Heeze
Netherlands
10
2013-01-10
The entities that hold a legal rights for patent applications filed by inventor Loopstra Erik R.:
Erik R. Loopstra from Heeze, NL has applied for patents for these inventions. The list has both pending applications and granted patents:
System and Method for Using a Two Part Cover and a Box for Protecting a Reticle
#2 | 2011-01-06System and method for using a two part cover and a box for protecting a reticle
#3 | 2007-11-08System and method for using a two part cover and a box for protecting a reticle
#4 | 2006-10-05Lithographic apparatus, device manufacturing method, and device manufactured thereby
#5 | 2006-04-27System for using a two part cover for and a box for protecting a reticle
#6 | 2006-01-17Gas flushing system with recovery system for use in lithographic apparatus
#7 | 2005-07-21Off-axis levelling in lithographic projection apparatus
#8 | 2005-06-14System for using a two part cover for protecting a reticle
#9 | 2005-04-28Off-axis leveling in lithographic projection apparatus
#10 | 2005-04-12Displacement device
24490 ⎘