Dresden
Germany
14
2018-02-01
The entities that hold a legal rights for patent applications filed by inventor Hahn Jens:
Jens Hahn from Dresden, DE has applied for patents for these inventions. The list has both pending applications and granted patents:
Capacitors with Barrier Dielectric Layers, and Methods of Formation Thereof
#2 | 2016-05-12Capacitors with barrier dielectric layers, and methods of formation thereof
#3 | 2013-11-14REPLACEMENT GATE ELECTRODE FILL AT REDUCED TEMPERATURES
#4 | 2013-07-11Methods of forming conductive structures using a dual metal hard mask technique
#5 | 2013-05-02Methods of Filling Voids in Copper Structures
#6 | 2012-08-09INTEGRATED CIRCUITS HAVING INTERCONNECT STRUCTURES AND METHODS FOR FABRICATING INTEGRATED CIRCUITS HAVING INTERCONNECT STRUCTURES
#7 | 2012-01-05Semiconductor device comprising through hole vias having a stress relaxation mechanism
#8 | 2008-05-29Fabrication method for an integrated circuit structure
#9 | 2007-10-18Manufacturing method for an integrated semiconductor contact structure having an improved aluminum fill
#10 | 2007-06-21Transistor, memory cell, memory cell array and method of forming a memory cell array
#11 | 2007-05-08Process for producing aluminum-filled contact holes
#12 | 2006-10-12Method of manufacturing a semiconductor device
#13 | 2005-12-15Method for providing whisker-free aluminum metal lines or aluminum alloy lines in integrated circuits
#14 | 2005-09-15Gate structure for a transistor and method for fabricating the gate structure
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