🔗 Permalink

Inventor profile of:

Tetsuya Goto

City:

Sendai

Country:

Japan

Published Applications:

22

Last publication date:

2022-01-13

Top Assignees for applications by Tetsuya Goto

The entities that hold a legal rights for patent applications filed by inventor Goto Tetsuya:

TOKYO ELECTRON LIMITED 15 Tokyo, Japan
NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY 6 Sendai-shi, Japan
NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY 4 Miyagi, Japan
Tokyo Electron Limited 4 , Japan
NATIONAL UNIVERSITY CORPORATION, TOHOKU UNIVERSITY 3 Sendai-shi, Miyagi, Japan
OHT INC. 2 HIROSHIMA, Japan
TOHOKU UNIVERSITY 2 Miyagi, Japan
Tadahiro OHMI 2 Miyagi, Japan
NATIONAL UNIVERSITY CORP TOHOKU UNIVERSITY 1 Sendai-shi, Miyagi, Japan
TOHOKU UNIVERSITY 1 Sendai-shi, Miyagi, Japan
National University Corporation Tohoku University 1 , Japan
Tadahiro Ohmi 1 Sendai, Japan
Tadahiro Ohmi 1 , Japan
TOHOKU UNIVERSITY 1 Sendai-shi, Japan
Tohoku University 1 , Japan
NATIONAL UNIVERSITY CORP TOHOKU UNIVERSITY 1 Sendai-shi, Japan
Tokyo Electron Ltd. 1 Tokyo, Japan
DAISHO DENSHI CO., LTD. 1 Tokyo, Japan
NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY 1 Sendai, Miyagi, Japan
Naohisa Goto 1 Hachioji, Japan
ZEON CORPORATION 1 Tokyo, Japan
Tokyo Electron Limited 1 Minato-ku, Tokyo, Japan
TOHOKU UNIVERSITY 1 Sendai-City, Japan

Recent patent applications by Goto Tetsuya

Tetsuya Goto from Sendai, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2022-01-13

US20220011255A1

Capacitive sensor and manufacturing method of capacitive sensor

#2 | 2021-09-23

US20210293866A1

Capacitance detection area sensor and conductive pattern sensing apparatus having capacitance detection area sensor

#3 | 2017-06-29

US20170186874A1

Method of production of semiconductor device

#4 | 2015-03-12

US20150069674A1

Shower plate sintered integrally with gas release hole member and method for manufacturing the same

#5 | 2014-01-30

US20140027278A1

Chemistry; metallurgy

MAGNETRON SPUTTERING APPARATUS

#6 | 2013-06-20

US20130154059A1

Semiconductor device manufacturing method and semiconductor device

#7 | 2013-05-09

US20130112337A1

Performing operations; transporting

SHOWER PLATE, MANUFACTURING METHOD OF THE SHOWER PLATE, AND PLASMA PROCESSING APPARATUS USING THE SHOWER PLATE

#8 | 2011-05-19

US20110114375A1

Wiring board and method of manufacturing the same

#9 | 2011-01-06

US20110000783A1

Chemistry; metallurgy

Rotary magnet sputtering apparatus

#10 | 2010-09-16

US20100230387A1

Performing operations; transporting

Shower plate, method for manufacturing the shower plate, plasma processing apparatus using the shower plate, plasma processing method and electronic device manufacturing method

#11 | 2010-07-15

US20100178775A1

Shower plate sintered integrally with gas release hole member and method for manufacturing the same

#12 | 2010-05-27

US20100126852A1

Chemistry; metallurgy

Rotary magnet sputtering apparatus

#13 | 2010-04-29

US20100101945A1

Magnetron sputtering apparatus

#14 | 2010-02-04

US20100025821A1

Ion implanting apparatus and ion implanting method

#15 | 2009-09-03

US20090218044A1

Microwave plasma processing apparatus, dielectric window for use in the microwave plasma processing apparatus, and method for manufacturing the dielectric window

#16 | 2008-07-29

US10472849

Device and control method for micro wave plasma processing

#17 | 2008-02-05

US10450149

Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus

#18 | 2006-11-28

US10473062

Microwave plasma processing apparatus, plasma ignition method, plasma forming method, and plasma processing method

#19 | 2006-10-03

US10276673

Plasma processing device

#20 | 2006-08-29

US10296614

Plasma processing device

#21 | 2006-08-01

US10296619

Device and method for plasma processing, and slow-wave plate

#22 | 2006-06-08

US20060118241A1

Plasma processing apparatus

InventorID:

229394 ⎘