Rainer Pforr

Method and apparatus for determining a critical dimension variation of a photolithographic mask

Lithographic targets for uniformity control

Method and apparatus for minimizing overlay errors in lithography

Lithographic mask and method of forming a lithographic mask

Methods of compensating lens heating, lithographic projection system and photo mask

Method of Patterning a Substrate, Photosensitive Layer Stack and System for Lithography

PHOTOSENSITIVE LAYER STACK

Mask Structure for Manufacturing an Integrated Circuit by Photolithographic Patterning

Transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift mask

Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element

System and method for projecting a pattern from a mask onto a substrate

Arrangement for the transfer of structural elements of a photomask onto a substrate and method therefor

Method for producing a mask for the lithographic projection of a pattern onto a substrate

Method and system for photolithography

Apparatus for projecting a pattern into an image plane

Reflection mask, use of the reflection mask and method for fabricating the reflection mask

Method for transferring a layout of an integrated circuit level to a semiconductor substrate

Lithography mask for imaging of convex structures

Method for reducing an overlay error and measurement mark for carrying out the same

Photolithographic mask and methods for producing a structure and of exposing a wafer in a projection apparatus