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Inventor profile of:

Yasuo Matsuki

City:

Tokyo

Country:

Japan

Published Applications:

Last publication date:

2015-10-15

Top Assignees for applications by Yasuo Matsuki

The entities that hold a legal rights for patent applications filed by inventor Matsuki Yasuo:

JSR Corporation 13 Tokyo, Japan
JSR CORPORATION 6 Chuo-ku, Japan
JAPAN SCIENCE AND TECHNOLOGY AGENCY 4 Kawaguchi-shi, Japan
JSR Corporation 2 , Japan
Hitachi High-Tech Science Corporation 1 , Japan
SHARP CORPORATION 1 Osaka-shi, Japan
INTERNATIONAL CENTER FOR MATERIALS RESEARCH 1 KAWASAKI-SHI, Japan
SEIKO EPSON CORPORATION 1 , Japan
JAPAN SCIENCE AND TECHNOLOGY AGENCY 1 Kawaguchi-shi, Saitama, Japan
jsr corp. 1 tokyo, Japan
Japan Science and Technology Agency 1 Saitama, Japan
National Univ. Corp. Kanazawa University 1 Kanazawa-shi, Ishikawa, Japan
SEIKO EPSON CORPORATION 1 Tokyo, Japan
JSR CORPORATION 1 MINATO-KU, Japan
SHARP CORPORATION 1 Osaka, Japan
Japan Science and Technology Agency 1 , Japan
HITACHI HIGH-TECH SCIENCE CORPORATION 1 Tokyo, Japan
JSR Corporation 1 Toyko, Japan
International Center for Materials Research 1 Kawasaki, Japan
National Univ. Corp. Kanazawa University 1 Kanazawa-Shi, Japan
JSR Corporation 1 Chuo-ku, Tokyo, Japan

Recent patent applications by Matsuki Yasuo

Yasuo Matsuki from Tokyo, JP has applied for patents for these inventions. The list has both pending applications and granted patents:

#1 | 2015-10-15

US20150291441A1

Chemistry; metallurgy

CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION

#2 | 2015-02-19

US20150050205A1

Chemistry; metallurgy

Container containing a cobalt carbonyl complex and cobalt carbonyl complex composition

#3 | 2013-08-29

US20130224889A1

Electricity

Charged particle beam apparatus, thin film forming method, defect correction method and device forming method

#4 | 2012-11-29

US20120301731A1

Electricity

Method for forming crystalline cobalt silicide film

#5 | 2012-03-15

US20120064302A1

Physics

PATTERNING METHOD

#6 | 2011-12-29

US20110318939A1

Electricity

High order silane composition and method of manufacturing a film-coated substrate

#7 | 2011-09-29

US20110236583A1

Chemistry; metallurgy

CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION

#8 | 2011-09-22

US20110229654A1

Chemistry; metallurgy

Composition and method for forming an aluminum film

#9 | 2011-07-28

US20110184141A1

Chemistry; metallurgy

POLYMER PRODUCTION PROCESS

#10 | 2011-06-30

US20110158886A1

Chemistry; metallurgy

POLYSILANE PRODUCTION PROCESS

#11 | 2010-02-04

US20100029057A1

Electricity

SILICONE RESIN COMPOSITION AND METHOD OF FORMING A TRENCH ISOLATION

#12 | 2009-08-27

US20090215920A1

Chemistry; metallurgy

SILANE POLYMER AND METHOD FOR FORMING SILICON FILM

#13 | 2009-06-04

US20090142617A1

Chemistry; metallurgy

COMPOSITION FOR FORMING SILICON-ALUMINUM FILM, SILICON-ALUMINUM FILM AND METHOD FOR FORMING THE SAME

#14 | 2009-01-22

US20090022891A1

Chemistry; metallurgy

METHOD OF FORMING METAL FILM

#15 | 2008-08-14

US20080194118A1

Chemistry; metallurgy

Trench filling method

#16 | 2007-09-13

US20070209695A1

Electricity

Dye and Dye-Sensitized Solar Cell

#17 | 2007-09-06

US20070208117A1

Chemistry; metallurgy

ALUMINUM FINE PARTICLE DISPERSED FILM, COMPOSITION FOR FORMING THE SAME AND METHOD OF FORMING THE SAME

#18 | 2007-05-29

US10420521

High order silane composition, and method of forming silicon film using the composition

#19 | 2007-04-05

US20070077742A1

Electricity

Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same

#20 | 2006-10-26

US20060240190A1

Chemistry; metallurgy

Ruthenium compound and process for producing a metal ruthenium film

#21 | 2005-10-11

US10410154

Conductive film forming composition, conductive film, and method for forming the same

#22 | 2005-07-07

US20050145163A1

Chemistry; metallurgy

Composition for forming silicon film and method for forming silicon film

#23 | 2005-04-05

US10168104

Ruthenium film, ruthenium oxide film and process for forming the same

#24 | 2005-01-25

US10028712

Method for fabricating a silicon thin-film

InventorID:

415166 ⎘