Michael A. Todd

Deposition from liquid sources

Process for deposition of semiconductor films

Method to form ultra high quality silicon-containing compound layers

PRECURSORS AND PROCESSES FOR LOW TEMPERATURE SELECTIVE EPITAXIAL GROWTH

Thin films and methods of making them

Method to form ultra high quality silicon-containing compound layers

Deposition over mixed substrates using trisilane

Deposition from liquid sources

Deposition of amorphous silicon-containing films

Process for deposition of semiconductor films

Deposition of amorphous silicon-containing films

Process for depositing low dielectric constant materials

Process for depositing low dielectric constant materials

Apparatus, precursors and deposition methods for silicon-containing materials

System for control of gas injectors

Low temperature silicon compound deposition

Integration of high k gate dielectric

Deposition from liquid sources

Methods for depositing polycrystalline films with engineered grain structures

Thin films and methods of making them

Thin films and method of making them

Process for deposition of semiconductor films

Integration of high k gate dielectric

Process for deposition of semiconductor films

Method and apparatus for chemical synthesis

Low-k dielectric materials and processes

Method to form ultra high quality silicon-containing compound layers

Deposition over mixed substrates

Process for deposition of semiconductor films

Deposition over mixed substrates

Method and apparatus for chemical synthesis

Methods for depositing amorphous materials and using them as templates for epitaxial films by solid phase epitaxy