Inventor profile of:

Carl Hess

City:

Los Altos, California

Country:

United States

Published Applications:

15

Last publication date:

2020-03-05

Top Assignees for applications by Carl Hess

The entities that hold a legal rights for patent applications filed by inventor Hess Carl:

Recent patent applications by Hess Carl

Carl Hess from Los Altos, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-03-05
US20200074619A1
Physics

Methods and systems for inspection of wafers and reticles using designer intent data

#2 | 2018-08-30
US20180247403A1
Physics

Methods and systems for inspection of wafers and reticles using designer intent data

#3 | 2015-06-25
US20150178914A1
Physics

Methods and Systems for Inspection of Wafers and Reticles Using Designer Intent Data

#4 | 2013-10-24
US20130279792A1
Physics

Method and system for hybrid reticle inspection

#5 | 2013-05-02
US20130111417A1
Physics

Database-driven cell-to-cell reticle inspection

#6 | 2012-06-19
US12394752
-

Methods and systems for classifying defects detected on a reticle

#7 | 2012-04-12
US20120086799A1
Physics

Focus offset contamination inspection

#8 | 2011-11-10
US20110276935A1
Physics

System and method for detecting design and process defects on a wafer using process monitoring features

#9 | 2009-02-17
US11549943
-

Process window optical proximity correction

#10 | 2008-04-03
US20080081385A1
Physics

METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DESIGNER INTENT DATA

#11 | 2008-03-20
US20080072207A1
Physics

Computer-implemented methods and systems for determining different process windows for a wafer printing process for different reticle designs

#12 | 2006-10-19
US20060236294A1
Physics

Computer-implemented methods for detecting defects in reticle design data

#13 | 2006-07-20
US20060161452A1
Physics

Computer-implemented methods, processors, and systems for creating a wafer fabrication process

#14 | 2006-03-09
US20060051682A1
Physics

Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data

#15 | 2005-01-06
US20050004774A1
Physics

Methods and systems for inspection of wafers and reticles using designer intent data

InventorID:

227633 ⎘