Sandy Hook, Connecticut
United States
8
2008-06-12
The entities that hold a legal rights for patent applications filed by inventor Markoya Louis:
Louis Markoya from Sandy Hook, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Systems and methods for thermally-induced aberration correction in immersion lithography
#2 | 2007-03-29Adjustable resolution interferometric lithography system
#3 | 2007-02-22Liquid immersion lithography system with tilted liquid flow
#4 | 2006-10-19Liquid immersion lithography system with tilted liquid flow
#5 | 2006-09-14Lithographic apparatus and device manufacturing method, an integrated circuit, a flat panel display, and a method of compensating for cupping
#6 | 2006-08-03Interferometric lithographic projection apparatus
#7 | 2006-03-02Adjustable resolution interferometric lithography system
#8 | 2005-02-10Use of multiple reticles in lithographic printing tools
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