208356 ⎘
Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed; Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a simple metal, e.g. W, Mo with a multiple layer structure
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#2SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME
#3SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#4METHOD FOR FABRICATING METAL GATE DEVICES AND RESULTING STRUCTURES
#5SEMICONDUCTOR GATE AND CONTACT FORMATION
#6SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
#7SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURE
#8Methods of Forming Semiconductor Devices Including Gate Barrier Layers
#9MULTI-THRESHOLD VOLTAGE DEVICES AND ASSOCIATED TECHNIQUES AND CONFIGURATIONS
#10SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF
#11FORMING METAL CONTACTS ON METAL GATES
#12WIDE BAND GAP SEMICONDUCTOR DEVICE WITH SURFACE INSULATING FILM
#13Semiconductor device with fin transistors and manufacturing method of such semiconductor device
#14SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
#15SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#16Method for fabricating metal gate devices and resulting structures
#17NOVEL STRUCTURE FOR METAL GATE ELECTRODE AND METHOD OF FABRICATION
#18Semiconductor device and manufacturing method thereof
#19SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
#20Method for manufacturing semiconductor device
#21SEMICONDUCTOR GATE AND CONTACT FORMATION
#22Semiconductor device and manufacturing method thereof
#23PACKAGED ELECTRONIC DEVICES HAVING TRANSIENT LIQUID PHASE SOLDER JOINTS AND METHODS OF FORMING SAME
#24REPLACEMENT METAL GATES TO ENHANCE TRANSISTOR STRAIN
#25Method of manufacturing a semiconductor device and a semiconductor device
#26MEMORY DEVICE HAVING WORD LINE WITH DUAL CONDUCTIVE MATERIALS
#27Apparatus and circuits with dual threshold voltage transistors and methods of fabricating the same
#28DIELECTRIC TUNING OF NEGATIVE CAPACITANCE IN DUAL CHANNEL FIELD EFFECT TRANSISTORS
#29Assemblies which include ruthenium-containing conductive gates
#30Forming metal contacts on metal gates
#31Semiconductor device and a method for fabricating the same
#32INTERCONNECT STRUCTURE HAVING A MULTI-DECK CONDUCTIVE FEATURE AND METHOD OF FORMING THE SAME
#33SELF-ALIGNED CONTACT AND CONTACT OVER ACTIVE GATE STRUCTURES
#34Methods of forming semiconductor devices including gate barrier layers
#35Wide band gap semiconductor device with surface insulating film
#36Methods for forming recesses in source/drain regions and devices formed thereof
#37Multi-threshold voltage devices and associated techniques and configurations
#38Method of fabricating semiconductor devices including a fin field effect transistor
#39Static random access memory cell
#40Structure for metal gate electrode and method of fabrication
#41Method of manufacturing a semiconductor structure
#42Improving surface topography by forming spacer-like components
#43METHODS AND APPARATUS FOR METAL FILL IN METAL GATE STACK
#44Gate formation with varying work function layers
#45Integrated dipole flow for transistor
#46Semiconductor device with multiple floating gates for multi-level capacitance changes
#47Transistors with different threshold voltages
#48Semiconductor device and preparation method thereof
#49Interconnect Structure Having a Multi-Deck Conductive Feature and Method of Forming the Same
#50Semiconductor device with fin-type field effect transistor
#51Semiconductor device and manufacturing method thereof
#52Method for manufacturing thin-film transistor (TFT) substrate and TFT substrate
#53Semiconductor device including gate barrier layer
#54Method for manufacturing semiconductor device
#55Semiconductor device and methods of manufacture
#56Methods of cutting metal gates and structures formed thereof
#57Method of manufacturing a semiconductor device and a semiconductor device
#58Method for fabricating semiconductor device
#59Transistors with different threshold voltages
#60Semiconductor structure and method of manufacturing the same
#61Metal gate structure cutting process
#62Nanosheet device integrated with a FINFET transistor
#63Semiconductor device having modified profile metal gate
#64Assemblies which include ruthenium-containing conductive gates
#65Semiconductor devices
#66Forming metal contacts on metal gates
#67Gate-all-around transistor structure
#68Methods of cutting metal gates and structures formed thereof
#69Semiconductor device and method of manufacture
#70Semiconductor device having an upper epitaxial layer contacting two lower epitaxial layers
#71Semiconductor structure and fabricating method thereof
#72Semiconductor device and a method for fabricating the same
#73Semiconductor devices and methods of fabricating the same
#74Semiconductor device and manufacturing method thereof
#75Semiconductor device with fin transistors and manufacturing method of such semiconductor device
#76Strained structure of a semiconductor device
#77Semiconductor device with surface insulating film
#78Semiconductor device including emitter regions and method of manufacturing the semiconductor device
#79Integrated dipole flow for transistor
#80Method for fabricating a metal gate transistor with a stacked double sidewall spacer structure
#81Method for fabricating metal gate devices and resulting structures
#82Methods for forming recesses in source/drain regions and devices formed thereof
#83Assemblies which include ruthenium-containing conductive gates
#84Semiconductor arrangement and formation thereof
#85Vertical tunneling FinFET
#86Semiconductor device and semiconductor device manufacturing method
#87Method of semiconductor integrated circuit fabrication
#88Self-aligned contact and contact over active gate structures
#89Method of forming gate
#90Display device and method of manufacturing the display device
#91Gate formation with varying work function layers
#92System and method for data collection and exchange with protected memory devices
#93Semiconductor device and a method for fabricating the same
#94Semiconductor memory device and method of fabricating the same
#95Semiconductor devices
#96Gate structure for a transistor device with a novel pillar structure positioned thereabove
#97Ferroelectric memory device
#98Metal gate structure and methods thereof
#99Multi-threshold voltage devices and associated techniques and configurations
#100Semiconductor device with surface insulating film
#101Manufacturing method of static random access memory cell
#102Apparatus and circuits with dual threshold voltage transistors and methods of fabricating the same
#103Surface topography by forming spacer-like components
#104Static random access memory cell
#105Self-aligned gate cut method and multilayer gate-cut pillar structure
#106Semiconductor devices inlcluding a fin field effect transistor
#107Semiconductor device and manufacturing method thereof
#108FinFET having insulating layers between gate and source/drain contacts
#109Semiconductor device and method of manufacture
#110Extension region for a semiconductor device
#111Semiconductor device with adhesion layer
#112Semiconductor device with adhesion layer and method of making
#113Semiconductor device
#114Semiconductor device and methods of manufacture
#115Metal gate stack having TaAlCN layer
#116Semiconductor device and method for manufacturing the same
#117Fin field effect transistor (FinFET) device and method
#118Creating devices with multiple threshold voltages by cut-metal-gate process
#119Semiconductor devices
#120Methods for forming recesses in source/drain regions and devices formed thereof
#121Methods of cutting metal gates and structures formed thereof
#122STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE STRUCTURE
#123Semiconductor device having modified profile metal gate
#124Forming metal contacts on metal gates
#125Multi-component conductive structures for semiconductor devices
#126Semiconductor memory device and method of fabricating the same
#127Method to recess cobalt for gate metal application
#128Methods for forming recesses in source/drain regions and devices formed thereof
#129Transistors with temperature compensating gate structures
#130Integrated circuit device
#131Multiple work function nanosheet field-effect transistors with differential interfacial layer thickness
#132Structure and formation method of semiconductor device structure
#133Semiconductor structure and fabricating method thereof
#134Super long channel device within VFET architecture
#135Self-aligned insulated film for high-K metal gate device
#136Semiconductor device and semiconductor device manufacturing method
#137Wire substrate and display device including the same
#138Semiconductor devices and methods of fabricating the same
#139CMOS DEVICE INCLUDING PMOS METAL GATE WITH LOW THRESHOLD VOLTAGE
#140Semiconductor device with fin transistors and manufacturing method of such semiconductor device
#141Nanosheet devices with different types of work function metals
#142Capacitative artificial neural networks
#143Active matrix substrate having thin film transistors that each include copper gate electrode and oxide semiconductor layer
#144Method for manufacturing semiconductor device
#145Semiconductor memory device and method of manufacturing the same
#146Creating devices with multiple threshold voltage by cut-metal-gate process
#147Self-aligned metal gate etch back process and device
#148Semiconductor device and manufacturing method thereof
#149STRUCTURE AND METHOD TO SUPPRESS WORK FUNCTION EFFECT BY PATTERNING BOUNDARY PROXIMITY IN REPLACEMENT METAL GATE
#150Semiconductor device
#151Structure and formation method of semiconductor device structure
#152Methods of fabricating semiconductor devices
#153Isolation pillar first gate structures and methods of forming same
#154Semiconductor devices
#155FORMATION OF FULL METAL GATE TO SUPPRESS INTERFICIAL LAYER GROWTH
#156Semiconductor device with surface insulating film
#157Semiconductor device
#158Semiconductor arrangement and formation thereof
#159Nanosheet MOSFET with gate fill utilizing replacement spacer
#160Gate fill utilizing replacement spacer
#161Three-dimensional memory device with thickened word lines in terrace region and method of making thereof
#162Etch chemistries for metallization in electronic devices
#163Semiconductor structure
#164Surface topography by forming spacer-like components
#165Temperature compensation circuits
#166High electron mobility transistor with negative capacitor gate
#167Semiconductor device and a method for fabricating the same
#168Metal gate structure cutting process
#169Methods of cutting metal gates and structures formed thereof
#170Methods of cutting metal gates and structures formed thereof
#171Semiconductor device and manufacturing method thereof
#172Semiconductor memory device and method of fabricating the same
#173Wire substrate, display device including the same, and method of fabricating wire substrate
#174Semiconductor devices
#175DISPLAY DEVICE, MANUFACTURING METHOD OF DISPLAY DEVICE, AND ELECTRODE FORMING METHOD
#176Multi-component conductive structures for semiconductor devices
#177Gate replacement structures in semiconductor devices
#178Metal gate transistor with a stacked double sidewall spacer structure
#179Compound semiconductor device with quantum well structure, power supply device, and high-frequency amplifier
#180Gas sensor
#181Semiconductor memory device and method of manufacturing the same
#182Semiconductor devices comprising nitrogen-doped gate dielectric, and methods of forming semiconductor devices
#183Gate-end structure engineering for semiconductor applications
#184Semiconductor device including emitter regions and method of manufacturing the semiconductor device
#185Metal gate structure cutting process
#186Structure and formation method of semiconductor device structure
#187Metal gate stack having TaAlCN layer
#188Methods of forming a resistor structure between adjacent transistor gates on an integrated circuit product and the resulting devices
#189Field effect transistor, method for manufacturing same, display element, display device, and system
#190Gate formation with varying work function layers
#191Semiconductor device and methods of manufacture
#192Method of fabricating semiconductor device with adhesion layer
#193Semiconductor device and manufacture method thereof
#194Semiconductor device and manufacturing method thereof
#195Super long channel device within VFET architecture
#196Semiconductor device and method for fabricating the same
#197Method for fabricating metal gate devices and resulting structures
#198Metal gate structure and methods thereof
#199Semiconductor device having a multi-portion gate electrode
#200Vertical tunneling FinFET
#201Semiconductor device having buried gate structure and method for manufacturing the same, memory cell having the same and electronic device having the same
#202Gate fill utilizing replacement spacer
#203Multi-layer work function metal gates with similar gate thickness to achieve multi-VT for VFETs
#204Multi-layer work function metal gates with similar gate thickness to achieve multi-Vt for vFETs
#205Metal gate and manufacturing method thereof
#206Field effect transistor (FET) with a gate having a recessed work function metal layer and method of forming the FET
#207Ferroelectric memory device
#208Spacer chamfering gate stack scheme
#209Formation of full metal gate to suppress interficial layer growth
#210Semiconductor device and manufacturing method thereof
#211FinFET structures and methods of forming the same
#212Semiconductor device with surface insulating film
#213Semiconductor device and manufacturing method thereof
#214Semiconductor device and methods of manufacture
#215Semiconductor structure and fabrication method thereof
#216Semiconductor structures and fabrication methods thereof
#217Methods of fabricating semiconductor devices
#218Semiconductor device and manufacturing method thereof
#219Semiconductor device and a method for fabricating the same
#220Preparation methods for semiconductor layer and TFT, TFT and array substrate comprising semiconductor layer
#221Semiconductor structure
#222Multi-threshold voltage field effect transistor and manufacturing method thereof
#223Heterogeneous source drain region and extension region
#224Semiconductor structure and fabricating method thereof
#225Self-aligning source, drain and gate process for III-V nitride MISHEMTs
#226Semiconductor device and manufacture method thereof
#227Structure and method to suppress work function effect by patterning boundary proximity in replacement metal gate
#228Semiconductor device and manufacturing method thereof
#229Self-aligned insulated film for high-k metal gate device
#230Semiconductor memory device and method for manufacturing same
#231Methods of gate replacement in semiconductor devices
#232Structure and formation method of semiconductor device structure
#233Three-dimensional memory device having multilayer word lines containing selectively grown cobalt or ruthenium and method of making the same
#234NVM memory HKMG integration technology
#235Gate structure having designed profile
#236Semiconductor device and a method for fabricating the same
#237Nonvolatile memory device and method of manufacturing the same
#238Strained structure of a semiconductor device
#239Semiconductor arrangement and formation thereof
#240Cobalt-containing conductive layers for control gate electrodes in a memory structure
#241Semiconductor device and manufacturing method
#242Semiconductor device and a method for fabricating the same
#243Semiconductor device with FIN transistors and manufacturing method of such semiconductor device
#244Semiconductor device having a filling conductor comprising a plug portion and a cap portion and manufacturing method thereof
#245Semiconductor device structure and manufacturing method thereof
#246Structure and formation method of semiconductor device structure
#247Self-aligned metal gate etch back process and device
#248Method for manufacturing semiconductor device
#249Gate stack for integrated circuit structure and method of forming same
#250Low resistive electrode for an extendable high-k metal gate stack
#251Structure and method to suppress work function effect by patterning boundary proximity in replacement metal gate
#252Low resistive electrode for an extendable high-k metal gate stack
#253Gate structure and method for fabricating the same
#254Display device
#255Semiconductor device having gate electrodes with stacked metal layers
#256Semiconductor device and a method for fabricating the same
#257Semiconductor device including emitter regions and method of manufacturing the semiconductor device
#258Fin field effect transistor (FinFET) device structure with uneven gate structure
#259Etch stop in a dep-etch-dep process
#260Method of manufacturing a semiconductor device having a trench at least partially filled with a conductive material in a semiconductor substrate
#261Semiconductor device with surface insulating film
#262Gate stack integrated metal resistors
#263Gate stack integrated metal resistors
#264Forming MOSFET structures with work function modification
#265Alternative threshold voltage scheme via direct metal gate patterning for high performance CMOS FinFETs
#266Forming MOSFET structures with work function modification
#267Structure and formation method of semiconductor device structure
#268Semiconductor devices and methods of fabricating the same
#269Organic light emitting display device and manufacturing method thereof
#270Multi-threshold voltage devices and associated techniques and configurations
#271Spacer chamfering gate stack scheme
#272Manufacture method of AMOLED back plate and structure thereof
#273Spacer chamfering gate stack scheme
#274FinFET device and fabricating method thereof
#275ELECTRICAL GATE-TO-SOURCE/DRAIN CONNECTION
#276Methods of forming semiconductor devices
#277Method of fabricating an electrical contact for use on a semiconductor device
#278Method for fabricating metal gate devices and resulting structures
#279Semiconductor device and semiconductor device manufacturing method
#280Methods and devices for enhancing mobility of charge carriers
#281Semiconductor device and manufacturing method thereof
#282Recessing RMG metal gate stack for forming self-aligned contact
#283Etch chemistries for metallization in electronic devices
#284Spacer chamfering gate stack scheme
#285Spacer chamfering gate stack scheme
#286Spacer chamfering gate stack scheme
#287Fabrication methodology for optoelectronic integrated circuits
#288Heterogeneous source drain region and extension region
#289Methods of forming semiconductor devices including trench walls having multiple slopes
#290Semiconductor device including spacers having different dimensions
#291Non-volatile memory device
#292Method of manufacturing a PMOS transistor comprising a dual work function metal gate
#293Semiconductor structure and manufacturing process thereof
#294Cobalt-containing conductive layers for control gate electrodes in a memory structure
#295FinFET having a multi-portioned gate stack
#296Array substrate, method of fabricating the same, display panel and display device
#297Self aligned contact structure
#298Gate structure with refractory metal barrier
#299Array substrate and manufacturing method thereof, and display device
#300Stratified gate dielectric stack for gate dielectric leakage reduction