Inventor profile of:

Joseph H. LYONS

City:

Wilton, Connecticut

Country:

United States

Published Applications:

18

Last publication date:

2020-02-20

Top Assignees for applications by Joseph H. LYONS

The entities that hold a legal rights for patent applications filed by inventor LYONS Joseph H.:

Recent patent applications by LYONS Joseph H.

Joseph H. LYONS from Wilton, US has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2020-02-20
US20200057394A1
Physics

Mask assembly

#2 | 2018-11-15
US20180329314A1
Physics

Mask assembly

#3 | 2012-05-17
US20120120380A1
Performing operations; transporting

Low and high pressure proximity sensors

#4 | 2010-05-06
US20100110399A1
Physics

Reverse flow gas gauge proximity sensor

#5 | 2010-04-29
US20100103399A1
Physics

Fluid Assisted Gas Gauge Proximity Sensor

#6 | 2010-02-11
US20100033705A1
Physics

Multi nozzle proximity sensor employing common sensing and nozzle shaping

#7 | 2009-12-31
US20090325087A1
Physics

Parallel process focus compensation

#8 | 2008-02-14
US20080034888A1
Physics

High-Resolution Gas Gauge Proximity Sensor

#9 | 2007-08-16
US20070186621A1
Physics

Pressure sensor

#10 | 2007-08-02
US20070176121A1
Physics

Pressure sensor

#11 | 2006-02-23
US20060038143A1
Electricity

Virtual gauging method for use in lithographic processing

#12 | 2006-01-26
US20060016247A1
Physics

Fluid gauge proximity sensor and method of operating same using a modulated fluid flow

#13 | 2006-01-10
US10435562
-

System and method for monitoring the topography of a wafer surface during lithographic processing

#14 | 2005-12-15
US20050274173A1
Physics

Gas gauge proximity sensor with a modulated gas flow

#15 | 2005-08-18
US20050179883A1
Physics

System for automated focus measuring of a lithography tool

#16 | 2005-04-26
US10301627
-

System and method for automated focus measuring of a lithography tool

#17 | 2005-03-03
US20050044963A1
Physics

High-resolution gas gauge proximity sensor

#18 | 2005-01-06
US20050001180A1
Electricity

System for monitoring the topography of a wafer surface during lithographic processing

InventorID:

2350264 ⎘