San Ramon, California
United States
23
2014-01-16
The entities that hold a legal rights for patent applications filed by inventor BARNES Michael:
Michael BARNES from San Ramon, US has applied for patents for these inventions. The list has both pending applications and granted patents:
Flowable film dielectric gap fill process
#2 | 2013-11-12CVD flowable gap fill
#3 | 2013-07-09Flowable film dielectric gap fill process
#4 | 2011-08-18CAPACITIVELY COUPLED PLASMA REACTOR WITH MAGNETIC PLASMA CONTROL
#5 | 2011-03-29CVD flowable gap fill
#6 | 2011-02-15Flowable film dielectric gap fill process
#7 | 2009-09-01CVD flowable gap fill
#8 | 2009-04-28Flowable film dielectric gap fill process
#9 | 2009-02-17Metal-free catalysts for pulsed deposition layer process for conformal silica laminates
#10 | 2009-01-01HYBRID ETCH CHAMBER WITH DECOUPLED PLASMA CONTROLS
#11 | 2008-01-31Capacitively coupled plasma reactor with magnetic plasma control
#12 | 2006-08-29Method for performing fluorocarbon chamber cleaning to eliminate fluorine memory effect
#13 | 2006-07-20Capacitively coupled plasma reactor with magnetic plasma control
#14 | 2006-03-14Multi-purpose processing chamber with removable chamber liner
#15 | 2005-09-01Plasma processes for depositing low dielectric constant films
#16 | 2005-08-16Plasma processes for depositing low dielectric constant films
#17 | 2005-05-17Plasma reactor having a symmetric parallel conductor coil antenna
#18 | 2005-05-12Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
#19 | 2005-04-12Method and apparatus for routing harmonics in a plasma to ground within a plasma enhanced semiconductor wafer processing chamber
#20 | 2005-03-22Plasma processes for depositing low dielectric constant films
#21 | 2005-02-08Capacitively coupled plasma reactor with magnetic plasma control
#22 | 2005-01-11Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
#23 | 2005-01-06Capacitively coupled plasma reactor with magnetic plasma control
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