ClassID:

208395

H01L29/66227 - CPC Classification

Classification description:

Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof; Multistep manufacturing processes therefor; Types of semiconductor device ; Multistep manufacturing processes therefor; Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices

Sub-classes:
Recent Application in this class:
#1
20200219901
2020-07-09

Thin film transistor and manufacturing method thereof, array substrate and display panel

#2
20200035488
2020-01-30

Lateral semiconductor nanotube with hexagonal shape

#3
20190375632
2019-12-12

Nanoparticle structure and process for manufacture

#4
20190245068
2019-08-08

Method for making thin film transistor with nanowires as masks

#5
20190198319
2019-06-27

Lateral semiconductor nanotube with hexagonal shape

#6
20190097065
2019-03-28

Thin film transistor and manufacturing method thereof

#7
20190074302
2019-03-07

Thin film transistor and manufacturing method thereof, array substrate and display panel

#8
20180374753
2018-12-27

Stacked elongated nanoshapes of different semiconductor materials and structures that incorporate the nanoshapes

#9
20180342578
2018-11-29

Semiconductor device

#10
20180200786
2018-07-19

Nanoparticle structure and process for manufacture

#11
20180097095
2018-04-05

Quantum box device comprising dopants located in a thin semiconductor layer

#12
20170162647
2017-06-08

Substrate resistor with overlying gate structure

#13
20170158501
2017-06-08

Magnetic nanomechanical devices for stiction compensation

#14
20150056786
2015-02-26

Fabrication method of silicon carbide semiconductor apparatus and silicon carbide semiconductor apparatus fabricated thereby

#15
20150001554
2015-01-01

Silicon carbide semiconductor device

#16
20140015009
2014-01-16

Tunnel transistor with high current by bipolar amplification

#17
20130161736
2013-06-27

Trench MOS transistor having a trench doped region formed deeper than the trench gate

#18
20120298963
2012-11-29

STRUCTURE FOR USE IN FABRICATION OF PIN HETEROJUNCTION TFET

#19
20110169051
2011-07-14

Structure for use in fabrication of PiN heterojunction TFET