Livermore, California
United States
60
2011-08-25
The entities that hold a legal rights for patent applications filed by inventor OPSAL Jon:
Jon OPSAL from Livermore, US has applied for patents for these inventions. The list has both pending applications and granted patents:
High resolution monitoring of CD variations
#2 | 2010-12-16Methods for depth profiling in semiconductors using modulated optical reflectance technology
#3 | 2010-06-03Modulated reflectance measurement system using UV probe
#4 | 2009-10-15High resolution monitoring of CD variations
#5 | 2009-03-12Detector configurations for optical metrology
#6 | 2008-12-18Modulated reflectance measurement system with multiple wavelengths
#7 | 2008-07-03Modulated reflectance measurement system using UV probe
#8 | 2008-06-26Methods for depth profiling in semiconductors using modulated optical reflectance technology
#9 | 2008-03-27Modulated optical reflectance measurement system with enhanced sensitivity
#10 | 2008-02-14Probe beam profile modulated optical reflectance system and methods
#11 | 2008-01-31Systems and methods for immersion metrology
#12 | 2008-01-24Detector configurations for optical metrology
#13 | 2007-09-20Scatterometry multi-structure shape definition with multi-periodicity
#14 | 2007-08-30High resolution monitoring of CD variations
#15 | 2007-08-16Combined modulated optical reflectance and electrical system for ultra-shallow junctions applications
#16 | 2007-07-24Characterization of ultra shallow junctions in semiconductor wafers
#17 | 2007-07-12Beam profile ellipsometer with rotating compensator
#18 | 2007-06-19Scatterometry for samples with non-uniform edges
#19 | 2007-02-22Global shape definition method for scatterometry
#20 | 2007-01-11Modulated reflectance measurement system using UV probe
#21 | 2006-12-05Global shape definition method for scatterometry
#22 | 2006-11-23Modulated reflectance measurement system with multiple wavelengths
#23 | 2006-10-24Modulated reflectance measurement system using UV probe
#24 | 2006-09-12Modulated reflectance measurement system with multiple wavelengths
#25 | 2006-08-01Feed forward critical dimension control
#26 | 2006-07-27Multiple tool and structure analysis
#27 | 2006-07-27Method for measuring peak carrier concentration in ultra-shallow junctions
#28 | 2006-05-23Optical metrology tool having improved contrast
#29 | 2006-05-18Beam profile ellipsometer with rotating compensator
#30 | 2006-05-04Modulated reflectance measurement system with multiple wavelengths
#31 | 2006-03-30Detector configurations for optical metrology
#32 | 2006-01-19Critical dimension analysis with simultaneous multiple angle of incidence measurements
#33 | 2006-01-17Calibration and alignment of X-ray reflectometric systems
#34 | 2005-11-10Real time analysis of periodic structures on semiconductors
#35 | 2005-11-08Combination thermal wave and optical spectroscopy measurement systems
#36 | 2005-09-20Real time analysis of periodic structures on semiconductors
#37 | 2005-09-08Systems and methods for immersion metrology
#38 | 2005-09-08Method for measuring ion-implanted semiconductors with improved repeatability
#39 | 2005-09-01Ion implant monitoring through measurement of modulated optical response
#40 | 2005-08-23Thin film optical measurement system and method with calibrating ellipsometer
#41 | 2005-08-16Real time analysis of periodic structures on semiconductors
#42 | 2005-07-28Systems and methods for evaluating semiconductor layers
#43 | 2005-07-26Thin film optical measurement system and method with calibrating ellipsometer
#44 | 2005-06-30Method for determining ion concentration and energy of shallow junction implants
#45 | 2005-06-23CD metrology analysis using green's function
#46 | 2005-05-19Detector configurations for optical metrology
#47 | 2005-05-17Monitoring temperature and sample characteristics using a rotating compensator ellipsometer
#48 | 2005-04-21Ion implant monitoring through measurement of modulated optical response
#49 | 2005-04-21Standardized sample for characterizing the performance of a scatterometer
#50 | 2005-04-19Apparatus for optical measurements of nitrogen concentration in thin films
#51 | 2005-04-19Systems and methods for evaluating semiconductor layers
#52 | 2005-03-24Photothermal system with spectroscopic pump and probe
#53 | 2005-03-17Critical dimension analysis with simultaneous multiple angle of incidence measurements
#54 | 2005-03-15CD metrology analysis using green's function
#55 | 2005-02-24Optical scatterometry of asymmetric lines and structures
#56 | 2005-02-24Scatterometry to simultaneously measure critical dimensions and film properties
#57 | 2005-02-22Method for determining ion concentration and energy of shallow junction implants
#58 | 2005-02-17Position modulated optical reflectance measurement system for semiconductor metrology
#59 | 2005-02-15Spatial averaging technique for ellipsometry and reflectometry
#60 | 2005-01-11Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements
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