AH Veldhoven
Netherlands
10
2011-12-29
10
2013-12-24
These are the the leading inventors for applications assigned to ASML MaskTools B.V.:
ASML MaskTools B.V. based in AH Veldhoven, NL has been assigned the rights to these inventions. The list includes both Pending Applications and Patent Grants:
Method for performing pattern decomposition based on feature pitch
#2 | 2009-09-17 ✅ Patent 7,892,707 granted on 2011-02-22Scattering bar OPC application method for sub-half wavelength lithography patterning
#3 | 2008-08-28 ✅ Patent 7,485,396 granted on 2009-02-03Scattering bar OPC application method for sub-half wavelength lithography patterning
#4 | 2007-07-12 ✅ Patent 7,774,736 granted on 2010-08-10Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithography
#5 | 2007-07-05 ✅ Patent 7,493,589 granted on 2009-02-17Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
#6 | 2007-03-22 ✅ Patent 7,892,703 granted on 2011-02-22CPL mask and a method and program product for generating the same
#7 | 2006-09-21 ✅ Patent 7,494,753 granted on 2009-02-24Method, program product and apparatus for improving calibration of resist models used in critical dimension calculation
#8 | 2005-09-08 ✅ Patent 7,514,183 granted on 2009-04-07Method for performing transmission tuning of a mask pattern to improve process latitude
#9 | 2005-08-25 ✅ Patent 7,523,438 granted on 2009-04-21Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSM
#10 | 2005-06-30 ✅ Patent 7,550,235 granted on 2009-06-23Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography
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