Point Richmond, California
United States
21
2011-06-16
The entities that hold a legal rights for patent applications filed by inventor Laidig Thomas:
Thomas Laidig from Point Richmond, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Scattering bar OPC application method for sub-half wavelength lithography patterning
#2 | 2009-09-17Scattering bar OPC application method for sub-half wavelength lithography patterning
#3 | 2008-08-28Scattering bar OPC application method for sub-half wavelength lithography patterning
#4 | 2007-07-24Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
#5 | 2007-07-12Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
#6 | 2007-05-24Method of two dimensional feature model calibration and optimization
#7 | 2007-03-22CPL mask and a method and program product for generating the same
#8 | 2007-02-13Method of two dimensional feature model calibration and optimization
#9 | 2007-02-08Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process
#10 | 2006-11-09Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
#11 | 2006-04-13Method for performing full-chip manufacturing reliability checking and correction
#12 | 2006-01-12Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
#13 | 2005-12-22Optical proximity correction using chamfers and rounding at corners
#14 | 2005-10-04Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM
#15 | 2005-08-25Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM
#16 | 2005-07-07Eigen decomposition based OPC model
#17 | 2005-07-07Feature optimization using enhanced interference mapping lithography
#18 | 2005-06-30Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
#19 | 2005-06-09Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
#20 | 2005-04-07Scattering bar OPC application method for sub-half wavelength lithography patterning
#21 | 2005-02-01Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
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