Austin, Texas
United States
14
2010-09-28
The entities that hold a legal rights for patent applications filed by inventor Mack Chris A.:
Chris A. Mack from Austin, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Overlay metrology and control method
#2 | 2009-07-28Feature printability optimization by optical tool
#3 | 2009-05-07RESOLUTION ENHANCEMENT TECHNIQUES COMBINING INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES
#4 | 2009-04-30RESOLUTION ENHANCEMENT TECHNIQUES COMBINING FOUR BEAM INTERFERENCE-ASSISTED LITHOGRAPHY WITH OTHER PHOTOLITHOGRAPHY TECHNIQUES
#5 | 2008-08-14Method for determining lithographic focus and exposure
#6 | 2008-06-03Method for determining lithographic focus and exposure
#7 | 2008-05-06Measuring phase errors on phase shift masks
#8 | 2008-04-01Method for process optimization and control by comparison between 2 or more measured scatterometry signals
#9 | 2006-10-26Systems and methods for mitigating variances on a patterned wafer using a prediction model
#10 | 2006-10-19Method for determining and correcting reticle variations
#11 | 2006-10-19Method for monitoring a reticle
#12 | 2006-10-19Systems and methods for modifying a reticle's optical properties
#13 | 2006-09-07Target acquisition and overlay metrology based on two diffracted orders imaging
#14 | 2006-07-11Method and mark for metrology of phase errors on phase shift masks
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