Veldhoven
Netherlands
68
2013-07-18
68
2014-02-04
These are the the leading inventors for applications assigned to ASML MaskTools B.V.:
ASML MaskTools B.V. based in Veldhoven, NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Method and apparatus for performing model-based OPC for pattern decomposed features
#2 | 2013-02-28 ✅ Patent 8,910,091 granted on 2014-12-09Method, program product and apparatus for performing double exposure lithography
#3 | 2012-05-17 ✅ Patent 8,391,605 granted on 2013-03-05Method and apparatus for performing model-based OPC for pattern decomposed features
#4 | 2012-03-29 ✅ Patent 8,640,058 granted on 2014-01-28Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
#5 | 2011-12-29 ✅ Patent 8,615,126 granted on 2013-12-24Method for performing pattern decomposition based on feature pitch
#6 | 2011-09-29 ✅ Patent 8,632,930 granted on 2014-01-21Method and apparatus for performing dark field double dipole lithography (DDL)
#7 | 2011-06-16 ✅ Patent 8,039,180 granted on 2011-10-18Scattering bar OPC application method for sub-half wavelength lithography patterning
#8 | 2011-04-28 ✅ Patent 8,495,526 granted on 2013-07-23Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process
#9 | 2011-03-31 ✅ Patent 8,730,452 granted on 2014-05-20Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders
#10 | 2011-03-03 ✅ Patent 8,395,757 granted on 2013-03-12Optimized polarization illumination
#11 | 2011-01-20 ✅ Patent 7,981,576 granted on 2011-07-19Method and apparatus for performing dark field double dipole lithography (DDL)
#12 | 2010-09-02 ✅ Patent 8,122,391 granted on 2012-02-21Method, program product and apparatus for performing double exposure lithography
#13 | 2010-07-01 ✅ Patent 7,985,515 granted on 2011-07-26Method and apparatus for performing model-based layout conversion for use with dipole illumination
#14 | 2010-02-25 ✅ Patent 8,495,529 granted on 2013-07-23Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography
#15 | 2009-06-11 ✅ Patent 8,060,842 granted on 2011-11-15Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
#16 | 2009-02-26 ✅ Patent 7,864,301 granted on 2011-01-04Source and mask optimization by changing intensity and shape of the illumination source
#17 | 2008-08-28 ✅ Patent 7,485,396 granted on 2009-02-03Scattering bar OPC application method for sub-half wavelength lithography patterning
#18 | 2008-08-28 ✅ Patent 8,120,753 granted on 2012-02-21Method, program product and apparatus for generating a calibrated pupil kernel and method of using the same in a lithography simulation process
#19 | 2008-07-31 ✅ Patent 7,865,865 granted on 2011-01-04Method, program product and apparatus for performing decomposition of a pattern for use in a DPT process
#20 | 2008-07-31 ✅ Patent 8,050,898 granted on 2011-11-01Method, program product and apparatus for predicting line width roughness and resist pattern failure and the use thereof in a lithography simulation process
#21 | 2008-06-19 ✅ Patent 7,970,198 granted on 2011-06-28Method for performing pattern decomposition based on feature pitch
#22 | 2008-03-20 ✅ Patent 8,111,921 granted on 2012-02-07Method and apparatus for performing model-based OPC for pattern decomposed features
#23 | 2008-03-20 ✅ Patent 8,040,573 granted on 2011-10-18Method, program product and apparatus for translating geometrical design rules into boundary conditions in the imaging space so as to define test patterns for use in optical model calibration
#24 | 2008-03-20 ✅ Patent 7,998,355 granted on 2011-08-16CPL mask and a method and program product for generating the same
#25 | 2008-03-06 ✅ Patent 8,521,481 granted on 2013-08-27Method, program product and apparatus for modeling resist development of a lithography process
#26 | 2008-02-21 ✅ Patent 7,710,544 granted on 2010-05-04Optimized polarization illumination
#27 | 2008-02-14 ✅ Patent 8,111,901 granted on 2012-02-07Apparatus and method for separating a circuit pattern into multiple circuit patterns
#28 | 2008-01-24 ✅ Patent 7,824,826 granted on 2010-11-02Method and apparatus for performing dark field double dipole lithography (DDL)
#29 | 2007-11-08 ✅ Patent 7,818,151 granted on 2010-10-19Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool
#30 | 2007-10-25 ✅ Patent 7,440,082 granted on 2008-10-21Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
#31 | 2007-09-13 ✅ Patent 7,725,872 granted on 2010-05-25Orientation dependent shielding for use with dipole illumination techniques
#32 | 2007-09-13 ✅ Patent 7,433,791 granted on 2008-10-07Method of performing multiple stage model calibration for optical imaging simulation models
#33 | 2007-07-12 ✅ Patent 7,774,736 granted on 2010-08-10Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
#34 | 2007-06-28 ✅ Patent 7,667,216 granted on 2010-02-23Method of achieving CD linearity control for full-chip CPL manufacturing
#35 | 2007-05-01 ✅ Patent 7,211,815 granted on 2007-05-01Method of achieving CD linearity control for full-chip CPL manufacturing
#36 | 2007-02-22 ✅ Patent 7,666,554 granted on 2010-02-23Method and apparatus for performing model-based layout conversion for use with dipole illumination
#37 | 2007-02-13 ✅ Patent 7,175,940 granted on 2007-02-13Method of two dimensional feature model calibration and optimization
#38 | 2007-02-08 ✅ Patent 8,132,130 granted on 2012-03-06Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process
#39 | 2007-01-04 ✅ Patent 7,652,758 granted on 2010-01-26Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems
#40 | 2006-12-07 ✅ Patent 7,735,052 granted on 2010-06-08Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
#41 | 2006-11-21 ✅ Patent 7,138,212 granted on 2006-11-21Method and apparatus for performing model-based layout conversion for use with dipole illumination
#42 | 2006-11-09 ✅ Patent 7,349,066 granted on 2008-03-25Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
#43 | 2006-10-17 ✅ Patent 7,124,395 granted on 2006-10-17Automatic optical proximity correction (OPC) rule generation
#44 | 2006-04-25 ✅ Patent 7,034,919 granted on 2006-04-25Method and apparatus for providing lens aberration compensation by illumination source optimization
#45 | 2006-04-13 ✅ Patent 7,434,195 granted on 2008-10-07Method for performing full-chip manufacturing reliability checking and correction
#46 | 2006-04-11 ✅ Patent 7,026,081 granted on 2006-04-11Optical proximity correction method utilizing phase-edges as sub-resolution assist features
#47 | 2006-03-02 ✅ Patent 7,116,411 granted on 2006-10-03Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systems
#48 | 2006-01-12 ✅ Patent 7,856,606 granted on 2010-12-21Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
#49 | 2005-12-22 ✅ Patent 7,355,681 granted on 2008-04-08Optical proximity correction using chamfers and rounding at corners
#50 | 2005-12-08 ✅ Patent 7,399,559 granted on 2008-07-15Optical proximity correction method utilizing phase-edges as sub-resolution assist features
#51 | 2005-10-04 ✅ Patent 6,951,701 granted on 2005-10-04Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM
#52 | 2005-09-22 ✅ Patent 7,342,646 granted on 2008-03-11Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition model
#53 | 2005-08-25 ✅ Patent 7,523,438 granted on 2009-04-21Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM
#54 | 2005-08-23 ✅ Patent 6,934,010 granted on 2005-08-23Optical proximity correction method utilizing gray bars as sub-resolution assist features
#55 | 2005-08-18 ✅ Patent 7,242,459 granted on 2007-07-10Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition model
#56 | 2005-07-19 ✅ Patent 6,920,628 granted on 2005-07-19Method and apparatus for defining mask patterns utilizing a spatial frequency doubling technique
#57 | 2005-07-07 ✅ Patent 7,231,629 granted on 2007-06-12Feature optimization using enhanced interference mapping lithography
#58 | 2005-07-05 ✅ Patent 6,915,505 granted on 2005-07-05Method and apparatus for performing rule-based gate shrink utilizing dipole illumination
#59 | 2005-06-23 ✅ Patent 7,292,315 granted on 2007-11-06Optimized polarization illumination
#60 | 2005-06-09 ✅ Patent 7,549,140 granted on 2009-06-16Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
#61 | 2005-05-12 ✅ Patent 7,246,342 granted on 2007-07-17Orientation dependent shielding for use with dipole illumination techniques
#62 | 2005-04-19 ✅ Patent 6,881,523 granted on 2005-04-19Optical proximity correction method utilizing ruled ladder bars as sub-resolution assist features
#63 | 2005-04-07 ✅ Patent 7,354,681 granted on 2008-04-08Scattering bar OPC application method for sub-half wavelength lithography patterning
#64 | 2005-04-05 ✅ Patent 6,875,545 granted on 2005-04-05Method of removing assist features utilized to improve process latitude
#65 | 2005-03-10 ✅ Patent 7,376,930 granted on 2008-05-20Method, program product and apparatus for generating assist features utilizing an image field map
#66 | 2005-02-10 ✅ Patent 7,100,145 granted on 2006-08-29Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
#67 | 2005-02-03 ✅ Patent 7,355,673 granted on 2008-04-08Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout
#68 | 2005-02-01 ✅ Patent 6,851,103 granted on 2005-02-01Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography
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