ClassID:

212257

H01L2924/0534 - CPC Classification

Classification description:

Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by; Oxides composed of metals from groups of the periodic table 4th Group

Sub-classes:
  • H01L2924/05341 » TiO 55
  • H01L2924/05342 » ZrO 14
Recent Application in this class:
#1
20260018564
2026-01-15

CAPACITIVE COUPLING IN A DIRECT-BONDED INTERFACE FOR MICROELECTRONIC DEVICES

#2
20250349641
2025-11-13

INTEGRATED CIRCUIT PACKAGES AND METHODS

#3
20250323228
2025-10-16

STACKED HIGH-POWER RF SWITCH

#4
20250239564
2025-07-24

TREATMENT PROCESS FOR WAFER BONDING PROCESSES

#5
20250201775
2025-06-19

HIGH CAPACITANCE HYBRID BONDED CAPACITOR DEVICE

#6
20250087543
2025-03-13

INTEGRATED CIRCUIT PACKAGES AND METHODS

#7
20250006687
2025-01-02

HEAT DISSIPATION IN SEMICONDUCTOR DEVICES

#8
20240321820
2024-09-26

BONDING METHOD

#9
20230075263
2023-03-09

WAFER BONDING METHOD USING SELECTIVE DEPOSITION AND SURFACE TREATMENT

#10
20230062835
2023-03-02

Semiconductor device

#11
20230040454
2023-02-09

Capacitive coupling in a direct-bonded interface for microelectronic devices

#12
20220384371
2022-12-01

METHOD OF MANUFACTURING A REDISTRIBUTION LAYER, REDISTRIBUTION LAYER, INTEGRATED CIRCUIT AND METHOD FOR ELECTRICALLY TESTING THE INTEGRATED CIRCUIT

#13
20220216244
2022-07-07

ON-CHIP INTEGRATION OF INDIUM TIN OXIDE (ITO) LAYERS FOR OHMIC CONTACT TO BOND PADS

#14
20210035954
2021-02-04

Capacitive coupling in a direct-bonded interface for microelectronic devices

#15
20200303202
2020-09-24

Dry etch process landing on metal oxide etch stop layer over metal layer and structure formed thereby

#16
20200211991
2020-07-02

Semiconductor structure and method of manufacturing the same

#17
20200075539
2020-03-05

Wafer level package structure and wafer level packaging method

#18
20190304796
2019-10-03

Dry etch process landing on metal oxide etch stop layer over metal layer and structure formed thereby

#19
20190122976
2019-04-25

Protrusion bump pads for bond-on-trace processing

#20
20190115323
2019-04-18

Capacitive coupling in a direct-bonded interface for microelectronic devices

#21
20180366446
2018-12-20

Ultrathin layer for forming a capacitive interface between joined integrated circuit component

#22
20180013260
2018-01-11

Bonding interface layer

#23
20170092620
2017-03-30

Ultrathin layer for forming a capacitive interface between joined integrated circuit components

#24
20160155697
2016-06-02

Protrusion bump pads for bond-on-trace processing

#25
20160043060
2016-02-11

Semiconductor device and method for fabricating the same

#26
20150340331
2015-11-26

Semiconductor device

#27
20150243639
2015-08-27

Integrated passive flip chip package

#28
20120299186
2012-11-29

Semiconductor device having a trace comprises a beveled edge