method of making a multiple crystal orientation semiconductor device
#3396Process of forming an electronic device including a seed layer and a semiconductor layer selectively formed over the seed layer
#3397Semiconductor device structure
#3398Integrated circuit chip with FETs having mixed body thicknesses and method of manufacture thereof
#3399Self-aligned body contact for a semiconductor-on-insulator trench device and method of fabricating same
#3400Silicon device on Si:C SOI and SiGe and method of manufacture
#3401Method for fabricating a semiconductor device
#3402Semiconductor memory device having a floating storage bulk region capable of holding/emitting excessive majority carriers
#3403Shallow trench isolation fill by liquid phase deposition of SiO
#3404Semiconductor memory device for storing data as state of majority carriers accumulated in channel body and method of manufacturing the same
#3405Semiconductor device
#3406SEMICONDUCTOR DEVICE
#3407Structure and method of integrating compound and elemental semiconductors for high-performance CMOS
#3408Technique for providing stress sources in transistors in close proximity to a channel region by recessing drain and source regions
#3409Protection against charging damage in hybrid orientation transistors
#3410Silicon device on Si:C-OI and SGOI and method of manufacture
#3411Semiconductor storage device having an SOI structure
#3412Semiconductor device with increased channel area and fabrication method thereof
#3413Nonvolatile semiconductor storage device with floating gate electrode and control gate electrode
#3414Nonvolatile semiconductor memory device
#3415Method and manufacturing low leakage MOSFETs and FinFETs
#3416Nonvolatile semiconductor memory device and manufacturing method thereof
#3417Heterojunction device comprising a semiconductor and a resistivity-switching oxide or nitride
#3418Method for manufacturing semiconductor device comprising SOI transistors and bulk transistors
#3419HYBRID INTEGRATED CIRCUIT DEVICE AND METHOD OF MANUFACTURING THE SAME
#3420Castellated gate MOSFET device capable of fully-depleted operation
#3421Semiconductor device with increased channel area and decreased leakage current
#3422Grounding front-end-of-line structures on a SOI substrate
#3423Nonvolatile semiconductor memory device
#3424Process of forming an electronic device including a semiconductor island over an insulating layer
#3425Selective silicon deposition for planarized dual surface orientation integration
#3426Silicon deposition over dual surface orientation substrates to promote uniform polishing
#3427Fully-depleted castellated gate MOSFET device and method of manufacture thereof
#3428Integration of strained Ge into advanced CMOS technology
#3429Interlayer dielectric under stress for an integrated circuit
#3430Method of manufacturing semiconductor device
#3431Semiconductor constructions, and methods of forming semiconductor constructions
#3432Methods of forming single crystalline layers and methods of manufacturing semiconductor devices having such layers
#3433SOI substrates and SOI devices, and methods for forming the same
#3434Integrated Circuit Chip With Electrostatic Discharge Protection Device
#3435Integrated passive device substrates
#3436Stacked non-volatile memory with silicon carbide-based amorphous silicon thin film transistors
#3437Semiconductor device and method for manufacturing the same
#3438SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#3439Integrated circuit with bulk and SOI devices connected with an epitaxial region
#3440Multiple-gate device with floating back gate
#3441Method of assessing potential for charging damage in integrated circuit designs and structures for preventing charging damage
#3442Dynamic random access memory
#3443SEMICONDUCTOR MEMORY DEVICE
#3444Process for forming an electronic device including semiconductor layers having different stresses
#3445Method for manufacturing CMOS circuits
#3446Lateral bipolar transistor
#3447Programmable anti-fuse structures, methods for fabricating programmable anti-fuse structures, and methods of programming anti-fuse structures
#3448CMOS device on hybrid orientation substrate comprising equal mobility for perpendicular devices of each type
#3449Method for separately optimizing spacer width for two transistor groups using a recess spacer etch (RSE) integration
#3450FinFET body contact structure
#3451Method for separately optimizing spacer width for two or more transistor classes using a recess spacer integration
#3452Dual stressed SOI substrates
#3453Method of fabricating a body capacitor for SOI memory
#3454Multi-orientation semiconductor-on-insulator (SOI) substrate, and method of fabricating same
#3455Embedded substrate interconnect for underside contact to source and drain regions
#3456Method for manufacturing semiconductor device
#3457Pseudomorphic Si/SiGe/Si body device with embedded SiGe source/drain
#3458Phosphorous doping methods of manufacturing field effect transistors having multiple stacked channels
#3459Poly filled substrate contact on SOI structure
#3460Thin film transistor circuit and display utilizing the same
#3461Semiconductor device having a first circuit block isolating a plurality of circuit blocks
#3462Eeprom memory cell for high temperatures
#3463CMOS structure and method including multiple crystallographic planes
#3464Method to selectively form regions having differing properties and structure
#3465ENHANCED SILICON-ON-INSULATOR (SOI) TRANSISTORS AND METHODS OF MAKING ENHANCED SOI TRANSISTORS
#3466Strained silicon-on-insulator transistors with mesa isolation
#3467Ultra-thin logic and backgated ultra-thin SRAM
#3468Integrated circuit device and electronic instrument
#3469NAND-type semiconductor storage device and method for manufacturing same
#3470Semiconductor memory device and manufacturing method thereof
#3471Method for double-sided processing of thin film transistors
#3472Opto-thermal mask including aligned thermal dissipative layer, reflective layer and transparent capping layer
#3473Manufacturing method of memory element, laser irradiation apparatus, and laser irradiation method
#3474Method and process intermediate for electrostatic discharge protection in flat panel imaging detectors
#3475Semiconductor device and manufacturing method thereof
#3476Semiconductor device and manufacturing method thereof
#3477Semiconductor device and manufacturing method for the same
#3478Semiconductor memory device and method for fabricating the same
#3479Semiconductor device and method for fabricating the same
#3480Method for fabricating semiconductor device
#3481Method of manufacturing semiconductor substrate, method of manufacturing semiconductor device, and semiconductor device
#3482Electrostatic discharge protection device and method of fabricating same
#3483Semiconductor device and method of manufacturing the semiconductor device
#3484STRUCTURE AND METHOD FOR MANUFACTURING PLANAR STRAINED Si/SiGe SUBSTRATE WITH MULTIPLE ORIENTATIONS AND DIFFERENT STRESS LEVELS
#3485NROM flash memory devices on ultrathin silicon
#3486Nonvolatile ferroelectric memory device
#3487Nonvolatile ferroelectric memory device
#3488Nanoparticles and method for making the same
#3489Buried silicon dioxide / silicon nitride bi-layer insulators and methods of fabricating the same
#3490Method for fabricating semiconductor vertical NROM memory cells
#3491Memory device and fabrication method thereof
#3492Device fabrication by anisotropic wet etch
#3493Strained Si on multiple materials for bulk or SOI substrates
#3494Inductors fabricated from spiral nanocoils and fabricated using noncoil spiral pitch control techniques
#3495Semiconductor device and method of fabricating the same
#3496Structure and method for MOSFET gate electrode landing pad
#3497Semiconductor device and manufacturing method thereof
#3498Semiconductor device and method for manufacturing the same
#3499Semiconductor memory device and method of operating same
#3500Methods of manufacturing a three-dimensional semiconductor device and semiconductor devices fabricated thereby
#3501Methods of applying substrate bias to SOI CMOS circuits
#3502Semiconductor device having SOI substrate
#3503Thin silicon single diffusion field effect transistor for enhanced drive performance with stress film liners
#3504Semiconductor device with cells each having a trench capacitor and a switching transistor thereon
#3505Semiconductor device having SOI structure
#3506D/A conversion circuit and semiconductor device
#3507Technique for forming an isolation trench as a stress source for strain engineering
#3508Method for cutting liquid crystal display panel and method for fabricating liquid crystal display panel using the same
#3509Fully depleted silicon on insulator semiconductor devices
#3510Semiconductor device and manufacturing method of semiconductor device
#3511Manufacturing method of semiconductor device
#3512Mixed orientation semiconductor device and method
#3513SEMICONDUCTOR DEVICE AND METHOD FOR REGIONAL STRESS CONTROL
#3514Integrated semiconductor device and method of manufacturing thereof
#3515Independently controlled, double gate nanowire memory cell with self-aligned contacts
#3516Metal gate CMOS with at least a single gate metal and dual gate dielectrics
#3517Semiconductor device
#3518Silicon-on-insulator chip having multiple crystal orientations
#3519Semiconductor device and manufacturing method thereof
#3520Epitaxial imprinting
#3521Laser processing apparatus and laser processing process
#3522Radiation hardened isolation structures and fabrication methods
#3523Integrated circuits and methods of forming a field effect transistor
#3524Semiconductor device and method of manufacturing the same
#3525Semiconductor device
#3526Plasma etching method
#3527Back-gated semiconductor device with a storage layer and methods for forming thereof
#3528Stacked thin film transistor, non-volatile memory devices and methods for fabricating the same
#3529Method and structure to create multiple device widths in FinFET technology in both bulk and SOI
#3530Methods and structures for planar and multiple-gate transistors formed on SOI
#3531Stacked non-volatile memory device and methods for fabricating the same
#3532Diode-based memory including floating-plate capacitor and its applications
#3533Diode-based capacitor memory and its applications
#3534Phase change memory including diode access device
#3535A content addressable memory including capacitor memory cell
#3536Integrated circuit on corrugated substrate
#3537Semiconductor device having stressors and method for forming
#3538Semiconductor device and method of manufacturing the same
#3539Semiconductor device and method of fabricating the same background
#3540Tri-gate integration with embedded floating body memory cell using a high-K dual metal gate
#3541Method of forming thin SGOI wafers with high relaxation and low stacking fault defect density
#3542Method and structure for buried circuits and devices
#3543SRAM cell with improved layout designs
#3544Semiconductor device and manufacturing method thereof
#3545Semiconductor substrate, semiconductor device and process for producing semiconductor substrate
#3546Dual-gate device and method
#3547FIN FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING FIN FIELD EFFECT TRANSISTOR
#3548Methods for fabricating nanocoils
#3549METHODS TO FORM HETEROGENEOUS SILICIDES/GERMANIDES IN CMOS TECHNOLOGY
#3550TECHNIQUE FOR REDUCING CRYSTAL DEFECTS IN STRAINED TRANSISTORS BY TILTED PREAMORPHIZATION
#3551Stress engineering using dual pad nitride with selective SOI device architecture
#3552Hybrid crystallographic surface orientation substrate having one or more SOI regions and/or bulk semiconductor regions
#3553Semiconductor memory device and method for operating the same
#3554CMOS compatible shallow-trench efuse structure and method
#3555Semiconductor device and manufacturing method thereof
#3556Coiled circuit device with active circuitry and methods for making the same
#3557Fabrication of semiconductor devices
#3558CMOS integrated circuit devices and substrates having buried silicon germanium layers therein and method of forming same
#3559Non-volatile semiconductor memory element and method of manufacturing the same, and semiconductor integrated circuit device including the non-volatile semiconductor memory element
#3560Fin field effect transistors including epitaxial fins
#3561Vertical replacement-gate silicon-on-insulator transistor
#3562High mobility plane FinFETs with equal drive strength
#3563Semiconductor device
#3564FET Channel Having a Strained Lattice Structure Along Multiple Surfaces
#3565Method for processing laser-irradiated thin films having variable thickness
#3566Process for production of SOI substrate and process for production of semiconductor device
#3567Semiconductor device including insulated gate type transistor and insulated gate type variable capacitance, and method of manufacturing the same
#3568Electronic devices including a semiconductor layer and a process for forming the same
#3569Semiconductor device and method of manufacturing the same
#3570Rotated field effect transistors and method of manufacture
#3571Method and Structure of Multi-Surface Transistor Device
#3572Method for producing distinct first and second active semi-conducting zones and use thereof for fabricating C-MOS structures
#3573BIPOLAR TRANSISTOR AND BACK-GATED TRANSISTOR STRUCTURE AND METHOD
#3574Dual SOI structure
#3575CMOS transistors using gate electrodes to increase channel mobilities by inducing localized channel stress
#3576Electronic device including a transistor structure having an active region adjacent to a stressor layer and a process for forming the electronic device
#3577SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE
#3578Device having active regions of different depths
#3579Structure and method of fabricating FINFET with buried channel
#3580Compact integrated capacitor
#3581Technique for providing multiple stress sources in NMOS and PMOS transistors
#3582Technique for strain engineering in Si-based Transistors by using embedded semiconductor layers including atoms with high covalent radius
#3583Embedded strain layer in thin SOI transistors and a method of forming the same
#3584Semiconductor device and manufacturing method thereof
#3585Methods and apparatuses for fluidic self assembly
#3586Semiconductor device and method of manufacturing the same
#3587Semiconductor substrate with multiple crystallographic orientations
#3588Process for forming an electronic device including transistor structures with sidewall spacers
#3589Method of fabricating a semiconductor device having self-aligned floating gate and related device
#3590Method of producing the same
#3591Method and apparatus for making coplanar isolated regions of different semiconductor materials on a substrate
#3592Semiconductor MIS transistor formed on SOI semiconductor substrate
#3593Semiconductor device and manufacturing method of the same
#3594Method for making a semiconductor structure using silicon germanium
#3595Optical ready substrates
#3596Technique for creating different mechanical strain by a contact etch stop layer stack with an intermediate etch stop layer
#3597Fabrication of small scale matched bi-polar TVS devices having reduced parasitic losses
#3598Three-dimensional integrated circuit structure
#3599Nonvolatile semiconductor memory device
#3600SONOS type two-bit FinFET flash memory cell